Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a field plate. A gate structure overlies a substrate between a source region and a drain region. A drift region is disposed laterally between the gate structure and the drain region. A first dielectric layer overlies the substrate. A field plate is disposed within the first dielectric layer between the gate structure and the drain region. A conductive wire overlies the first dielectric layer and contacts the field plate. At least a portion of the conductive wire directly overlies a first sidewall of the drift region.

Abstract: A vehicle turning alarm method and a vehicle turning alarm device are provided herein. The vehicle turning alarm method includes acquiring map information and vehicle information. The vehicle turning alarm method further includes determining a vehicle status according to the map information and the vehicle information when a vehicle approaches an intersection. The vehicle turning alarm method further includes not sending an alert message if the vehicle status is not a left-turning event.

Abstract: A vehicle turning alarm method and a vehicle turning alarm device are provided herein. The vehicle turning alarm method includes acquiring map information and vehicle information. The vehicle turning alarm method further includes determining a vehicle status according to the map information and the vehicle information when a vehicle approaches an intersection. The vehicle turning alarm method further includes not sending an alert message if the vehicle status is not a left-turning event.

Abstract: A design method for mask patterns is provided. The design method includes providing an exposure machine with a mask including an optical proximity correction (OPC) pattern including a first clear area and a first dark area, wherein the first clear area surrounds the first dark area, placing a substrate in the exposure machine, and exposing the substrate to light to form an imaged pattern on the substrate, wherein the imaged pattern has an area smaller than that of the optical proximity correction (OPC) pattern.

Abstract: A design method for mask patterns is provided. The design method includes providing an exposure machine with a mask including an optical proximity correction (OPC) pattern including a first clear area and a first dark area, wherein the first clear area surrounds the first dark area, placing a substrate in the exposure machine, and exposing the substrate to light to form an imaged pattern on the substrate, wherein the imaged pattern has an area smaller than that of the optical proximity correction (OPC) pattern.