Patents by Inventor Yu-Chih Chen

Yu-Chih Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12293831
    Abstract: A system for use in a poultry house includes a control server, a network gateway disposed in the poultry house and equipping with a wireless communication capability; a movable sensor module disposed in the poultry house, wherein the movable sensor module is movable within the poultry house for obtaining a plurality of environmental parameters associated with specific locations within the poultry house, and a sampling machine disposed in the poultry house for obtaining a sample of poultry waste on the ground of the poultry house. The movable sensor module transmits the environmental parameters to the network gateway, and the network gateway transmits the environmental parameters to the control server for processing the environmental parameters.
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: May 6, 2025
    Assignee: ACADEMIA SINICA
    Inventors: Wen-Chin Yang, Yang-Han Lee, Yu-Chuan Liang, Frederick Kin Hing Phoa, Lee-Tian Chang, Cheng-Chih Hsu, Jia-Kun Chen, Shau-Ping Lin, Chiao-Ling Hsiao
  • Patent number: 12293988
    Abstract: A semiconductor package includes a semiconductor die and a redistribution structure. The semiconductor die is laterally surrounded by a molding compound, and the semiconductor die has a conductive pillar and a complex compound sheath sandwiched between the conductive pillar and the molding compound. The redistribution structure is electrically connected with the semiconductor die and comprises a first via portion at a first side of the redistribution structure and a second via portion at a second side of the redistribution structure, and a base angle of the second via portion is greater than a base angle of the first via portion.
    Type: Grant
    Filed: July 27, 2023
    Date of Patent: May 6, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chih Chen, Hung-Jui Kuo, Yu-Hsiang Hu, Sih-Hao Liao, Hung-Chun Cho
  • Patent number: 12289893
    Abstract: A semiconductor device includes a first electrode layer, a ferroelectric layer, a first alignment layer and a second electrode layer. A material of the first alignment layer includes rare-earth metal oxide. The ferroelectric layer and the first alignment layer are disposed between the first electrode layer and the second electrode layer, and the first alignment layer is disposed between the ferroelectric layer and the first electrode layer.
    Type: Grant
    Filed: May 10, 2022
    Date of Patent: April 29, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Chieh Lu, Qing Shi, Bo-Feng Young, Yu-Chuan Shih, Sai-Hooi Yeong, Blanka Magyari-Kope, Ying-Chih Chen, Tzer-Min Shen, Yu-Ming Lin, Chung-Te Lin
  • Patent number: 12287589
    Abstract: Cleaning equipment for an EUV wafer chuck or clamp, which removes particles that have accumulated between burls on the surface of the wafer chuck. The equipment includes a spinning bi-polar electrode placed in proximity to the surface, which can attract and adsorb the charged particle residue therefrom using its generated symmetric electric field when the wafer chuck is not in use.
    Type: Grant
    Filed: September 28, 2021
    Date of Patent: April 29, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yu-Chih Huang, Yu-Kai Chiou, Chieh-Jen Cheng, Li-Jui Chen
  • Publication number: 20250133812
    Abstract: A method of forming a semiconductor device includes forming a first dielectric layer over a front side of a wafer, the wafer having a plurality of dies at the front side of the wafer, the first dielectric layer having a first shrinkage ratio smaller than a first pre-determined threshold; curing the first dielectric layer at a first temperature, where after curing the first dielectric layer, a first distance between a highest point of an upper surface of the first dielectric layer and a lowest point of the upper surface of the first dielectric layer is smaller than a second pre-determined threshold; thinning the wafer from a backside of the wafer; and performing a dicing process to separate the plurality of dies into individual dies.
