Abstract: A device includes a substrate and a stressed layer disposed on a first surface of the substrate. The stressed layer includes: a first set of patterns having a predetermined geometry, size, and arrangement selected to control an equibiaxial stress field of the stressed layer, wherein the equibiaxial stress field varies in magnitude over the first surface of the substrate, and a second set of patterns etched into the first set of patterns and the substrate, the second set of patterns comprising a plurality of substantially parallel lines arranged to control at least a uniaxial stress field of the stressed layer, wherein the uniaxial stress field varies in magnitude over the first surface of the substrate.

Abstract: A device includes a substrate and a stressed layer disposed on a first surface of the substrate. The stressed layer includes: a first set of patterns having a predetermined geometry, size, and arrangement selected to control an equibiaxial stress field of the stressed layer, wherein the equibiaxial stress field varies in magnitude over the first surface of the substrate, and a second set of patterns etched into the first set of patterns and the substrate, the second set of patterns comprising a plurality of substantially parallel lines arranged to control at least a uniaxial stress field of the stressed layer, wherein the uniaxial stress field varies in magnitude over the first surface of the substrate.

Abstract: A deposition system for forming a stress distributed coating layer is provided which comprises a deposition apparatus comprising a source from which a coating material emanates, the source configured to restrict a flux of the coating material towards a backside of an optical substrate; a holder configured to hold the optical substrate; a drive system configured to provide relative translation of the source and the optical substrate; and a bias voltage power supply operably coupled to the source and the optical substrate and configured to apply a bias voltage between the source and the backside of the optical substrate.

Abstract: A deposition system for forming a stress distributed coating layer is provided which comprises a deposition apparatus comprising a source from which a coating material emanates, the source configured to restrict a flux of the coating material towards a backside of an optical substrate; a holder configured to hold the optical substrate; a drive system configured to provide relative translation of the source and the optical substrate; and a bias voltage power supply operably coupled to the source and the optical substrate and configured to apply a bias voltage between the source and the backside of the optical substrate.

Abstract: A method of forming a stress distributed coating layer is provided which comprises depositing a coating material emanating from a source at a first location on a backside of an optical substrate at a first bias voltage to provide a first coating region at the first location characterized by a first stress and depositing the coating material at a second location on the backside of the optical substrate at a second bias voltage to provide a second coating region at the second location characterized by a second stress, thereby forming a stress distributed coating layer on the backside of the optical substrate comprising the first and second coating regions. Deposition systems and coated optical substrates are also provided.

Abstract: A method of forming a stress distributed coating layer is provided which comprises depositing a coating material emanating from a source at a first location on a backside of an optical substrate at a first bias voltage to provide a first coating region at the first location characterized by a first stress and depositing the coating material at a second location on the backside of the optical substrate at a second bias voltage to provide a second coating region at the second location characterized by a second stress, thereby forming a stress distributed coating layer on the backside of the optical substrate comprising the first and second coating regions. Deposition systems and coated optical substrates are also provided.