Patents by Inventor Young-Tak Kim

Young-Tak Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200110888
    Abstract: A semiconductor device for provisioning secure information of a demander includes a device key storage configured to store a device key provisioned by a supplier of the semiconductor device, a master key generator configured to generate, based on the device key and demander data provisioned by the demander, a master key of the demander by using a first operation shared with the supplier and a second operation shared with the demander, and a cryptographic engine configured to perform a cryptographic operation based on the master key.
    Type: Application
    Filed: May 30, 2019
    Publication date: April 9, 2020
    Inventors: Kl-TAK KIM, KI-SEOK BAE, JIN-SU HYUN, YOUNG-MOON SONN, HYO-SUN HWANG
  • Publication number: 20200041709
    Abstract: A low refractive layer includes a plurality of hollow inorganic particles and a matrix between the hollow inorganic particles, and capable of exhibiting a good refractive index and improved durability by enhancing the weight ratio of the hollow inorganic particles to the matrix. An electronic device according to an embodiment of the inventive concept including the low refractive layer may exhibit improved reliability and good display quality.
    Type: Application
    Filed: July 1, 2019
    Publication date: February 6, 2020
    Inventors: Taekjoon LEE, Young gu KIM, Sun-young CHANG, Jongmin OK, Hyelim JANG, Jin-soo JUNG, Kyungseon TAK
  • Patent number: 10553146
    Abstract: A display device includes a display panel including pixels; and a timing controller to calculate a grayscale usage ratio of input data and to determine an automatic-current-limit rate based on the grayscale usage ratio, the automatic-current-limit rate representing a power saving rate.
    Type: Grant
    Filed: January 18, 2017
    Date of Patent: February 4, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Si-Beak Pyo, Min-Tak Lee, Young-Nam Yun, Kyu-Seok Kim, Hyun-Koo Lee, Young-Sik Lim
  • Patent number: 10478091
    Abstract: Provided is a micro robot position detection device. The device includes a micro robot position detection unit that uses a micro robot control parameter to filter a reflected signal of an ultra wide-band impulse radar signal emitted to a micro robot to extract, as a micro robot signal, a natural oscillating frequency signal generated when the micro robot is driven through control of external electromagnetic field, and analyzes the micro robot signal based on a transmission and reception parameter of the ultra wide-band impulse radar signal to calculate position information for the micro robot. Also, the device may further include an image matching unit that receives position information for the micro robot and performs position correction on the received position information based on pre-stored reference image data and the image data.
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: November 19, 2019
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Hong Yeon Yu, Nac Woo Kim, Sim-Kwon Yoon, Byung-Tak Lee, Young Sun Kim
  • Patent number: 10462489
    Abstract: There are provided an image processing device and a processing method thereof. The image processing method includes obtaining an interference signal using a sample beam and a reference beam, transforming the interference signal by using a numerical signal processing method or an intensity mixing method to generate a transformed interference signal, and obtaining a three-dimensional (3D) phase image by using the interference signal and the transformed interference signal.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: October 29, 2019
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Gi Hyeon Min, Nack Woo Kim, Mun Seob Lee, Byung-Tak Lee, Young Sun Kim
  • Publication number: 20190280081
    Abstract: A semiconductor device and a manufacturing method thereof, the semiconductor device including an insulation layer; a metal resistance pattern on the insulation layer; a spacer on a side wall of the metal resistance pattern; and a gate contact spaced apart from the spacer, the gate contact extending into the insulation layer, wherein the insulation layer includes a projection projecting therefrom, the projection contacting the gate contact.
    Type: Application
    Filed: May 29, 2019
    Publication date: September 12, 2019
    Inventors: Jung Hun CHOI, Young Tak KIM, Da Il EOM, Sun Jung LEE
  • Patent number: 10404828
    Abstract: Provided are a streaming apparatus, a streaming method, and a streaming service system using the streaming apparatus, wherein the streaming apparatus includes: a scheduler configured to generate a modified metafile by modifying a reproduction list file of a metafile; and a server socket configured to transmit the modified metafile when a metafile transmit request is received from a player by operating as a server with respect to the player. Accordingly, delay times of players are substantially the same.
