Patents by Inventor Young You

Young You has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170044278
    Abstract: The present invention relates to polyolefin that has high molecular weight, wide molecular weight distribution and high long chain branch content, and thus, has excellent environmental crack resistance and processibility. The polyolefin of the present invention has excellent processibility and stability, and thus, may be preferably used as a food container, a bottle cap, and the like.
    Type: Application
    Filed: June 15, 2015
    Publication date: February 16, 2017
    Inventors: Ye Jin LEE, Yi Young CHOI, Ki Soo LEE, Ki Heon SONG, Se Young KIM, Soon Ho SUN, Sun MI KIM, Young YOU
  • Publication number: 20120009792
    Abstract: A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl?).
    Type: Application
    Filed: September 22, 2011
    Publication date: January 12, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-Dae Park, Young You, Tae-Hyo Choi, Hun-Jung Yi, Kun-Hyung Lee
  • Patent number: 8043974
    Abstract: A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl?).
    Type: Grant
    Filed: July 8, 2008
    Date of Patent: October 25, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Dae Park, Young You, Tae-Hyo Choi, Hun-Jung Yi, Kun-Hyung Lee
  • Publication number: 20090017626
    Abstract: A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl?).
    Type: Application
    Filed: July 8, 2008
    Publication date: January 15, 2009
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-Dae Park, Young You, Tae-Hyo Choi, Hun-Jung Yi, Kun-Hyung Lee
  • Publication number: 20070176321
    Abstract: A method of fabricating a flexible mold for forming a flat display panel, comprising: forming a plurality of protrusions on a flexible film, forming plated patterns between the protrusions on the flexible film, the plated patterns having an inverted shape corresponding to partitions that define one or more sub-pixel regions in the panel, and removing the protrusions to form a flexible material.
    Type: Application
    Filed: December 29, 2006
    Publication date: August 2, 2007
    Inventors: Sang Oh, Seung Oh, Joon Park, Hye Lee, Ji Kim, Soon Hong, Young You
  • Publication number: 20070126335
    Abstract: A portable display device includes a display panel, a backlight assembly having a light source for supplying light to the liquid crystal display panel and having a mold frame with a periphery step platform. A bottom chassis is combined with the mold frame, the bottom chassis having a bent unit surrounding the periphery step platform.
    Type: Application
    Filed: October 10, 2006
    Publication date: June 7, 2007
    Inventors: Young You, Yang Son, Jong Woo
  • Publication number: 20070095605
    Abstract: The present invention discloses a muffler for vehicle, being capable of augmenting engine's output power more than conventional tuning mufflers and more effectively eliminating exhaust noise. The muffler comprises: exhaust pressure control means connected to an exhaust manifold of an vehicle engine, for controlling pressure of the exhaust gas, the exhaust pressure control means comprising an exhaust pressure control plate, which is pivotally attached to a predetermined position of the exhaust pressure control part; and noise elimination means, which shapes generally a hollow pipe and is connected to the exhaust pressure control means part, the noise elimination means comprising a mesh pipe, through which the exhaust gas passes; a sound absorber enveloping the mesh pipe; and a casing enclosing the sound absorber, whose one end is connected to the exhaust pressure control means and the other end is connected to an outlet.
    Type: Application
    Filed: September 20, 2004
    Publication date: May 3, 2007
    Inventor: Young You
  • Publication number: 20050121712
    Abstract: Disclosed is a flash memory cell and method of manufacturing the same, and programming/erasing/reading method thereof. The flash memory cell comprises a first tunnel oxide film formed at a given region of a semiconductor substrate, a first floating gate formed on the first tunnel oxide film, a second tunnel oxide film formed over the semiconductor substrate and along one sidewall of the first floating gate, a second floating g ate isolated from the first floating gate while contacting the second tunnel oxide film, a dielectric film formed on the first floating gate and the second floating gate, a control gate formed on the dielectric film, a first junction region formed in the semiconductor substrate below one side of the second tunnel oxide film, and a second junction region formed in the semiconductor substrate below one side of the first tunnel oxide film. Therefore, the present invention can implement 2-bit cell or 3-bit cell of a high density using the existing process technology.
    Type: Application
    Filed: January 21, 2005
    Publication date: June 9, 2005
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Sung Park, Young You, Yong Kim, Yoo Jeon