Patents by Inventor Yu-De Lin

Yu-De Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11856789
    Abstract: A ferroelectric memory includes a first electrode, a second electrode opposite to the first electrode, a ferroelectric composite layer disposed between the first electrode and the second electrode, and a first insulating layer disposed on one side of the ferroelectric composite layer. The ferroelectric composite layer includes a first electrode layer, a second electrode layer, a ferroelectric layer and an antiferroelectric layer. The first electrode layer is opposite to the second electrode layer, and the ferroelectric layer and the antiferroelectric layer are disposed between the first electrode layer and the second electrode layer.
    Type: Grant
    Filed: July 6, 2021
    Date of Patent: December 26, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-De Lin, Po-Chun Yeh, Pei-Jer Tzeng
  • Publication number: 20220359549
    Abstract: A ferroelectric memory is provided. The ferroelectric memory includes a first electrode, a second electrode opposite to the first electrode, a ferroelectric composite layer disposed between the first electrode and the second electrode, and a first insulating layer disposed on one side of the ferroelectric composite layer.
    Type: Application
    Filed: July 6, 2021
    Publication date: November 10, 2022
    Inventors: Yu-De LIN, Po-Chun YEH, Pei-Jer TZENG
  • Patent number: 11217661
    Abstract: A ferroelectric memory is provided. The ferroelectric memory includes a substrate, a first conductive layer disposed on the substrate, a patterned oxide layer disposed on the first conductive layer and the substrate, exposing a part of the first conductive layer, a second conductive layer disposed on the exposed first conductive layer and the patterned oxide layer, an antiferroelectric layer disposed on the exposed first conductive layer and the second conductive layer, a ferroelectric layer disposed on the second conductive layer and located on the antiferroelectric layer, a conductive oxide layer disposed between the antiferroelectric layer, and a third conductive layer disposed on the conductive oxide layer and between the ferroelectric layer.
    Type: Grant
    Filed: April 7, 2020
    Date of Patent: January 4, 2022
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-De Lin, Heng-Yuan Lee, Po-Chun Yeh, Chih-Yao Wang, Hsin-Yun Yang
  • Publication number: 20210242304
    Abstract: A ferroelectric memory is provided. The ferroelectric memory includes a substrate, a first conductive layer disposed on the substrate, a patterned oxide layer disposed on the first conductive layer and the substrate, exposing a part of the first conductive layer, a second conductive layer disposed on the exposed first conductive layer and the patterned oxide layer, an antiferroelectric layer disposed on the exposed first conductive layer and the second conductive layer, a ferroelectric layer disposed on the second conductive layer and located on the antiferroelectric layer, a conductive oxide layer disposed between the antiferroelectric layer, and a third conductive layer disposed on the conductive oxide layer and between the ferroelectric layer.
    Type: Application
    Filed: April 7, 2020
    Publication date: August 5, 2021
    Inventors: Yu-De LIN, Heng-Yuan LEE, Po-Chun YEH, Chih-Yao WANG, Hsin-Yun YANG
  • Publication number: 20210174855
    Abstract: A ferroelectric memory is provided. The ferroelectric memory includes a first electrode layer having a dominant crystallographic orientation of (110) or (220), a second electrode layer opposite the first electrode layer, wherein the second electrode layer has a dominant crystallographic orientation of (110) or (220), and a ferroelectric layer disposed between the first electrode layer and the second electrode layer, wherein the ferroelectric layer has a dominant crystallographic orientation of (111).
    Type: Application
    Filed: June 19, 2020
    Publication date: June 10, 2021
    Inventors: Yu-De LIN, Heng-Yuan LEE, Po-Chun YEH, Hsin-Yun YANG
  • Patent number: 11017830
    Abstract: A ferroelectric memory is provided. The ferroelectric memory includes a first electrode layer having a dominant crystallographic orientation of (110) or (220), a second electrode layer opposite the first electrode layer, wherein the second electrode layer has a dominant crystallographic orientation of (110) or (220), and a ferroelectric layer disposed between the first electrode layer and the second electrode layer, wherein the ferroelectric layer has a dominant crystallographic orientation of (111).
    Type: Grant
    Filed: June 19, 2020
    Date of Patent: May 25, 2021
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-De Lin, Heng-Yuan Lee, Po-Chun Yeh, Hsin-Yun Yang
  • Publication number: 20210137328
    Abstract: An automatic cleaning apparatus is configured to clean a floor and emit ultraviolet light for sterilizing the floor in a cleaning mode. Upon detecting that a wall is nearby, the automatic cleaning apparatus emits ultraviolet light toward a corner formed by the floor and the wall for sterilization.
