Patents by Inventor Young Mok Son

Young Mok Son has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160118587
    Abstract: An organic light-emitting display device includes a substrate which includes a plurality of areas, a plurality of first electrodes disposed on the areas of the substrate, respectively, a second electrode disposed on the first electrodes, and a plurality of emitting layers disposed between the first electrodes and the second electrode. At least two of the emitting layers are disposed on all of the areas.
    Type: Application
    Filed: January 4, 2016
    Publication date: April 28, 2016
    Inventors: CHANG HO LEE, JIN YOUNG YUN, DAE YUP SHIN, YOUNG MOK SON, IL SOO OH, HEE JOO KO, SE JIN CHO, BO RA LEE, YEON WOO LEE, PYUNG EUN JEON, HYUN JU CHOI, JI HWAN YOON, BEOM JOON KIM
  • Patent number: 9269918
    Abstract: An organic light-emitting display device includes a substrate which includes a plurality of areas, a plurality of first electrodes disposed on the areas of the substrate, respectively, a second electrode disposed on the first electrodes, and a plurality of emitting layers disposed between the first electrodes and the second electrode. At least two of the emitting layers are disposed on all of the areas.
    Type: Grant
    Filed: October 29, 2013
    Date of Patent: February 23, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Chang Ho Lee, Jin Young Yun, Dae Yup Shin, Young Mok Son, Il Soo Oh, Hee Joo Ko, Se Jin Cho, Bo Ra Lee, Yeon Woo Lee, Pyung Eun Jeon, Hyun Ju Choi, Ji Hwan Yoon, Beom Joon Kim
  • Patent number: 8912505
    Abstract: An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: December 16, 2014
    Assignees: Samsung Electronics Co., Ltd., Seoul National University Industry Foundation
    Inventors: Chan Wook Baik, Anurag Srivastava, Jong Min Kim, Sun Il Kim, Young Mok Son, Gun Sik Park, Jin Kyu So
  • Publication number: 20140353610
    Abstract: An organic light-emitting display device includes a substrate which includes a plurality of areas, a plurality of first electrodes disposed on the areas of the substrate, respectively, a second electrode disposed on the first electrodes, and a plurality of emitting layers disposed between the first electrodes and the second electrode. At least two of the emitting layers are disposed on all of the areas.
    Type: Application
    Filed: October 29, 2013
    Publication date: December 4, 2014
    Applicant: SAMSUNG DISPLAY CO., LTD.
    Inventors: CHANG HO LEE, Jin Young Yun, Dae Yup Shin, Young Mok Son, Il Soo Oh, Hee Joo Ko, Se Jin Cho, Bo Ra Lee, Yeon Woo Lee, Pyung Eun Jeon, Hyun Ju Choi, Ji Hwan Yoon, Beom Joon Kim
  • Patent number: 8846159
    Abstract: The disclosed mold includes recessed parts which have a shape corresponding to embossed portions of the barrier rib to be fabricated, and protruding parts which have a shape corresponding to depressed portions of the barrier rib to be fabricated, protrude adjacent to the recessed parts, and are tapered. The protruding parts and the recessed parts are arranged at regular intervals. It is possible to simply fabricate the two-layered barrier rib for inkjet application through a single embossing process at low cost using the mold for fabricating the barrier rib of the present invention.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: September 30, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Han Sol Cho, Yong Young Park, Joon Yong Park, Young Mok Son
  • Patent number: 8563076
    Abstract: Provided are a substrate structure and method of forming the same. The method of forming the substrate structure may include etching a substrate to form an etched portion having a vertical surface, forming a diffusion material layer on the whole substrate or in part of the substrate; annealing the diffusion material layer to form a seed layer diffused downward toward the surface of the etched portion, and forming a metal layer on the seed layer. Accordingly, surface characteristics of the etched portion of the substrate may be enhanced by the seed layer, and therefore, a metal layer with improved adhesion and a uniform thickness may be formed on the vertical surface of the etched portion.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: October 22, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chan Wook Baik, Jong Seok Kim, Sun Il Kim, Young Mok Son
  • Publication number: 20130045336
    Abstract: The disclosed mold includes recessed parts which have a shape corresponding to embossed portions of the barrier rib to be fabricated, and protruding parts which have a shape corresponding to depressed portions of the barrier rib to be fabricated, protrude adjacent to the recessed parts, and are tapered. The protruding parts and the recessed parts are arranged at regular intervals. It is possible to simply fabricate the two-layered barrier rib for inkjet application through a single embossing process at low cost using the mold for fabricating the barrier rib of the present invention.
