Abstract: An etch bias direction is determined based on a curvature of a contour in a substrate pattern. The etch bias direction is configured to be used to enhance an accuracy of a semiconductor patterning process relative to prior patterning processes. In some embodiments, a representation of the substrate pattern is received, which includes the contour in the substrate pattern. The curvature of the contour of the substrate pattern is determined, and an etch bias direction is determined based on the curvature by considering curvatures of adjacent contour portions. A simulation model is used to determine an etch effect based on the etch bias direction for an etching process on the substrate pattern.

Abstract: The application provides a panoramic perception method, system and a non-transitory computer readable medium. The panoramic perception method comprises: performing a first pretraining on a plurality of weights of a training model using the source database; performing a second pretraining with data augmentation on the plurality of weights of the training model using the source database; performing a combined training on the plurality of weights of the training model using both the source database and the target database; performing a quantization-aware training on the plurality of weights of the training model using the source database and the target database; performing a post training quantization on the plurality of weights of the training model using the target database; and performing panoramic perception by the training model.

Abstract: An image recognition system includes at least one sensor, a memory and a processor. The at least one sensor is configured to capture a plurality of images. The memory is configured to store a plurality of commands. The processor is configured for obtaining the plurality of commands from the memory to perform the following steps: capturing at least two images in the building by at least one sensor. Person detection is performed on at least two images at the first time point to obtain a first feature frame.

Abstract: A method of examining a test apparatus for a wireless network device is performed with a computer apparatus, a vector signal analyzer, and a vector signal generator and includes a signal receiving/transmitting step and a result outputting step. A transmitting signal test value and a receiving signal test value of the wireless network device test apparatus are measured by transmitting a reference signal of the vector signal generator and performing a receiving procedure of the wireless network device test apparatus and by transmitting a test signal of the wireless network device test apparatus and performing a receiving procedure of the vector signal analyzer, respectively. After the computer apparatus outputs an error of the wireless network device test apparatus and a comparison table of standard tolerance. Accordingly, the method enables self-testing to be performed and thereby dispenses with high fees charged by examination institutions for examining the test apparatus.

Abstract: A method for testing a wireless network device includes: setting a preset number of test packet samples to be received by a test apparatus, setting wireless radio frequency (RF) parameters of the wireless network device, and setting wireless RF test parameters of the test apparatus; sending, by using the wireless network device, test packets according to the wireless RF parameters, and capturing, by using the test apparatus, the test packets according to the wireless RF test parameters, so as to generate test data until a number of the captured test packets reaches the preset number of test packet samples; and operating the test data to generate a test result, thereby increasing the test efficiency of the wireless network device and improving the utilization rate of the test apparatus.