    Type: Grant
    Filed: January 18, 2017
    Date of Patent: September 3, 2019
    Assignee: Naver Corporation
    Inventors: Sung Tak Cho, Sung Ho Kim, Joon Kee Chang, Min Hee Choi, Ki Su Park, Kyoung Yun Kang, Young Min Kim, Dong Ock Kim, Eun Sun Shin
  • Patent number: 10358757
    Abstract: Disclosed herein are a washing machine including a moving mechanism and a method of controlling the washing machine. The washing machine includes a cabinet, a tub disposed inside the cabinet, a drum rotatably provided inside the tub, a front panel which is located at one side of the cabinet and comprises an opening through which laundry is inserted and taken out, and a driving unit which moves the tub to change a space between the tub and the front panel. It is possible to prevent oscillation from being transferred by spacing the front panel and the tub apart during washing. Also, it is possible to provide convenience for a user by arranging the front panel and the tub adjacent to each other while inserting or taking out laundry.
    Type: Grant
    Filed: August 20, 2015
    Date of Patent: July 23, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-Mok Lee, Sang Tak Lee, Yong Soo Kyong, Ju-Yeong Kim, Young Jin Um, Jea Won Lee, Jee-Hoon Lee, Kab Jin Jun, Jun Won Seo, Sung-Chul Hwang
  • Patent number: 10328413
    Abstract: Provided is an adsorbent for carbon dioxide, including: a graphene oxide layer having an interconnected network structure; and carbon nitride formed on the graphene oxide layer.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: June 25, 2019
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Sang Ouk Kim, Young Tak Oh
  • Patent number: 10332954
    Abstract: A semiconductor device and a manufacturing method thereof, the semiconductor device including an insulation layer; a metal resistance pattern on the insulation layer; a spacer on a side wall of the metal resistance pattern; and a gate contact spaced apart from the spacer, the gate contact extending into the insulation layer, wherein the insulation layer includes a projection projecting therefrom, the projection contacting the gate contact.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: June 25, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung Hun Choi, Young Tak Kim, Da Il Eom, Sun Jung Lee
  • Publication number: 20180310175
    Abstract: An apparatus for Internet of Things (IoT) registration includes a beacon frame transmitting unit for transmitting a beacon frame to a plurality of stations, an authentication unit that receives an authentication request frame from the plurality of stations in a first method, and an association unit that transmits an authentication response frame or an association response frame to the plurality of stations in a second method.
    Type: Application
    Filed: April 25, 2018
    Publication date: October 25, 2018
    Applicant: Industry Academic Cooperation Foundation Of Yeungnam University
    Inventors: Young-Tak Kim, Nurullah Shahin
  • Patent number: 10003773
    Abstract: The present invention relates to a shock sensing device for vehicle and method for controlling thereof. The present invention can minimize battery consumption with faster handling of occurred accident more than prior art when camera was installed at a side of a vehicle to film a blind spot since the present invention can film information of a vehicle blind spot with camera of only 1 channel or 2 channel.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: June 19, 2018
    Assignee: INDUSTRY ACADEMIC COOPERATION FOUNDATION OF YEUNGNAM UNIVERSITY
    Inventors: Dal Hyun Jang, Seung Hwan Lee, Young Tak Kim, Sang Woon Suh, Ho Youl Jung, Chang Hyeon Park
  • Publication number: 20170345884
    Abstract: A semiconductor device and a manufacturing method thereof, the semiconductor device including an insulation layer; a metal resistance pattern on the insulation layer; a spacer on a side wall of the metal resistance pattern; and a gate contact spaced apart from the spacer, the gate contact extending into the insulation layer, wherein the insulation layer includes a projection projecting therefrom, the projection contacting the gate contact.
    Type: Application
    Filed: February 28, 2017
    Publication date: November 30, 2017
    Inventors: Jung Hun CHOI, Young Tak KIM, Da Il EOM, Sun Jung LEE
  • Patent number: 9786785
    Abstract: Semiconductor device, method for fabricating the same and electronic devices including the semiconductor device are provided. The semiconductor device comprises an interlayer insulating layer formed on a substrate and including a trench, a gate electrode formed in the trench, a first gate spacer formed on a side wall of the gate electrode to have an L shape, a second gate spacer formed on the first gate spacer to have an L shape and having a dielectric constant lower than that of silicon nitride, and a third spacer formed on the second gate spacer.
