Patents by Inventor Yousuke IMAGAWA

Yousuke IMAGAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11377433
    Abstract: The present invention makes it possible to provide a method for producing a polyfunctional sulfur-containing epoxy compound, the method being characterized in that a polyfunctional thiol is reacted with an epihalohydrin in the presence of a reducing agent to form a polyfunctional sulfur-containing halohydrin, which is then reacted with a basic compound. The reducing agent is preferably at least one selected from the group consisting of sodium borohydride, lithium borohydride, lithium aluminum hydride, diisobutylaluminum hydride, and hydrazine.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: July 5, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke Imagawa, Hiroshi Horikoshi
  • Publication number: 20210340129
    Abstract: Provided is a composition for optical materials that gives optical materials which can have at least one improved property selected from among satisfactory mold releasability after polymerization and curing, unsusceptibility to separation from the mold during polymerization and curing, transparency, and low-level striae. The present invention further provides a compound represented by formula (1). The composition for optical materials comprises the compound represented by formula (1) and a compound represented by formula (2). (In formula (1), X1 and X2 represent O or S, provided that both X1 and X2 are O or that X1 is O and X2 is S.
    Type: Application
    Filed: June 27, 2019
    Publication date: November 4, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei TAKEMURA, Yousuke IMAGAWA, Hiroshi HORIKOSHI
  • Publication number: 20210253798
    Abstract: The present invention provides a composition for an optical material containing a compound (a) and/or a compound (b) and a compound (c) which are described below. In a preferable embodiment, the proportion of the compound (a) and/or the compound (b) is 0.001-30.0% by mass. The compound (a) is a compound represented by formula (1). The compound (b) is a compound represented by formula (2). The compound (c) is an episulfide compound.
    Type: Application
    Filed: August 21, 2019
    Publication date: August 19, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke IMAGAWA, Hiroshi HORIKOSHI
  • Publication number: 20210024478
    Abstract: The present invention makes it possible to provide a method for producing a polyfunctional sulfur-containing epoxy compound, the method being characterized in that a polyfunctional thiol is reacted with an epihalohydrin in the presence of a reducing agent to form a polyfunctional sulfur-containing halohydrin, which is then reacted with a basic compound. The reducing agent is preferably at least one selected from the group consisting of sodium borohydride, lithium borohydride, lithium aluminum hydride, diisobutylaluminum hydride, and hydrazine.
    Type: Application
    Filed: June 11, 2019
    Publication date: January 28, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke IMAGAWA, Hiroshi HORIKOSHI
  • Patent number: 10647819
    Abstract: According to the present invention, it is possible to provide a photocurable composition which comprises a cyclic compound (a) represented by formula (1), an episulfide compound (b), and a photopolymerization initiator (c). In a preferred embodiment, the proportion of the cyclic compound (a) in the photocurable composition is 5-80 mass %, the proportion of the episulfide compound (b) is 20-95 mass %, and the proportion of the photopolymerization initiator (c) is 0.1-10 parts by mass per 100 parts by mass of the sum of the cyclic compound (a) and the episulfide compound (b). In the formula, C represents a carbon atom, X represents S, Se, or Te, and a to f are integers of 0-3, provided that 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: May 12, 2020
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke Namiki, Yousuke Imagawa, Eiji Koshiishi, Kikuo Furukawa, Hiroshi Horikoshi
  • Patent number: 10508173
    Abstract: The present invention provides a composition for an optical material containing a ring compound (a) represented by formula (1), an episulfide compound (b), and sulfur (c), wherein the content of the ring compound (a) in the composition for an optical material is in the range of 5-70 mass %, the content of the episulfide compound (b) is in the range of 20-90 mass %, and the content of the sulfur (c) is in the range of 1-39 mass %. (In the formula, X represents S, Se or Te. a to f=0 to 3, 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).) This composition for an optical material has a high refractive index as an optical characteristic, and has sufficient heat resistance and good mold release characteristics.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: December 17, 2019
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke Imagawa, Akinobu Horita, Yoshiaki Yamamoto, Hiroshi Horikoshi
  • Publication number: 20180265638
    Abstract: According to the present invention, it is possible to provide a photocurable composition which comprises a cyclic compound (a) represented by formula (1), an episulfide compound (b), and a photopolymerization initiator (c). In a preferred embodiment, the proportion of the cyclic compound (a) in the photocurable composition is 5-80 mass %, the proportion of the episulfide compound (b) is 20-95 mass %, and the proportion of the photopolymerization initiator (c) is 0.1-10 parts by mass per 100 parts by mass of the sum of the cyclic compound (a) and the episulfide compound (b). In the formula, C represents a carbon atom, X represents S, Se, or Te, and a to f are integers of 0-3, provided that 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).
    Type: Application
    Filed: October 7, 2016
    Publication date: September 20, 2018
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke NAMIKI, Yousuke IMAGAWA, Eiji KOSHIISHI, Kikuo FURUKAWA, Hiroshi HORIKOSHI
  • Publication number: 20180127549
    Abstract: The present invention provides a composition for an optical material containing a ring compound (a) represented by formula (1), an episulfide compound (b), and sulfur (c), wherein the content of the ring compound (a) in the composition for an optical material is in the range of 5-70 mass %, the content of the episulfide compound (b) is in the range of 20-90 mass %, and the content of the sulfur (c) is in the range of 1-39 mass %. (In the formula, X represents S, Se or Te. a to f=0 to 3, 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).) This composition for an optical material has a high refractive index as an optical characteristic, and has sufficient heat resistance and good mold release characteristics.
    Type: Application
    Filed: June 10, 2016
    Publication date: May 10, 2018
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke IMAGAWA, Akinobu HORITA, Yoshiaki YAMAMOTO, Hiroshi HORIKOSHI
  • Patent number: 9658365
    Abstract: Through an optical material composition containing a compound (a), a compound (b), a polythiol (c) and sulfur (d) according to the present invention, good mold release properties are obtained, and the occurrence of separation mark defects can be suppressed. Compound (a): a compound having the structure represented by formula (1): (In formula (1), m is an integer of 0 to 4 and n is an integer of 0 to 2.) Compound (b): a compound having the structure represented by formula (2): (In formula (2), m is an integer of 0 to 4 and n is an integer of 0 to 2.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: May 23, 2017
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Akinobu Horita, Yousuke Imagawa, Teruo Kamura, Hiroshi Horikoshi
  • Publication number: 20160259091
    Abstract: Through an optical material composition containing a compound (a), a compound (b), a polythiol (c) and sulfur (d) according to the present invention, good mold release properties are obtained, and the occurrence of separation mark defects can be suppressed. Compound (a): a compound having the structure represented by formula (1): (In formula (1), m is an integer of 0 to 4 and n is an integer of 0 to 2.) Compound (b): a compound having the structure represented by formula (2): (In formula (2), m is an integer of 0 to 4 and n is an integer of 0 to 2.
    Type: Application
    Filed: December 19, 2014
    Publication date: September 8, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Akinobu HORITA, Yousuke IMAGAWA, Teruo KAMURA, Hiroshi HORIKOSHI