Patents by Inventor Youngmin EEH
Youngmin EEH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230062011Abstract: According to one embodiment, a magnetic memory device includes a first magnetic layer having a variable magnetisation direction, a second magnetic layer having a fixed magnetization direction, a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, a third magnetic layer provided on a lower side of the first magnetic layer, the second magnetic layer and the nonmagnetic layer, having a fixed magnetization direction antiparallel to the magnetization direction of the second magnetic layer, and formed of an alloy of cobalt (Co) and platinum (Pt), and a buffer layer provided on a lower side of the third magnetic layer and including a first layer portion containing rhenium (Re),Type: ApplicationFiled: December 9, 2021Publication date: March 2, 2023Applicant: Kioxia CorporationInventors: Tadaaki OIKAWA, Youngmin EEH, Eiji KITAGAWA, Taiga ISODA
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Publication number: 20220302372Abstract: According to one embodiment, a magnetic memory device includes a stacked structure including a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, a non-magnetic layer provided between the first magnetic layer and the second magnetic layer, and an oxide layer provided adjacent to the first magnetic layer, the first magnetic layer being provided between the non-magnetic layer and the oxide layer, and the oxide layer containing a rare earth element, boron (B), and oxygen (O).Type: ApplicationFiled: September 10, 2021Publication date: September 22, 2022Applicants: Kioxia Corporation, SK hynix Inc.Inventors: Tadaaki OIKAWA, Youngmin EEH, Eiji KITAGAWA, Kazuya SAWADA, Taiga ISODA, Ku Youl JUNG, Jin Won JUNG
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Publication number: 20220302205Abstract: According to one embodiment, a magnetic memory device includes a stacked structure including a first magnetic layer having a fixed magnetization direction, a second magnetic layer having a variable magnetization direction, a non-magnetic layer provided between the first magnetic layer and the second magnetic layer, a molybdenum (Mo) layer provided on an opposite side of the non-magnetic layer with respect to the second magnetic layer, and an oxide layer provided between the second magnetic layer and the molybdenum (Mo) layer and containing a predetermined element selected from a rare earth element, silicon (Si) and aluminum (Al).Type: ApplicationFiled: September 10, 2021Publication date: September 22, 2022Applicants: Kioxia Corporation, SK hynix Inc.Inventors: Tadaaki OIKAWA, Youngmin EEH, Eiji KITAGAWA, Taiga ISODA, Ku Youl JUNG, Jin Won JUNG
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Publication number: 20220093848Abstract: According to one embodiment, a magnetic memory device includes a first magnetic layer, a second magnetic layer and a third magnetic layer having a fixed magnetization direction antiparallel to a magnetization direction of the second magnetic layer, first, second and third nonmagnetic layers. The firs nonmagnetic layer is between the first and second magnetic layers, the second magnetic layer is between the first nonmagnetic layer and the third magnetic layer, the third magnetic layer is between the second magnetic layer and the second nonmagnetic layer, the third nonmagnetic layer is between the second and the third magnetic layers, the third magnetic layer contains Co and Pt, and the second nonmagnetic layer contains at least one of Mo and W.Type: ApplicationFiled: September 10, 2021Publication date: March 24, 2022Applicant: Kioxia CorporationInventors: Eiji KITAGAWA, Youngmin EEH, Tadaaki OIKAWA, Kazuya SAWADA, Taiga ISODA
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Patent number: 11201189Abstract: A semiconductor device includes a first rare earth oxide layer, a first magnetic layer adjacent to the first rare earth oxide layer, a second rare earth oxide layer, a second magnetic layer adjacent to the second rare earth oxide layer, and a nonmagnetic layer. The first magnetic layer is disposed between the first rare earth oxide layer and the nonmagnetic layer and is oriented in a crystal surface which is the same as a crystal surface of the nonmagnetic layer. The second magnetic layer is disposed between the second rare earth oxide layer and the nonmagnetic layer and is oriented in a crystal surface which is the same as a crystal surface of the nonmagnetic layer. The nonmagnetic layer is disposed between the first magnetic layer and the second magnetic layer.Type: GrantFiled: September 9, 2018Date of Patent: December 14, 2021Assignee: TOSHIBA MEMORY CORPORATIONInventors: Youngmin Eeh, Toshihiko Nagase, Daisuke Watanabe, Kazuya Sawada, Kenichi Yoshino, Tadaaki Oikawa, Hiroyuki Ohtori
