Patents by Inventor Yu-Chiao LIN

Yu-Chiao LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11943437
    Abstract: A method of decoding a bitstream by an electronic device is provided. A block unit is determined from an image frame received from the bitstream. An intra prediction mode index corresponding to one of wide-angle candidate modes is determined for the block unit. The electronic device determines whether the intra prediction mode index is different from predefined indices each corresponding to one of predefined wide-angle modes in the wide-angle candidate modes. Filtered samples are generated based on reference samples neighboring the block unit. The filtered samples are generated by an interpolation filter when the intra prediction mode index is different from the predefined indices. The filtered samples are generated by a reference filter when the intra prediction mode index is equal to at least one of the predefined indices. The block unit is reconstructed based on the filtered samples along a mode direction of the intra prediction mode index.
    Type: Grant
    Filed: July 12, 2022
    Date of Patent: March 26, 2024
    Assignee: FG Innovation Company Limited
    Inventors: Yu-Chiao Yang, Po-Han Lin
  • Publication number: 20200185259
    Abstract: A semiconductor reaction device and a semiconductor reaction method are disclosed. The semiconductor reaction device includes a vacuum chamber, a stage unit, a heating unit, and a first lifting mechanism. The stage unit carries a substrate. When the stage unit drives the substrate to rise, the substrate separates the vacuum chamber to form a reaction space and a bottom space. The heating unit is disposed in the vacuum chamber. The heating unit and the substrate are located on opposite sides of the stage unit. The first lifting mechanism connects with the heating unit so as to move the heating unit, so that the heating unit is movable relative to the stage unit. When the substrate rises to form the reaction space, the distance between the heating unit and the substrate is changed by the first lifting mechanism, thereby changing the temperature of the substrate.
    Type: Application
    Filed: November 20, 2019
    Publication date: June 11, 2020
    Inventors: Chi-Chung KEI, Chan-Yuen CHANG, Chien-Lin CHEN, Po-Heng LIU, Yu-Chiao LIN