Abstract: A fabrication method is disclosed that includes: forming a first metal layer over first and second semiconductor structures; forming a first patterned photolithographic layer with an opening that exposes a portion of the first metal layer over the first semiconductor structure but not to a boundary between semiconductor structures; removing the exposed portion of the first metal layer; forming a second metal layer over the first and second semiconductor structures; forming a second patterned photolithographic layer with an opening that exposes a portion of the second metal layer over the second semiconductor structure but not to the boundary; removing the exposed portion of the first and second metal layers; wherein a barrier structure is generated between the first and second semiconductor structures that includes remaining portions of the first metal layer and a portion of the second metal layer overlying the remaining portions of the first metal layer.

Abstract: A method of manufacturing a semiconductor device includes the following steps. A photoresist layer is formed over a material layer on a substrate. The photoresist layer has a composition including a solvent and a first photo-active compound dissolved in the solvent. The first photo-active compound is represented by the following formula (A1) or formula (A2): Zr12O8(OH)14(RCO2)18 ??Formula (A1); or Hf6O4(OH)6(RCO2)10 ??Formula (A2). R in the formula (A1) and R in the formula (A2) each include one of the following formulae (1) to (6): The photoresist layer is patterned. The material layer is etched using the photoresist layer as an etch mask.

Abstract: A method of manufacturing a semiconductor device includes the following steps. A photoresist layer is formed over a material layer on a substrate. The photoresist layer has a composition including a solvent and a first photo-active compound dissolved in the solvent. The first photo-active compound is represented by the following formula (Al) or formula (A2): Zr12O8(OH)14(RCO2)18??Formula (A1); or Hf6O4(OH)6(RCO2)10??Formula (A2). R in the formula (A1) and R in the formula (A2) each include one of the following formulae (1) to (6): The photoresist layer is patterned. The material layer is etched using the photoresist layer as an etch mask.

Abstract: A device includes a transceiver and processing circuitry. The transceiver is configured to receive an input packet having an input header and forward an output packet having an output header. The processing circuitry is configured to parse the input header, determine recommendations for forwarding a payload of the input packet using a trained neural network and based on the parsed input header, and process the input packet and generate the output packet with the output header based on the recommendations and available resources.

Abstract: A network device includes processing circuitry configured to: determine whether to initiate a temporal reconfiguration or a spatial reconfiguration of a partial reconfiguration slot on a programmable device, and initiate the temporal reconfiguration or the spatial reconfiguration of the partial reconfiguration slot in response to determining that the temporal reconfiguration or the spatial reconfiguration is to be initiated.

Abstract: A network device includes processing circuitry configured to: determine whether to initiate a temporal reconfiguration or a spatial reconfiguration of a partial reconfiguration slot on a programmable device, and initiate the temporal reconfiguration or the spatial reconfiguration of the partial reconfiguration slot in response to determining that the temporal reconfiguration or the spatial reconfiguration is to be initiated.

Abstract: Various example embodiments for supporting safe port removal are presented. Various example embodiments for supporting safe port removal may be configured to support safe port removal for a port of a virtual switch. Various example embodiments for supporting safe port removal for a port of a virtual switch may be configured to support safe removal of the port of the virtual switch such that the port is no longer available for use on the virtual switch. Various example embodiments for supporting safe port removal for a port of a virtual switch may be configured to support safe removal of the port of the virtual switch by performing separate logical and physical shutdowns of the port and performing one or more functions for the port (e.g., rejecting link discovery packets, continuing to handle data packets, and so forth) between the logical and physical shutdowns of the port.

Abstract: A system, apparatus, method, and non-transitory computer readable medium for providing smart cache control for mission-critical and high-priority traffic flows may include a network device which is caused to, extract attributes from a network packet, determine whether to request a new flow rule from a network controller for the network packet based on the extracted attributes, transmit a new flow rule request to the network controller based on results of the determining, the new flow rule request including the extracted attributes, receive the new flow rule from the network controller in response to the new flow rule request, and store the new flow rule in at least one cache memory based on priority information of the new flow rule.

Abstract: A system, apparatus, method, and non-transitory computer readable medium for providing smart cache control for mission-critical and high-priority traffic flows may include a network device which is caused to, extract attributes from a network packet, determine whether to request a new flow rule from a network controller for the network packet based on the extracted attributes, transmit a new flow rule request to the network controller based on results of the determining, the new flow rule request including the extracted attributes, receive the new flow rule from the network controller in response to the new flow rule request, and store the new flow rule in at least one cache memory based on priority information of the new flow rule.

Abstract: A processor instantiates a virtual network function (VNF) and a probe to monitor at least one metric associated with the VNF. The processor also allocates a pool of ports to the probe. A transceiver establishes one or more first interfaces between the probe and one or more applications using one or more first ports from the pool of ports. Information such as metrics generated by the ports is concurrently exchange between the probe and the applications using the first interfaces. In some cases, a second interface is established between the probe and a monitoring server. The probe reports mission critical events to the applications via the first interfaces and non-mission critical events to the monitoring server via the second interface concurrently with reporting the mission critical events.

Abstract: A processor instantiates a virtual network function (VNF) and a probe to monitor at least one metric associated with the VNF. The processor also allocates a pool of ports to the probe. A transceiver establishes one or more first interfaces between the probe and one or more applications using one or more first ports from the pool of ports. Information such as metrics generated by the ports is concurrently exchange between the probe and the applications using the first interfaces. In some cases, a second interface is established between the probe and a monitoring server. The probe reports mission critical events to the applications via the first interfaces and non-mission critical events to the monitoring server via the second interface concurrently with reporting the mission critical events.