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Patent number: 10586917Abstract: Provided is a method for fabricating an electronic device including a variable resistance element which includes a free layer formed over a substrate and having a changeable magnetization direction, a pinned layer having a pinned magnetization direction, a tunnel barrier layer interposed between the free layer and the pinned layer, and a magnetic correction layer suitable for reducing the influence of a stray field generated by the pinned layer. The method may include: cooling the substrate; and forming the magnetic correction layer over the cooled substrate.Type: GrantFiled: November 28, 2018Date of Patent: March 10, 2020Assignees: SK hynix Inc., TOSHIBA MEMORY CORPORATIONInventors: Jong-Koo Lim, Won-Joon Choi, Guk-Cheon Kim, Yang-Kon Kim, Ku-Youl Jung, Toshihiko Nagase, Youngmin Eeh, Daisuke Watanabe, Kazuya Sawada, Makoto Nagamine
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Patent number: 10573802Abstract: According to one embodiment, a magnetic memory device includes a stacked structure that includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, wherein the entire first magnetic layer exhibits a parallel or antiparallel magnetization direction to the second magnetic layer, and has an anisotropic magnetic field Hk_film within a range from ?1 kOe to +1 kOe.Type: GrantFiled: September 12, 2018Date of Patent: February 25, 2020Assignee: TOSHIBA MEMORY CORPORATIONInventors: Tatsuya Kishi, Youngmin Eeh, Kazuya Sawada, Masaru Toko
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Patent number: 10510950Abstract: A magnetoresistive memory device includes a first magnetic layer having a variable magnetization direction, a second magnetic layer, a magnetization direction of the second magnetic layer being invariable, a first nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, and a second nonmagnetic layer provided on the first magnetic layer, which is opposite the first nonmagnetic layer. The first magnetic layer has a stacked layer structure in which an amorphous magnetic material layer is sandwiched between crystalline magnetic material layers. The magnetoresistive memory device further includes nonmagnetic material layers provided between one of the crystalline magnetic material layers and the amorphous magnetic material layer, and between the other crystalline magnetic layer and the amorphous magnetic material layer, respectively.Type: GrantFiled: July 5, 2019Date of Patent: December 17, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventors: Daisuke Watanabe, Toshihiko Nagase, Youngmin Eeh, Kazuya Sawada, Makoto Nagamine, Tadaaki Oikawa, Kenichi Yoshino, Hiroyuki Ohtori
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Patent number: 10490732Abstract: According to one embodiment, a magnetic memory device includes a stacked structure including a first magnetic layer, a second magnetic layer and a nonmagnetic layer between the first magnetic layer and the second magnetic layer, and a sidewall insulating layer provided on a side surface of the stacked structure and containing boron (B).Type: GrantFiled: September 16, 2016Date of Patent: November 26, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventors: Yasuyuki Sonoda, Daisuke Watanabe, Masatoshi Yoshikawa, Youngmin Eeh, Shuichi Tsubata, Toshihiko Nagase, Yutaka Hashimoto, Kazuya Sawada, Kazuhiro Tomioka, Kenichi Yoshino, Tadaaki Oikawa
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Publication number: 20190334081Abstract: A magnetoresistive memory device includes a first magnetic layer having a variable magnetization direction, a second magnetic layer, a magnetization direction of the second magnetic layer being invariable, a first nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, and a second nonmagnetic layer provided on the first magnetic layer, which is opposite the first nonmagnetic layer. The first magnetic layer has a stacked layer structure in which an amorphous magnetic material layer is sandwiched between crystalline magnetic material layers. The magnetoresistive memory device further includes nonmagnetic material layers provided between one of the crystalline magnetic material layers and the amorphous magnetic material layer, and between the other crystalline magnetic layer and the amorphous magnetic material layer, respectively.Type: ApplicationFiled: July 5, 2019Publication date: October 31, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Daisuke WATANABE, Toshihiko NAGASE, Youngmin EEH, Kazuya SAWADA, Makoto NAGAMINE, Tadaaki OIKAWA, Kenichi YOSHINO, Hiroyuki OHTORI
