Patents by Inventor Yozi Maruyama

Yozi Maruyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming patterns
    Patent number: 4403151
    Abstract: Desired portions of the positive-type photoresist film are irradiated with an electron beam, and regions including at least the regions irradiated with the electron beam are further irradiated with ultraviolet light, followed by developing.The photosensitive radicals are destroyed in the regions which are irradiated with the electron beam. Therefore, the solubility of the photoresist film is not increased even when it is irradiated with ultraviolet light, and resist patterns are formed by developing.
    Type: Grant
    Filed: April 2, 1981
    Date of Patent: September 6, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Kozo Mochiji, Yozi Maruyama, Shinji Okazaki, Fumio Murai