Patents by Inventor Younggeol CHO

Younggeol CHO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dynamic optical head layer and lithography method using the same
    Patent number: 9519222
    Abstract: The present invention relates to a dynamic optical head layer in an optical lithography system forming patterns on a substrate, the dynamic optical head layer being detachably mounted on the substrate, and the dynamic optical head layer includes a first dielectric layer formed on a top portion thereof, a second dielectric layer formed on a bottom portion thereof, and an dynamic nano aperture layer formed between the first dielectric layer and the second dielectric layer, wherein the dynamic nano aperture layer is made of a material having optical anisotropy, and the first dielectric layer and the second dielectric layer are made of oxide-based materials, nitride-based materials, and carbide-based materials.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: December 13, 2016
    Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION YONSEI UNIVERSITY
    Inventors: Shinill Kang, Jungjin Han, Eikhyun Cho, Younggeol Cho, Se-Young Choi
  • Dynamic optical head layer and lithography method using the same
    Publication number: 20150248061
    Abstract: The present invention relates to a dynamic optical head Layer in an optical lithography system forming patterns on a substrate, the dynamic optical head layer being detachably mounted on the substrate, and the dynamic optical head layer includes a first dielectric layer formed on a top portion thereof, a second dielectric layer formed on a bottom portion thereof, and an dynamic nano aperture layer formed between the first dielectric layer and the second dielectric layer, wherein the dynamic nano aperture layer is made of a material having optical anisotropy, and the first dielectric layer and the second dielectric layer are made of oxide-based materials, nitride-based materials, and carbide-based materials.
    Type: Application
    Filed: March 2, 2015
    Publication date: September 3, 2015
    Inventors: Shinill KANG, Jungjin HAN, Eikhyun CHO, Younggeol CHO, Se-Young CHOI