    Type: Application
    Filed: August 23, 2012
    Publication date: February 21, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Han Sol Cho, Yong Young Park, Joon Yong Park, Young Mok Son
  • Patent number: 8304743
    Abstract: An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: November 6, 2012
    Assignees: Samsung Electronics Co., Ltd., Seoul National University Industry Foundation
    Inventors: Chan Wook Baik, Anurag Srivastava, Jong Min Kim, Sun Il Kim, Young Mok Son, Gun Sik Park, Jin Kyu So
  • Publication number: 20090289542
    Abstract: An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
    Type: Application
    Filed: October 10, 2008
    Publication date: November 26, 2009
    Inventors: Chan Wook Baik, Anurag Srivastava, Jong Min Kim, Sun Il Kim, Young Mok Son, Gun Sik Park, Jin Kyu So
  • Publication number: 20090252938
    Abstract: Provided are a substrate structure and method of forming the same. The method of forming the substrate structure may include etching a substrate to form an etched portion having a vertical surface, forming a diffusion material layer on the whole substrate or in part of the substrate; annealing the diffusion material layer to form a seed layer diffused downward toward the surface of the etched portion, and forming a metal layer on the seed layer. Accordingly, surface characteristics of the etched portion of the substrate may be enhanced by the seed layer, and therefore, a metal layer with improved adhesion and a uniform thickness may be formed on the vertical surface of the etched portion.
    Type: Application
    Filed: August 8, 2008
    Publication date: October 8, 2009
    Inventors: Chan Wook Baik, Jong Seok Kim, Sun II Kim, Young Mok Son
  • Patent number: 7336875
    Abstract: A method for treating a polymeric optical element which includes the steps of mounting a polymeric optical element into a chamber, injecting a compressed gas as an annealing medium into the chamber and annealing the polymeric optical element and removing the annealing medium from the chamber. The present method provides a new way of preventing disadvantageous molecular orientation and residual stress which causes a deterioration in the optical properties of the polymeric optical element.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: February 26, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Han Sol Cho, Jin Taek Hwang, Jin Sung Choi, Sung Hen Cho, Young Mok Son, Yong Young Park
  • Patent number: 7226804
    Abstract: A method for forming a pattern of an organic insulating film by forming an electrode on a substrate, coating an imprintable composition thereon to form an organic insulating film, pressurizing and curing the organic insulating film using a patterned mold to transfer a pattern of the mold to the organic insulating film, and etching a portion of the organic insulating film remaining on the electrode. Since a pattern of an organic insulating film can be formed by simple molding without the use of a photoresist, the overall procedure is simplified and eventually an organic thin film transistor with high charge carrier mobility can be fabricated by all wet processes.
    Type: Grant
    Filed: August 3, 2005
    Date of Patent: June 5, 2007
    Assignee: Samsung Electronic Co., Ltd.
    Inventors: Jung Han Shin, Joon Yong Park, Min Seong Ryu, Young Mok Son, Sang Yoon Lee
  • Publication number: 20040223708
    Abstract: A method for treating a polymeric optical element which includes the steps of mounting a polymeric optical element into a chamber, injecting a compressed gas as an annealing medium into the chamber and annealing the polymeric optical element and removing the annealing medium from the chamber. The present method provides a new way of preventing disadvantageous molecular orientation and residual stress which causes a deterioration in the optical properties of the polymeric optical element.
    Type: Application
    Filed: March 24, 2004
    Publication date: November 11, 2004
    Inventors: Han Sol Cho, Jin Taek Hwang, Jin Sung Choi, Sung Hen Cho, Young Mok Son, Yong Young Park