Abstract: A laser apparatus includes an oscillation stage laser configured to generate and output a pulse laser beam, and an amplification stage laser configured to amplify the pulse laser beam output from the oscillation stage laser. The amplification stage laser includes an optical resonator configured to be a transfer optical system, a first discharge electrode pair and a second discharge electrode pair separated from each other in a first direction intersecting an optical path of the optical resonator, the first and second discharge electrode pairs being disposed across the optical path and configured to alternately discharge, and a slit disposed at a transfer position of the transfer optical system and configured to limit a beam size in a second direction orthogonal to the first direction of the pulse laser beam amplified by discharge of one of the first and second discharge electrode pairs.

Abstract: A laser apparatus includes: an oscillator configured to output seed light in a pulse form; a first amplifier configured to amplify the seed light and to output first amplified light; a first beam splitter configured to split the first amplified light into first split light and second split light having energy smaller than that of the first split light; a first delay optical system configured to delay the second split light; a second amplifier configured to amplify the delayed second split light and to output second amplified light; a beam combiner configured to combine the first split light and the second amplified light and to output combined light; and a pulse stretcher configured to stretch a pulse width of the combined light.

Abstract: A laser apparatus includes an oscillator configured to output seed light in a pulse form, a first amplifier configured to amplify the seed light and to output first amplified light, a first pulse stretcher configured to stretch a pulse width of the first amplified light, a beam splitter configured to split the first amplified light having a stretched pulse width into first split light and second split light having energy smaller than that of the first split light, a second amplifier configured to amplify a part of the second split light and to output second amplified light, a second pulse stretcher configured to stretch a pulse width of the second amplified light, and a beam combiner configured to combine the first split light and the second amplified light having a stretched pulse width to output combined light.

Abstract: A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.

Abstract: A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.

Abstract: A pulse stretcher includes a beam splitter splitting pulse laser light into two beams of pulse laser light, first concave mirrors arranged side by side in a predetermined direction, and second concave mirrors arranged side by side in the predetermined direction as having the same number as the first concave mirrors and facing the first concave mirrors, respectively. One beam of pulse laser light split by the beam splitter travels to one first concave mirror among the first concave mirrors and is reflected alternately by the first concave mirrors and the second concave mirrors 12 times or more as even number times to return to the beam splitter. A number of overlapping of the one beam at each of concentration points where at least part of the one beam of pulse laser light overlaps at beam waists of the one beam is two.

Abstract: A laser apparatus includes an oscillator that outputs laser light, an amplifier, a front optical system and a rear optical system that are disposed at positions where the front and rear optical systems face each other with a chamber sandwiched therebetween and constitute a ring resonator having a first optical path and a second optical path, and first plane parallel substrates disposed on the first optical path or the second optical path. The first optical path is an optical path along which the front optical system outputs the laser light. The second optical path is an optical path along which the rear optical system outputs the laser light. The first plane parallel substrates translate the first optical path and the second optical path, respectively, in the directions in which the first and second optical paths approach each other on the side facing the chamber.

Abstract: A gas laser device includes a laser oscillator outputting laser light, and a laser amplifier amplifying the laser light and outputting the amplified laser light. The laser amplifier includes a discharge chamber accommodating electrodes for causing discharge, an input coupling optical system causing part of the laser light to be transmitted toward the discharge chamber, and an output coupling optical system configuring an optical resonator together with the input coupling optical system and causing part of the laser light transmitted through the input coupling optical system and the discharge chamber to be transmitted therethrough and output the amplified laser light. A first focal point of the input coupling optical system and a second focal point of the output coupling optical system in a first direction being perpendicular to a direction of the discharge coincides at a position between the input coupling optical system and the output coupling optical system.

Abstract: A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.

Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.