    Type: Application
    Filed: December 26, 2024
    Publication date: April 24, 2025
    Inventors: Meng-Che Tu, Wei-Chih Chen, Sih-Hao Liao, Yu-Hsiang Hu, Hung-Jui Kuo, Chen-Hua Yu
  • Patent number: 12283606
    Abstract: A light-emitting device comprises a substrate; a first light-emitting unit and a second light-emitting unit formed on the substrate, each of the first light-emitting unit and the second light-emitting unit comprises a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer, wherein the first light-emitting unit comprises a first semiconductor mesa and a first surrounding part surrounding the first semiconductor mesa, and the second light-emitting unit comprises a second semiconductor mesa and a second surrounding part surrounding the second semiconductor mesa; a trench formed between the first light-emitting unit and the second light-emitting unit and exposing the substrate; a first insulating layer comprising a first opening on the first surrounding part and a second opening on the second semiconductor layer of the second light-emitting unit; and a connecting electrode comprising a first connecting part on the first
    Type: Grant
    Filed: February 15, 2024
    Date of Patent: April 22, 2025
    Assignee: EPISTAR CORPORATION
    Inventors: Chao-Hsing Chen, I-Lun Ma, Bo-Jiun Hu, Yu-Ling Lin, Chien-Chih Liao
  • Patent number: 12283545
    Abstract: A package structure includes a semiconductor die and a first redistribution circuit structure. The first redistribution circuit structure is disposed on and electrically connected to the semiconductor die, and includes a first build-up layer. The first build-up layer includes a first metallization layer and a first dielectric layer laterally wrapping the first metallization layer, wherein at least a portion of the first metallization layer is protruded out of the first dielectric layer.
    Type: Grant
    Filed: August 1, 2023
    Date of Patent: April 22, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Chi Chu, Hung-Jui Kuo, Yu-Hsiang Hu, Wei-Chih Chen
  • Publication number: 20250125159
    Abstract: A semiconductor device having dismantlable structure is provided. The method includes forming a packaged semiconductor die by mounting the semiconductor die onto a package substrate in a flip chip orientation, attaching an interposer substrate over a backside of the semiconductor die, and encapsulating with an encapsulant the semiconductor die and remaining gap region between the package substrate and the interposer substrate. A bond pad of the semiconductor die is interconnected with a conductive trace of the package substrate. The interposer substrate includes a plurality of conductive pads exposed at a top surface and interconnected with the package substrate. A dismantlable structure is attached on the top surface of the interposer substrate. A first region of the dismantlable structure covers the plurality of conductive pads.
    Type: Application
    Filed: October 11, 2023
    Publication date: April 17, 2025
    Inventors: Yu Ling Tsai, Yao Jung Chang, Yen-Chih Lin, Tzu Ya Fang, Jian Nian Chen, Yi-Hsuan Tsai
  • Patent number: 12275114
    Abstract: A belt sander includes: a power unit having a rotating shaft; a rotatable belt casing defining a track groove that is open toward the power unit and that surrounds the rotating shaft, and having a plurality of engaging portions that are arranged around the track groove; an abrasive belt drivable by the rotating shaft; and a positioning unit including a movable positioning member that is adapted for manual operation, and an engaging member that is co-movably connected to the positioning member. The positioning unit is movable between an engaging position, where the engaging member is engaged with a selected one of the engaging portions, and a releasing position, where the engaging member is disengaged from the engaging portions.
    Type: Grant
    Filed: February 17, 2022
    Date of Patent: April 15, 2025
    Assignee: Basso Industry Corp.
    Inventors: Yu-Da Chen, Ching-Chih Ho
  • Patent number: 12274070
    Abstract: A memory device and a manufacturing method thereof is described. The memory device includes a transistor structure over a substrate and a ferroelectric capacitor structure electrically connected with the transistor structure. The ferroelectric capacitor structure includes a top electrode layer, a bottom electrode layer and a ferroelectric stack sandwiched there-between. The ferroelectric stack includes a first ferroelectric layer, a first stabilizing layer, and one of a second ferroelectric layer or a second stabilizing layer. Materials of the first stabilizing layer and a second stabilizing layer include a metal oxide material.
