Patents by Inventor Youngran KO

Youngran KO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate treating apparatus and substrate treating method
    Patent number: 11977332
    Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a first process chamber to apply an organic solvent to a substrate applied with a developer and introduced, and a second process chamber to treat the substrate applied with the organic solvent and introduced, through a supercritical fluid.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: May 7, 2024
    Assignees: SEMES CO., LTD., Research & Business Foundation SUNGKYUNKWAN UNIVERSITY
    Inventors: Hae-Won Choi, Yerim Yeon, Anton Koriakin, Kihoon Choi, Youngran Ko, Jeong Ho Cho, Hyungseok Kang, Hong Gi Min
  • Method and apparatus for parts cleaning
    Patent number: 11967491
    Abstract: The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: April 23, 2024
    Assignee: SEMES CO., LTD.
    Inventors: Soon-Cheon Cho, Su Hyung Lee, Youngran Ko, Juyong Jang
  • METHOD AND APPARATUS FOR PARTS CLEANING
    Publication number: 20210257193
    Abstract: The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.
    Type: Application
    Filed: February 16, 2021
    Publication date: August 19, 2021
    Applicant: SEMES CO., LTD.
    Inventors: SOON-CHEON CHO, SU HYUNG LEE, YOUNGRAN KO, JUYONG JANG
  • SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
    Publication number: 20210072644
    Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a first process chamber to apply an organic solvent to a substrate applied with a developer and introduced, and a second process chamber to treat the substrate applied with the organic solvent and introduced, through a supercritical fluid.
    Type: Application
    Filed: September 11, 2020
    Publication date: March 11, 2021
    Applicants: SEMES CO., LTD., RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Hae-Won CHOI, Yerim YEON, Anton KORIAKIN, Kihoon CHOI, Youngran KO, Jeong Ho CHO, Hyungseok KANG, Hong Gi MIN