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Publication number: 20190288184Abstract: According to one embodiment, a magnetic memory device includes a stacked structure that includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, wherein the entire first magnetic layer exhibits a parallel or antiparallel magnetization direction to the second magnetic layer, and has an anisotropic magnetic field Hk_film within a range from ?1 kOe to +1 kOe.Type: ApplicationFiled: September 12, 2018Publication date: September 19, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Tatsuya KISHI, Youngmin EEH, Kazuya SAWADA, Masaru TOKO
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Patent number: 10263178Abstract: According to one embodiment, a magnetic memory device includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer between the first and second magnetic layers. The second magnetic layer includes a first main surface on the nonmagnetic layer side and a second main surface opposite to the first main surface, and includes a first region on the first main surface side and a second region on the second main surface side, and an intermediate region between the first and second regions and containing a predetermined nonmagnetic element. A concentration of the predetermined nonmagnetic element in the intermediate region is higher than that in the first and second regions. The second magnetic layer contains a magnetic element from the first to second main surfaces.Type: GrantFiled: March 20, 2017Date of Patent: April 16, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventors: Kazuya Sawada, Toshihiko Nagase, Youngmin Eeh, Daisuke Watanabe, Kenichi Yoshino, Tadaaki Oikawa, Hiroyuki Ohtori
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Publication number: 20190109280Abstract: Provided is a method for fabricating an electronic device including a variable resistance element which includes a free layer formed over a substrate and having a changeable magnetization direction, a pinned layer having a pinned magnetization direction, a tunnel barrier layer interposed between the free layer and the pinned layer, and a magnetic correction layer suitable for reducing the influence of a stray field generated by the pinned layer. The method may include: cooling the substrate; and forming the magnetic correction layer over the cooled substrate.Type: ApplicationFiled: November 28, 2018Publication date: April 11, 2019Inventors: Jong-Koo LIM, Won-Joon CHOI, Guk-Cheon KIM, Yang-Kon KIM, Ku-Youl JUNG, Toshihiko NAGASE, Youngmin EEH, Daisuke WATANABE, Kazuya SAWADA, Makoto NAGAMINE
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Patent number: 10203380Abstract: An electronic device may include a semiconductor memory, and the semiconductor memory may include a free layer having a variable magnetization direction; a pinned layer having a pinned magnetization direction; and a tunnel barrier layer between the free layer and the pinned layer, wherein the free layer may include a first magnetic layer; a second magnetic layer having a smaller perpendicular magnetic anisotropy energy density than the first magnetic layer; and a spacer interposed between the first magnetic layer and the second magnetic layer.Type: GrantFiled: December 14, 2017Date of Patent: February 12, 2019Assignees: SK Hynix Inc., Toshiba Memory CorporationInventors: Ku-Youl Jung, Guk-Cheon Kim, Toshihiko Nagase, Daisuke Watanabe, Won-Joon Choi, Youngmin Eeh, Kazuya Sawada
