Abstract: Provided are a method for generating a summary and a system therefor. The method according to some embodiments may include calculating a likelihood loss for a summary model using a first text sample and a first summary sentence corresponding to the first text sample, calculating an unlikelihood loss for the summary model using a second text sample and the first summary sentence, the second text sample being a negative sample generated from the first text sample, and updating the summary model based on the likelihood loss and the unlikelihood loss.

Abstract: Disclosed is a method for controlling the supply of solid silicon to a preliminary crucible of an ingot growth apparatus for maintaining a constant amount of molten silicon in the preliminary crucible by measuring the height of the molten silicon in the preliminary crucible.

Abstract: An apparatus for sterilizing a blood vessel in a patient's inner skin includes a generator for providing gaseous radioisotope and a chamber adapted to exposure of a portion of a patient's body to the gaseous radioisotopes. When a patient is contacted with gaseous radioisotopes, alpha and beta particles are emitted from the gaseous radioisotopes into inner skin of the patient. Ultraviolet rays, subsequently emitted from the skin, sterilize viruses or bacteria present in a blood vessel. A method of treating a patient with the apparatus is also provided.

Abstract: An apparatus for sterilizing a blood vessel in a patient's inner skin includes a generator for providing gaseous radioisotope and a chamber adapted to exposure of a portion of a patient's body to the gaseous radioisotopes. When a patient is contacted with gaseous radioisotopes, alpha and beta particles are emitted from the gaseous radioisotopes into inner skin of the patient. Ultraviolet rays, subsequently emitted from the skin, sterilize viruses or bacteria present in a blood vessel. A method of treating a patient with the apparatus is also provided.

Abstract: This invention is a radon detector for measuring the time integral concentration of radon in air and the emission rate from various kind of materials. The detector is designed with a foldable semicircle ring (4) in order to install the detector at the heigh suggested from the specialist using thread or wire without any other tools at the site. The detector is designed 3 components in order to exchange the SSTD without open the filtering part (1).

Abstract: The present invention is a photoresist remover composition used in order to remove photoresist during the manufacturing process of semiconductor devices, such as large-scale integrated circuits and very large-scale integrated circuits. The present invention comprises 2˜20 weight % of water-soluble hydroxylamine, 5˜15 weight % of oxime compound containing 2 or 3 hydroxyl groups, and 30˜55 weight % of alkyl amide. The photoresist remover composition according to the present invention can easily and quickly remove a photoresist layer that is cured by the processes of hard-bake, dry-etching, and ashing and a side-wall photoresist polymer that is produced from the lower metal film by the reaction of the photoresist with etching and ashing gases during these processes. Especially, the photoresist remover composition has a good property of removing the side-wall photoresist polymer produced from the layers of aluminum, aluminum alloy, and titanium nitride.

Abstract: The present invention relates to a resist stripper composition that is used to remove resists during semiconductor device manufacturing processes such as for large size integrated circuits, very large size integrated circuits, etc. The resist stripper composition comprises 3 to 10 wt % of an organic amine compound, 30 to 60 wt % of a solvent selected from a group consisting of DCMAc, DMF, DMI, NMP, etc., 30 to 60 wt % of water, 1 to 10 wt % of catechol, resorcin or a mixture thereof and 1 to 10 wt % of a C4-6 straight polyhydric alcohol.

Abstract: The present invention is a photoresist remover composition used in order to remove photoresist during the manufacturing process of semiconductor devices, such as large-scale integrated circuits and very large-scale integrated circuits. The present invention comprises 2-20 weight % of water-soluble hydroxylamine, 5-15 weight % of oxime compound containing 2 or 3 hydroxyl groups, and 30-55 weight % of alkyl amide. The photoresist remover composition according to the present invention can easily and quickly remove a photoresist layer that is cured by the processes of hard-bake, dry-etching, and ashing and a side-wall photoresist polymer that is produced from the lower metal film by the reaction of the photoresist with etching and ashing gases during these processes. Especially, the photoresist remover composition has a good property of removing the side-wall photoresist polymer produced from the layers of aluminum, aluminum alloy, and titanium nitride.

Abstract: The present invention relates to a resist stripper composition that is used to remove resists during semiconductor device manufacturing processes such as for large size integrated circuits, very large size integrated circuits, etc. The resist stripper composition comprises 3 to 10 wt % of an organic amine compound, 30 to 60 wt % of a solvent selected from a group consisting of DCMAc, DMF, DMI, NMP, etc., 30 to 60 wt % of water, 1 to 10 wt % of catechol, resorcin or a mixture thereof and 1 to 10 wt % of a C4-6 straight polyhydric alcohol.