Patents by Inventor Youssef Karel De Vos

Youssef Karel De Vos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20060077364
    Abstract: To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.
    Type: Application
    Filed: October 12, 2004
    Publication date: April 13, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Henrikus Herman Cox, Hans Butler, Ronald Kunst, Harmen Van Der Schoot, Youssef Karel De Vos