Patents by Inventor Young Joon Han
Young Joon Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240132021Abstract: An apparatus for controlling a discharge pressure of a fluid includes: a pump configured to suck the fluid through an inlet or to discharge the sucked fluid through an outlet; a distributor connected to the pump and to an injection nozzle provided by a sensor and configured to distribute the fluid discharged from the pump to the sensor; and a controller. The controller is configured to control the pump to operate selectively in accordance with detection of contamination of the sensor and to control operation of the distributor to be forcibly delayed during operation of the pump such that the fluid distributed to the sensor, when detected as being contaminated, is controlled to reach a selected required discharge pressure of different required discharge pressures selected in accordance with water amount information and a degree of contamination of the sensor.Type: ApplicationFiled: April 30, 2023Publication date: April 25, 2024Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATION, DY AUTO CORPORATIONInventors: Young Joon Shin, Chan Mook Choi, Gyu Won Han, Jong Min Park, Jin Hee Lee, Jong Wook Lee, Min Wook Park, Seong Jun Kim, Hyeong Jun Kim, Sun Ju Kim
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Patent number: 11963358Abstract: A semiconductor memory includes metallic lines on a substrate and including an uppermost metallic line, a semiconductor conduction line on the uppermost metallic line, a vertical structure penetrating the semiconductor conduction line and metallic lines, and including a vertical structure that includes an upper channel film, a first lower channel film, and an upper connection channel film connecting the upper channel film and the first lower channel film between a bottom of the semiconductor conduction line and a bottom of the uppermost metallic line, and a first cutting line through the metallic lines and the semiconductor conduction line, and including a first upper cutting line through the semiconductor conduction line, and a first lower cutting line through the plurality of metallic lines, a width of the first upper cutting line being greater than a width of an extension line of a sidewall of the first lower cutting line.Type: GrantFiled: February 1, 2023Date of Patent: April 16, 2024Assignee: Samsung Electronics Co., Ltd.Inventors: Hyo Joon Ryu, Young Hwan Son, Seo-Goo Kang, Jung Hoon Jun, Kohji Kanamori, Jee Hoon Han
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Publication number: 20240067023Abstract: A hybrid charging device includes an alternating current (AC)-direct current (DC) converter for converting an AC input power to a first DC power; a DC-DC converter for converting a DC input power to a second DC power; a power combiner for generating a charge power for an electric vehicle from at least one of the first DC power or the second DC power; and a charge controller for controlling the AC-DC converter, the DC-DC converter and the power combiner.Type: ApplicationFiled: August 26, 2022Publication date: February 29, 2024Applicant: LG ENERGY SOLUTION, LTD.Inventors: Seung-Kyu YOON, Ho-Seung HAN, Young-joon SHIN
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Publication number: 20240066564Abstract: Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.Type: ApplicationFiled: March 27, 2023Publication date: February 29, 2024Applicant: SEMES CO., LTD.Inventors: Do Hyung KIM, Dae Hun KIM, Young Jin KIM, Tae Ho KANG, Young Joon HAN, Eun Hyeok CHOI, Jun Gwon LEE
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Patent number: 11915859Abstract: Disclosed is a core for a current transformer, which forms an upper core in a round shape, and is disposed at a position lower than the center of a power line having both ends of the upper core received, thereby minimizing the stress of a magnetic path, and increases the permeability, thereby enhancing the magnetic induction efficiency. The disclosed core for the current transformer includes an upper core curved in a semi-circular shape to have a receiving groove formed therein, and having both ends extended downwards to be disposed to be spaced apart from each other and a lower core disposed on the lower portion of the upper core, and having both ends extended upwards to be disposed to face both ends of the upper core.Type: GrantFiled: August 4, 2017Date of Patent: February 27, 2024Assignee: AMOSENSE CO., LTDInventors: Cheol-Seung Han, Won-San Na, Jin-Pyo Park, Young-Joon Kim, Jae-Jun Ko
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Publication number: 20240050990Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space; a support unit configured to support a substrate in the treating space; and a brush unit configured to clean the substrate supported on the support unit, and wherein the brush unit includes: a body having a circular-shaped cross-section; and a plurality of contact pads protruding from the body and defining a plurality of groove portions for discharging foreign substances dropped from a substrate, each groove portion defined between adjacent contact pads, and wherein a width of the groove portion near a center of the body is different from a width of the groove portion near an edge of the body.Type: ApplicationFiled: February 15, 2023Publication date: February 15, 2024Applicant: SEMES CO., LTD.Inventors: Do Hyung Kim, Dae Hun Kim, Young Jin Kim, Tae Ho Kang, Jun Gwon Lee, Young Joon Han, Eun Hyeok Choi
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Publication number: 20230215741Abstract: A substrate processing apparatus includes a nozzle unit including a nozzle tip discharging liquid to a substrate; and a liquid supply line supplying the liquid to the nozzle unit, wherein the liquid supply line includes a liquid supply pipe connected to the nozzle tip; a supply valve installed in the liquid supply pipe; and a heater disposed between the nozzle tip and the supply valve in the liquid supply pipe.Type: ApplicationFiled: October 25, 2022Publication date: July 6, 2023Inventors: Young Joon HAN, Gi Hun CHOI, Seung Tae YANG, Sang Woo PARK, Seong Hyeon KIM, Bu Young JUNG