    Type: Grant
    Filed: July 4, 2022
    Date of Patent: April 8, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Ting Lin, Wei-Chih Wen, Kai-Wen Cheng, Wu-Wei Tsai, Yu-Ming Hsiang, Yan-Yi Chen, Hai-Ching Chen, Yu-Ming Lin, Chung-Te Lin
  • Publication number: 20250111123
    Abstract: A method for checking standard cell spacing in a design includes providing a first standard cell. A cell environment of the first standard cell is determined and a first feasible distance between a first boundary of the standard cell and a boundary of a first adjacent cell based on the cell environment is determined. A second feasible distance between a second boundary of the standard cell and a boundary of a second adjacent cell based on the cell environment is determined. A feasible spacing between the first standard cell and a second standard cell is provided, and the feasible spacing is evaluated based on the first feasible distance, the second feasible distance and a cell pitch of the first standard cell. An integrated circuit is fabricated that includes the first standard cell in response on the evaluating.
    Type: Application
    Filed: September 28, 2023
    Publication date: April 3, 2025
    Inventors: Hung-Chih Ou, Yu-Sheng Lu, Wen-Hao Chen
  • Patent number: 12265119
    Abstract: A socket of a testing tool is configured to provide testing signals. A device-under-test (DUT) board is configured to provide electrical routing. An integrated circuit (IC) die is disposed between the socket and the DUT board. The testing signals are electrically routed to the IC die through the DUT board. The IC die includes a substrate in which plurality of transistors is formed. A first structure contains a plurality of first metallization components. A second structure contains a plurality of second metallization components. The first structure is disposed over a first side of the substrate. The second structure is disposed over a second side of the substrate opposite the first side. A trench extends through the DUT board and extends partially into the IC die from the second side. A signal detection tool is configured to detect electrical or optical signals generated by the IC die.
    Type: Grant
    Filed: March 30, 2023
    Date of Patent: April 1, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chien-Yi Chen, Kao-Chih Liu, Chia Hong Lin, Yu-Ting Lin, Min-Feng Ku
  • Patent number: 12266465
    Abstract: A manufacturing method of a transformer includes: winding a first winding wire around a bobbin, wherein two ends of the first winding wire are connected to a first and a second pin of the bobbin respectively; winding a second winding wire around the bobbin, wherein two ends of the second winding wire are connected to a third and a fourth pin of the bobbin respectively; and winding a third and a fourth winding wire in parallel around the bobbin, wherein two ends of the third winding wire are connected to the second and a fifth pin of the bobbin respectively, and two ends of the fourth winding wire are connected to the fifth and a sixth pin respectively. The first, the third and the fourth winding wires form a primary coil, and the second winding wire is a secondary coil.
    Type: Grant
    Filed: November 29, 2021
    Date of Patent: April 1, 2025
    Assignee: Champion Microelectronic Corp.
    Inventors: Pao Wei Lin, Wei Liang Lin, Pei Wang, Jia Yao Lin, Yu Ting Chen, Chien-Chih Lai
  • Publication number: 20250105161
    Abstract: A semiconductor device package includes a number of interposers mounted to the carrier, wherein the number of interposers may be arranged in an irregular pattern.
    Type: Application
    Filed: December 10, 2024
    Publication date: March 27, 2025
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Hao-Chih HSIEH, Tun-Ching PI, Sung-Hung CHIANG, Yu-Chang CHEN
  • Publication number: 20250107215
    Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a first capacitor conductor disposed over an isolation structure arranged within a substrate. The isolation structure laterally extends past opposing outer sidewalls of the first capacitor conductor. A capacitor dielectric is arranged along one of the opposing outer sidewalls of the first capacitor conductor and over a top surface of the first capacitor conductor. A second capacitor conductor is arranged along an outer sidewall of the capacitor dielectric and over a top surface of the capacitor dielectric. The second capacitor conductor laterally overlaps parts of both the capacitor dielectric and the first capacitor conductor.
