Patents by Inventor Youn-Hee NAM

Youn-Hee NAM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 10323124
    Abstract: A polymer including a moiety represented by Chemical Formula 1, an organic layer composition including the polymer, an organic layer manufactured from the organic layer composition, and a method of forming patterns using the organic layer composition are provided. The definitions of the Chemical Formula 1 are the same as defined in the detailed description.
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: June 18, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Seung-Hyun Kim, Hyo-Young Kwon, Sung-Hwan Kim, Ran Namgung, Soo-Hyoun Mun, Dominea Rathwell, Hyun-Ji Song, Hyeon-Il Jung, Yu-Mi Heo
  • Method of producing layer structure, layer structure, and method of forming patterns
    Patent number: 10312074
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Min-Soo Kim, Hyun-Ji Song, Sun-Hae Kang, Sung-Min Kim, Sung-Hwan Kim, Young-Min Kim, Yun-Jun Kim, Hea-Jung Kim, Youn-Hee Nam, Jae-Yeol Baek, Byeri Yoon, Yong-Woon Yoon, Chung-Heon Lee, Seulgi Jeong, Yeon-Hee Jo, Seung-Hee Hong, Sun-Min Hwang, Won-Jong Hwang, Songse Yi, MyeongKoo Kim, Naery Yu
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 10018914
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B—*??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: July 10, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Mi-Young Kim, You-Jung Park, Yun-Jun Kim, Hea-Jung Kim, Joon-Young Moon, Hyun-Ji Song, Chung-Heon Lee, Yoo-Jeong Choi
  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9971243
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specification and * is a linking point.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 15, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yu-Shin Park, Tae-Ho Kim, Yoo-Jeong Choi, Sun-Hae Kang, Hyo-Young Kwon, Sang-Kyun Kim, Young-Min Kim, Youn-Hee Nam, Hyun-Ji Song, Byeri Yoon, Dong-Geun Lee, Seulgi Jeong
  • Organic layer composition, organic layer, and method of forming patterns
    Patent number: 9908990
    Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: March 6, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Sun-Hae Kang, Youn-Hee Nam, Min-Soo Kim, Dominea Rathwell, You-Jung Park, Hyun-Ji Song, Sun young Yang
  • Monomer, polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9862668
    Abstract: A monomer, a polymer, an organic layer composition, an organic layer and associated methods, the monomer being represented by Chemical Formula 1:
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: January 9, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Youn-Hee Nam, Hyo-Young Kwon, Sung-Hwan Kim, Seung-Hyun Kim, Ran Namgung, Dominea Rathwell, Soo-Hyoun Mun, Seulgi Jeong, Hyeon-Il Jung, Yu-Mi Heo
  • Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
    Patent number: 9683114
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: June 20, 2017
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Hea-Jung Kim, Sung-Hwan Kim, Youn-Hee Nam, Yun-Jun Kim, Joon-Young Moon, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9568825
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the Chemical Formula 1, A, B, R1 and R2 are the same as defined in the detailed description.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: February 14, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Hea-Jung Kim, Hyun-Ji Song
  • POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160363864
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specifiction and * is a linking point.
    Type: Application
    Filed: June 3, 2016
    Publication date: December 15, 2016
    Inventors: Yu-Shin PARK, Tae-Ho KIM, Yoo-Jeong CHOI, Sun-Hae KANG, Hyo-Young KWON, Sang-Kyun KIM, Young-Min KIM, Youn-Hee NAM, Hyun-Ji SONG, Byeri YOON, Dong-Geun LEE, Seulgi JEONG
  • ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160304700
    Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:
    Type: Application
    Filed: November 25, 2015
    Publication date: October 20, 2016
    Inventors: Sun-Hae KANG, Youn-Hee NAM, Min-Soo KIM, Dominea RATHWELL, You-Jung PARK, Hyun-Ji SONG, Sun young YANG
  • MONOMER, POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160145379
    Abstract: A monomer, a polymer, an organic layer composition, an organic layer and associated methods, the monomer being represented by Chemical Formula 1:
    Type: Application
    Filed: October 19, 2015
    Publication date: May 26, 2016
    Inventors: Youn-Hee NAM, Hyo-Young KWON, Sung-Hwan KIM, Seung-Hyun KIM, Ran NAMGUNG, Dominea RATHWELL, Soo-Hyoun MUN, Seulgi JEONG, Hyeon-Il JUNG, Yu-Mi HEO
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9348229
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A and B are as defined in the specification.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: May 24, 2016
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Youn-Hee Nam, Hea-Jung Kim, Sang-Kyun Kim, Sung-Hwan Kim, Yun-Jun Kim, Joon-Young Moon, Hyun-Ji Song
  • METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS
    Publication number: 20160126088
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Application
    Filed: June 16, 2015
    Publication date: May 5, 2016
    Inventors: Min-Soo KIM, Hyun-Ji SONG, Sun-Hae KANG, Sung-Min KIM, Sung-Hwan KIM, Young-Min KIM, Yun-Jun KIM, Hea-Jung KIM, Youn-Hee NAM, Jae-Yeol BAEK, Byeri YOON, Yong-Woon YOON, Chung-Heon LEE, Seulgi JEONG, Yeon-Hee JO, Seung-Hee HONG, Sun-Min HWANG, Won-Jong HWANG, Songse YI, MyeongKoo KIM, Naery YU
  • POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160090449
    Abstract: A polymer including a moiety represented by Chemical Formula 1, an organic layer composition including the polymer, an organic layer manufactured from the organic layer composition, and a method of forming patterns using the organic layer composition are provided. The definitions of the Chemical Formula 1 are the same as defined in the detailed description.
    Type: Application
    Filed: June 9, 2015
    Publication date: March 31, 2016
    Inventors: Youn-Hee NAM, Seung-Hyun KIM, Hyo-Young KWON, Sung-Hwan KIM, Ran NAMGUNG, Soo-Hyoun MUN, Dominea RATHWELL, Hyun-Ji SONG, Hyeon-Il JUNG, Yu-Mi HEO
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20160017174
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the Chemical Formula 1, A, B, R1 and R2 are the same as defined in the detailed description.
    Type: Application
    Filed: June 24, 2015
    Publication date: January 21, 2016
    Inventors: Youn-Hee NAM, Hea-Jung KIM, Hyun-Ji SONG
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150332931
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B-* ??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Application
    Filed: April 13, 2015
    Publication date: November 19, 2015
    Inventors: Youn-Hee NAM, Mi-Young KIM, You-Jung PARK, Yun-Jun KIM, Hea-Jung KIM, Joon-Young MOON, Hyun-Ji SONG, Chung-Heon LEE, Yoo-Jeong CHOI
  • MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING THE MONOMER, AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150268558
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Application
    Filed: January 30, 2015
    Publication date: September 24, 2015
    Inventors: Hea-Jung KIM, Sung-Hwan KIM, Youn-Hee NAM, Yun-Jun KIM, Joon-Young MOON, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150187589
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A and B are as defined in the specification.
    Type: Application
    Filed: October 30, 2014
    Publication date: July 2, 2015
    Inventors: Youn-Hee NAM, Hea-Jung KIM, Sang-Kyun KIM, Sung-Hwan KIM, Yun-Jun KIM, Joon-Young MOON, Hyun-Ji SONG