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Publication number: 20230207355Abstract: An apparatus for treating a substrate of the present invention includes a buffer unit, an inversion unit, a first transfer chamber, a second transfer chamber, a first cleaning chamber, and a second cleaning chamber. The first transfer chamber, the inversion unit, and the second transfer chamber are sequentially arranged in one direction. The first cleaning chamber is disposed at one side of the first transfer chamber, and the second cleaning chamber is disposed at one side of the second transfer chamber. A first main transfer robot provided in the first transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the first cleaning chamber. The second main transfer robot provided in the second transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the second cleaning chamber.Type: ApplicationFiled: December 22, 2022Publication date: June 29, 2023Applicant: SEMES CO., LTD.Inventors: Kun Hee PARK, Young Joon HAN, Cheol Hwan JEONG, Dae Hun KIM, Seong Hyun YUN, Ye Jin CHOI, Eun Hyeok CHOI, Tae Ho KANG, Young Jin KIM
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Publication number: 20230207306Abstract: Disclosed is a method for treating a substrate in a plurality of chambers. The substrate treating method may include performing liquid treatment on a substrate located in a chamber through a supply line for connecting a circulation line and each of the plurality of chambers while the liquid circulates in the circulation line, wherein a flow rate per unit time of the liquid flowing downstream of a valve provided in the supply line is constantly maintained at a reference flow rate, and controlling an upstream flow rate which is a flow rate per unit time of the liquid flowing upstream of the circulation line rather than the supply lines or a downstream flow rate which is a flow rate per unit time of the liquid flowing downstream of the circulation line rather than the supply lines based on a distribution flow rate which is a flow rate per unit time of the liquid flowing upstream of the valve to maintain the reference flow rate.Type: ApplicationFiled: December 23, 2022Publication date: June 29, 2023Applicant: SEMES CO., LTD.Inventors: Do Gyeong HA, Moon Soon CHOL, Young Joon Han, Seung Tae YANG
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Publication number: 20230194422Abstract: A chemical liquid supply unit includes a chemical liquid storage storing a chemical liquid, a chemical liquid supply line that is connected to the chemical liquid storage, the chemical liquid flowing through the chemical liquid supply line from the chemical liquid storage, and a chemical liquid inspection means detecting impurities from the chemical liquid flowing through the chemical liquid supply line using a spectroscopy method.Type: ApplicationFiled: December 13, 2022Publication date: June 22, 2023Applicant: SEMES CO., LTD.Inventors: Seung Tae YANG, Sang Woo PARK, Young Joon HAN, Gi Hun CHOI, Moon Soon CHOI, Seong Hyeon KIM, Bu Young JUNG
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Publication number: 20230100773Abstract: The substrate treating apparatus includes a liquid supply unit for supplying a treating liquid to a substrate supported by a support unit, the liquid supply unit includes a nozzle member for discharging the treating liquid; and a driving member for moving the nozzle member to a standby position and a process position, the nozzle member includes a body having a buffer space and a discharge port configured to discharge the treating liquid; and a rotation member for changing the body between a first state and a second state by a rotation, the first state is a state at which a treating liquid filled in the buffer space is maintained so the treating liquid does not flow to the discharge port, and the second state is a state at which the treating liquid filled in the buffer space is discharged to an outside of the body through the discharge port.Type: ApplicationFiled: September 16, 2022Publication date: March 30, 2023Applicant: SEMES CO., LTD.Inventors: Gi Hun CHOI, Young Joon HAN
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Publication number: 20210166791Abstract: An apparatus for constructing a library for deriving a material composition using empirical result, which enables acceleration of research on the material-properties relationship. By applying the empirical results of the material composition, missing data of the material compositions can be statistically calculated by using supervised non-linear imputation techniques. The completed composition information of the materials is passed as an input of machine learning material-properties relationship prediction.Type: ApplicationFiled: December 18, 2019Publication date: June 3, 2021Inventors: Seung Bum HONG, Eun Ae CHO, Jong Min YUK, Hye Ryung BYON, Yong Soo YANG, Pyuck Pa CHOI, Jong Hwa SHIN, Hyuck Mo LEE, CHI HAO LIOW, Seong Woo CHO, Gun PARK, Yong Ju LEE, Yoon Su SHIM, Moo Ny NA, Ho Sun JUN, Ki Hoon BANG, Myung Joon KIM, Chae Hwa JEONG, Seung Gu KIM, Chung Ik OH, Hong Jun KIM, Jae Gyu KIM, Ji Min OH, Ji Won YEOM, Seong Mun EOM, Hyoung Kyu KIM, Young Joon HAN, Dae Hee LEE, Ho Jun LEE, Jae Woon KIM, Jae Wook SHIN, Hyeon Muk KANG, Jae Yeol PARK, Han Beom JEONG, Jae Sang LEE, Joon Ha CHANG, Yo Han KIM, Su Jung KIM, Hyun Jeong OH, Arthur Baucour, Jae Wook HAN, Kyu Seon JANG, Hye Sung JO, Bo Ryung YOO, Hyeon Jin PARK, Min Gwan CHO, Jun Hyung PARK, Yea Eun KIM, Seok Hwan MIN, Jung Woo CHOI, Young Tae PARK, Doo Sun HONG
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Patent number: 5678261Abstract: The present invention relates to a cushion device utilized for a bed, sofa, chair, or seat for a vehicle. The cushion device comprises an outer supporting member (20) having a shock absorbing space (10) and a cushion plate (30) to be elastically installed on the outer supporting member (20). The cushion device of the present invention comfortably accommodates a human body, and has long life.Type: GrantFiled: April 5, 1995Date of Patent: October 21, 1997Inventor: Young Joon Han