    Type: Application
    Filed: September 22, 2023
    Publication date: March 27, 2025
    Inventors: Jhu-Min Song, Ying-Chou Chen, Yi-Kai Ciou, Chi-Te Lin, Yi-Huan Chen, Chien-Chih Chou, Fei-Yun Chen, Yu-Chang Jong
  • Publication number: 20250096059
    Abstract: A redistribution structure is made using filler-free insulating materials with high shrinkage rate. As a result, good planarity may be achieved without the need to perform a planarization of each insulating layer of the redistribution structure, thereby simplifying the formation of the redistribution structure.
    Type: Application
    Filed: December 2, 2024
    Publication date: March 20, 2025
    Inventors: Wei-Chih Chen, Sih-Hao Liao, Yu-Hsiang Hu, Hung-Jui Kuo
  • Publication number: 20250098555
    Abstract: A spatial light modulator device includes an array of spatial light modulator cells located over a substrate. Each of the spatial light modulator cells includes: a layer stack including a phase change material plate, a spacer dielectric material plate that underlies the phase change material plate, and a metallic heater plate underlying the spacer dielectric material plate and including outer sidewalls; and a pair of bottom electrode via structures contacting a respective surface segment of a bottom surface of the metallic heater plate. Each of the outer sidewalls of the metallic heater plate is vertically coincident with a respective sidewall of the spacer dielectric material plate and with a respective sidewall of the phase change material plate.
    Type: Application
    Filed: March 18, 2024
    Publication date: March 20, 2025
    Inventors: Chang-Chih Huang, Yu-Wen Wang, Wei-Fang Chen, Han-Yu Chen, Kuo-Chyuan Tzeng
  • Patent number: 12249657
    Abstract: In some implementations, one or more semiconductor processing tools may form a first terminal of a semiconductor device by depositing a tunneling oxide layer on a first portion of a body of the semiconductor device, depositing a first volume of polysilicon-based material on the tunneling oxide layer, and depositing a first dielectric layer on an upper surface and a second dielectric layer on a side surface of the first volume of polysilicon-based material. The one or more semiconductor processing tools may form a second terminal of the semiconductor device by depositing a second volume of polysilicon-based material on a second portion of the body of the semiconductor device. A side surface of the second volume of polysilicon-based material is adjacent to the second dielectric layer.
    Type: Grant
    Filed: July 26, 2023
    Date of Patent: March 11, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Chu Lin, Chi-Chung Jen, Wen-Chih Chiang, Ming-Hong Su, Yung-Han Chen, Mei-Chen Su, Chia-Ming Pan
  • Publication number: 20250080129
    Abstract: According to an aspect of the disclosure, the disclosure provides an ADC which includes not limited to: a DAC configured to generate a positive input delta voltage and a negative input delta voltage, a comparator electrically connected to the DAC and configured to receive the positive input delta voltage to generate a first digital output value and to receive the negative input delta voltage to generate a second digital output value, a logic circuit configured to receive, from the comparator, the first digital output value and the second digital output value to generate a digital quantization code according to half of a sum of the first digital output value and the second digital output value, and a calibration circuit configured to receive the digital quantization code from the logic circuit and calibrate an output of the ADC according to the digital quantization code to eliminate an offset error value.
    Type: Application
    Filed: September 11, 2023
    Publication date: March 6, 2025
    Applicant: United Microelectronics Corp.
    Inventors: Hsuan Chih Yeh, Yu-Yee Liow, Wen-Hong Hsu, Po-Hua Chen, Chihwei Wu, Pei Wen Sun
  • Publication number: 20250071912
    Abstract: A method of manufacturing an electronic device is provided. The method includes providing a substrate, disposing a composite conductive layer on the substrate, and patterning the composite conductive layer into a composite conductive pattern in two wet etching steps. Moreover, the two wet etching steps use different etching solutions.
    Type: Application
    Filed: July 24, 2024
    Publication date: February 27, 2025
    Inventors: Ming-Chih TSAI, Yu-Heng CHEN