Abstract: A substrate treating apparatus is provided to provide heating and plasma treatment of a substrate in a single device, and the substrate treating apparatus includes a treatment container in which a substrate is accommodated, a support member supporting the substrate in the treatment container, a plasma providing unit including an electrode generating plasma within the treatment container, and a microwave introducing unit connected to a microwave generating unit and introducing microwaves into the treatment container.

Abstract: A substrate treating apparatus includes a chamber having a treating space therein, a substrate support unit supporting a substrate in the treating space, a gas supply unit supplying a gas into the treating space, and a plasma generation unit exciting the gas within the treating space to generate plasma. The plasma generation unit includes an RF power supplying an RF signal, and a first antenna and a second antenna being supplied with the RF signal to generate the plasma from the gas supplied inside the treating space. The first antenna is disposed at an inside of the second antenna. The coils included in the second antenna are stacked on each other at a second height, and coils included in the first antenna are stacked on each other at a first height, the second height being greater than the first height.

Abstract: Disclosed is an apparatus for treating a substrate. The apparatus may include a chamber having a space for treating the substrate therein; a support unit supporting the substrate in the chamber; a gas supply unit supplying gas into the chamber; and a plasma generation unit exciting the gas in the chamber into a plasma state, wherein the plasma generation unit may include high frequency power supply; a first antenna; a second antenna; and a matcher connected between the high frequency power supply and the first and second antennas, wherein the matcher may include a current distributor distributing a current to the first antenna and the second antenna, and the current distributor includes a first capacitor disposed between the first antenna and the second antenna; a second capacitor connected with the second antenna in series; and a third capacitor connected with the second antenna in parallel, wherein the first capacitor and the second capacitor may be provided as variable capacitors.