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: October 10, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kook-Tae Kim, Young-Tak Kim, Ho-Sung Son, Seok-Jun Won, Ji-Hye Yi, Chul-Woong Lee
  • Patent number: 9768300
    Abstract: Semiconductor devices including a stressor in a recess and methods of forming the semiconductor devices are provided. The methods may include forming a trench in an active region and the trench may include a notched portion of the active region. The methods may also include forming an embedded stressor in the trench. The embedded stressor may include a lower semiconductor layer and an upper semiconductor layer, which has a width narrower than a width of the lower semiconductor layer. A side of the upper semiconductor layer may not be aligned with a side of the lower semiconductor layer and an uppermost surface of the upper semiconductor layer may be higher than an uppermost surface of the active region.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: September 19, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Suk Shin, Hyun-Chul Kang, Dong-Hyun Roh, Pan-Kwi Park, Geo-Myung Shin, Nae-In Lee, Chul-Woong Lee, Hoi-Sung Chung, Young-Tak Kim
  • Patent number: 9741855
    Abstract: Semiconductor devices including a stressor in a recess and methods of forming the semiconductor devices are provided. The methods may include forming a fast etching region comprising phosphorous in an active region and forming a first trench in the active region by recessing the fast etching region. The methods may also include forming a second trench in the active region by enlarging the first trench using a directional etch process and forming a stressor in the second trench. The second trench may include a notched portion of the active region.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: August 22, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Suk Shin, Chul-Woong Lee, Hoi-Sung Chung, Young-Tak Kim, Nae-In Lee
  • Publication number: 20170186869
    Abstract: Semiconductor devices including a stressor in a recess and methods of forming the semiconductor devices are provided. The methods may include forming a trench in an active region and the trench may include a notched portion of the active region. The methods may also include forming an embedded stressor in the trench. The embedded stressor may include a lower semiconductor layer and an upper semiconductor layer, which has a width narrower than a width of the lower semiconductor layer. A side of the upper semiconductor layer may not be aligned with a side of the lower semiconductor layer and an uppermost surface of the upper semiconductor layer may be higher than an uppermost surface of the active region.
    Type: Application
    Filed: January 13, 2017
    Publication date: June 29, 2017
    Inventors: Dong-Suk SHIN, Hyun-Chul KANG, Dong-Hyun ROH, Pan-Kwi PARK, Geo-Myung SHIN, Nae-In LEE, Chul-Woong LEE, Hoi-Sung CHUNG, Young-Tak KIM
  • Publication number: 20170110581
    Abstract: Semiconductor devices including a stressor in a recess and methods of forming the semiconductor devices are provided. The methods may include forming a fast etching region comprising phosphorous in an active region and forming a first trench in the active region by recessing the fast etching region. The methods may also include forming a second trench in the active region by enlarging the first trench using a directional etch process and forming a stressor in the second trench. The second trench may include a notched portion of the active region.
    Type: Application
    Filed: December 29, 2016
    Publication date: April 20, 2017
    Inventors: Dong-Suk SHIN, Chul-Woong Lee, Hoi-Sung Chung, Young-Tak Kim, Nae-In Lee
  • Patent number: 9548301
    Abstract: Semiconductor devices including a stressor in a recess and methods of forming the semiconductor devices are provided. The methods may include forming a trench in an active region and the trench may include a notched portion of the active region. The methods may also include forming an embedded stressor in the trench. The embedded stressor may include a lower semiconductor layer and an upper semiconductor layer, which has a width narrower than a width of the lower semiconductor layer. A side of the upper semiconductor layer may not be aligned with a side of the lower semiconductor layer and an uppermost surface of the upper semiconductor layer may be higher than an uppermost surface of the active region.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: January 17, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Suk Shin, Hyun-Chul Kang, Dong-Hyun Roh, Pan-Kwi Park, Geo-Myung Shin, Nae-In Lee, Chul-Woong Lee, Hoi-Sung Chung, Young-Tak Kim
  • Patent number: 9537009
    Abstract: Semiconductor devices including a stressor in a recess and methods of forming the semiconductor devices are provided. The methods may include forming a fast etching region comprising phosphorous in an active region and forming a first trench in the active region by recessing the fast etching region. The methods may also include forming a second trench in the active region by enlarging the first trench using a directional etch process and forming a stressor in the second trench. The second trench may include a notched portion of the active region.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: January 3, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Suk Shin, Chul-Woong Lee, Hoi-Sung Chung, Young-Tak Kim, Nae-In Lee