Abstract: Disclosed are an apparatus and method for adjusting a steering wheel, the apparatus including an image capturing unit configured to capture images of a current state of a steering wheel at multiple angles, an analysis unit configured to create leveling information on zero adjustment of the steering wheel by processing the image acquired by the image capturing unit, and a control unit configured to calculate an error from preset reference leveling information depending on the leveling information created by the analysis unit and performing the zero adjustment on the steering wheel by controlling a drive unit for operating the steering wheel depending on the calculated error.

Abstract: A system for inspecting vehicle pull of a vehicle includes: a sensor monitoring device that collects information for vehicle pull inspection from a sensor installed in the vehicle; a travel path measurement device that measures a travel path of the vehicle in a vehicle pull measurement section; and a vehicle pull analysis device that determines whether the vehicle passes the vehicle pull inspection, based on the sensing information collected from the sensor monitoring device and travel path measurement information collected from the travel path measurement device.

Abstract: A system for inspecting vehicle pull of a vehicle includes: a sensor monitoring device that collects information for vehicle pull inspection from a sensor installed in the vehicle; a travel path measurement device that measures a travel path of the vehicle in a vehicle pull measurement section; and a vehicle pull analysis device that determines whether the vehicle passes the vehicle pull inspection, based on the sensing information collected from the sensor monitoring device and travel path measurement information collected from the travel path measurement device.

Abstract: Implementations described herein generally relate to a method and apparatus for processing substrates in a processing system. The method includes identifying, in a buffer chamber coupled to a transfer chamber of a processing system, a first substrate that has been in the buffer chamber longer than a predetermined duration and identifying a first destination chamber of the processing system for the first substrate. After identifying the first substrate, a buffer chamber time-out operation is performed. The buffer time out operation includes suspending movement of substrates from a load lock chamber to the transfer chamber and removing the first substrate from the buffer chamber.

Abstract: Embodiments of the present invention provide systems, apparatus, and methods for protecting processing recipes. Embodiments include a remote host external to an electronic device manufacturing facility, the remote host including a recipe editor adapted to allow creating of a protected processing recipe; a material control system (MCS) within the electronic device manufacturing facility and operable to communicate with the remote host; a master controller (MC) in communication with the MCS; and at least one processing tool in communication with the MC and including volatile memory adapted to store the protected processing recipe for execution by the processing tool. The remote host is operable to transfer the protected processing recipe to the volatile memory of the processing tool without allowing the protected processing recipe to be accessible by a user within the electronic device manufacturing facility. Numerous additional aspects are disclosed.