Patents by Inventor Youri Johannes Laurentiu VAN DOMMELEN

Youri Johannes Laurentiu VAN DOMMELEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
    Publication number: 20190170657
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Application
    Filed: February 7, 2019
    Publication date: June 6, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Maria DEN BOEF, Arno Jan BLEEKER, Youri Johannes Laurentiu VAN DOMMELEN, Mircea DUSA, Antoine Gaston Marie KIERS, Paul Frank LUEHRMANN, Henricus Petrus Maria PELLEMANS, Maurits VAN DER SCHAAR, Cedric Desire GROUWSTRA, Markus Gerardus Martinus VAN KRAAIJ
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20090284715
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Application
    Filed: April 22, 2009
    Publication date: November 19, 2009
    Applicant: ASML NETHERLAND B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic Apparatus, Reflective Member And A Method of Irradiating The Underside Of A Liquid Supply System
    Publication number: 20090027636
    Abstract: A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is disclosed. The construction of the reflector is also disclosed as is a method for irradiating the underside of a liquid supply system for use in cleaning.
    Type: Application
    Filed: September 27, 2007
    Publication date: January 29, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius LEENDERS, Youri Johannes Laurentius Van Dommelen, Hans Jansen, Robert Douglas Watso, Anthonius Martinus Petrus De Jong, Jan Willem Cromwijk, Thomas Laursen