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Publication number: 20190019841Abstract: A semiconductor device includes a first rare earth oxide layer, a first magnetic layer adjacent to the first rare earth oxide layer, a second rare earth oxide layer, a second magnetic layer adjacent to the second rare earth oxide layer, and a nonmagnetic layer. The first magnetic layer is disposed between the first rare earth oxide layer and the nonmagnetic layer and is oriented in a crystal surface which is the same as a crystal surface of the nonmagnetic layer. The second magnetic layer is disposed between the second rare earth oxide layer and the nonmagnetic layer and is oriented in a crystal surface which is the same as a crystal surface of the nonmagnetic layer. The nonmagnetic layer is disposed between the first magnetic layer and the second magnetic layer.Type: ApplicationFiled: September 9, 2018Publication date: January 17, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Youngmin EEH, Toshihiko NAGASE, Daisuke WATANABE, Kazuya SAWADA, Kenichi YOSHINO, Tadaaki OIKAWA, Hiroyuki OHTORI
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Patent number: 10170691Abstract: Provided is a method for fabricating an electronic device including a variable resistance element which includes a free layer formed over a substrate and having a changeable magnetization direction, a pinned layer having a pinned magnetization direction, a tunnel barrier layer interposed between the free layer and the pinned layer, and a magnetic correction layer suitable for reducing the influence of a stray field generated by the pinned layer. The method may include: cooling the substrate; and forming the magnetic correction layer over the cooled substrate.Type: GrantFiled: June 20, 2016Date of Patent: January 1, 2019Assignees: SK Hynix Inc., TOSHIBA MEMORY CORPORATIONInventors: Jong-Koo Lim, Won-Joon Choi, Guk-Cheon Kim, Yang-Kon Kim, Ku-Youl Jung, Toshihiko Nagase, Youngmin Eeh, Daisuke Watanabe, Kazuya Sawada, Makoto Nagamine
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Patent number: 10170519Abstract: According to one embodiment, a magnetoresistive element includes a first metal layer having a body-centered cubic structure, a second metal layer having a hexagonal close-packed structure on the first metal layer, a metal nitride layer on the second metal layer, a first magnetic layer on the metal nitride layer, an insulating layer on the first magnetic layer, and a second magnetic layer on the insulating layer.Type: GrantFiled: September 9, 2016Date of Patent: January 1, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventors: Youngmin Eeh, Toshihiko Nagase, Daisuke Watanabe, Koji Ueda, Makoto Nagamine, Kazuya Sawada
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Patent number: 10153423Abstract: An electronic device may include a semiconductor memory, and the semiconductor memory may include a free layer having a variable magnetization direction; a pinned layer having a pinned magnetization direction; a tunnel barrier layer interposed between the free layer and the pinned layer; and an under layer which is in contact with the free layer and includes a rare earth metal nitride.Type: GrantFiled: December 15, 2017Date of Patent: December 11, 2018Assignees: SK Hynix Inc., Toshiba Memory CorporationInventors: Yang-Kon Kim, Guk-Cheon Kim, Jae-Hyoung Lee, Jong-Koo Lim, Ku-Youl Jung, Toshihiko Nagase, Youngmin Eeh
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Patent number: 10103318Abstract: According to one embodiment, there is provided a magnetoresistive element, including a first magnetic layer, a nonmagnetic layer on the first magnetic layer, and a second magnetic layer on the nonmagnetic layer, wherein one of the first and second magnetic layers include one of Co and Fe, and a material having a higher standard electrode potential than Co and Fe.Type: GrantFiled: September 12, 2016Date of Patent: October 16, 2018Assignees: TOSHIBA MEMORY CORPORATION, SK HYNIX, INC.Inventors: Daisuke Watanabe, Yang Kon Kim, Makoto Nagamine, Youngmin Eeh, Koji Ueda, Toshihiko Nagase, Kazuya Sawada, Guk Cheon Kim, Bo Mi Lee, Won Joon Choi
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Publication number: 20180284199Abstract: An electronic device may include a semiconductor memory, and the semiconductor memory may include a free layer having a variable magnetization direction; a pinned layer having a pinned magnetization direction; and a tunnel barrier layer between the free layer and the pinned layer, wherein the free layer may include a first magnetic layer; a second magnetic layer having a smaller perpendicular magnetic anisotropy energy density than the first magnetic layer; and a spacer interposed between the first magnetic layer and the second magnetic layer.Type: ApplicationFiled: December 14, 2017Publication date: October 4, 2018Inventors: Ku-Youl JUNG, Guk-Cheon KIM, Toshihiko NAGASE, Daisuke WATANABE, Won-Joon CHOI, Youngmin EEH, Kazuya SAWADA