    Type: Application
    Filed: May 21, 2020
    Publication date: May 13, 2021
    Applicant: NKFG Corporation
    Inventors: Te-Li TIEN, Shao-Wei CHIU, Yu-De LIN, Hsiang-En CHIU, Han-Chien CHENG, Chih-Chang LIN
  • Patent number: 10833091
    Abstract: A ferroelectric memory is provided. The ferroelectric memory includes a first electrode, a second electrode opposite to the first electrode, at least one ferroelectric layer disposed between the first electrode and the second electrode, and at least one antiferroelectric layer disposed between the first electrode and the second electrode, wherein the antiferroelectric layer is in contact with the ferroelectric layer.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: November 10, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-De Lin, Heng-Yuan Lee, Po-Chun Yeh, Chih-Yao Wang, Hsin-Yun Yang
  • Publication number: 20200194443
    Abstract: A ferroelectric memory is provided. The ferroelectric memory includes a first electrode, a second electrode opposite to the first electrode, at least one ferroelectric layer disposed between the first electrode and the second electrode, and at least one antiferroelectric layer disposed between the first electrode and the second electrode, wherein the antiferroelectric layer is in contact with the ferroelectric layer.
    Type: Application
    Filed: February 8, 2019
    Publication date: June 18, 2020
    Applicant: Industrial Technology Research Institute
    Inventors: Yu-De LIN, Heng-Yuan LEE, Po-Chun YEH, Chih-Yao WANG, Hsin-Yun YANG
  • Publication number: 20180211997
    Abstract: A structure of random access memory includes a memory cell and a selector. The memory cell has two different conductive states according to a bias applied on the memory cell. The selector is electrically connected to the memory cell in series. An operation voltage is applied between two end terminals of the memory cell and the selector connected in series. A structure of the selector formed from multiple capacitors coupled in series, includes a plurality of dielectric layers corresponding to the capacitors; and a metal conductive layer, disposed between the dielectric layers. A material of the metal conductive layer is to resist a material inter-diffusion between adjacent two of the dielectric layers in different materials.
    Type: Application
    Filed: March 9, 2017
    Publication date: July 26, 2018
    Applicant: Industrial Technology Research Institute
    Inventors: Yu-De Lin, Heng-Yuan Lee
  • Patent number: 9257641
    Abstract: Provided is a three-dimensional resistance memory including a stack of layers. The stack of layers is encapsulated in a dielectric layer and is adjacent to at least one opening in the encapsulating dielectric layer. At least one L-shaped variable resistance spacer is disposed on at least a portion of the sidewall of the opening adjacent to the stack of layers. An electrode layer fills the remaining portion of the opening.
    Type: Grant
    Filed: September 17, 2014
    Date of Patent: February 9, 2016
    Assignee: Industrial Technology Research Institute
    Inventors: Frederick T. Chen, Tai-Yuan Wu, Yu-Sheng Chen, Wei-Su Chen, Pei-Yi Gu, Yu-De Lin
  • Publication number: 20150129827
    Abstract: Provided is a three-dimensional resistance memory including a stack of layers. The stack of layers is encapsulated in a dielectric layer and is adjacent to at least one opening in the encapsulating dielectric layer. At least one L-shaped variable resistance spacer is disposed on at least a portion of the sidewall of the opening adjacent to the stack of layers. An electrode layer fills the remaining portion of the opening.
    Type: Application
    Filed: September 17, 2014
    Publication date: May 14, 2015
    Inventors: Frederick T. Chen, Tai-Yuan Wu, Yu-Sheng Chen, Wei-Su Chen, Pei-Yi Gu, Yu-De Lin
  • Patent number: 7862783
    Abstract: A separation system for a methyl acetate hydrolysis is provided. The separation system comprises a reactive distillation system, a reflux system, a first separation system and a second separation. The reactive distillation system allows the hydrolysis of a methyl acetate solution to generate a first mixture and a second mixture. The reflux system is packed with a heterogeneous catalyst and coupled to the reactive distillation system, which refluxes the first mixture to the reactive distillation system. The first separation system is coupled to the reactive distillation system, which directs the second mixture thereinto so as to isolate an acetic acid and a third mixture therefrom. The second separation system is coupled to the first separation system, which directs the third mixture thereintio so as to separate a methanol therefrom. The methyl acetate feeding system is coupled to, one of the reactive distillation system and the reflux system, which feeds the methyl acetate solution thereinto.
    Type: Grant
    Filed: January 30, 2007
    Date of Patent: January 4, 2011
    Assignee: National Taiwan University
    Inventors: Hsiao-Ping Huang, Cheng-Ching Yu, Ming-Jer Lee, Yu-De Lin, Jian-Kai Cheng
  • Publication number: 20080128262
    Abstract: A separation system for a methyl acetate hydrolysis is provided. The separation system comprises a reactive distillation system, a reflux system, a first separation system and a second separation. The reactive distillation system allows the hydrolysis of a methyl acetate solution to generate a first mixture and a second mixture. The reflux system is packed with a heterogeneous catalyst and coupled to the reactive distillation system, which refluxes the first mixture to the reactive distillation system. The first separation system is coupled to the reactive distillation system, which directs the second mixture thereinto so as to isolate an acetic acid and a third mixture therefrom. The second separation system is coupled to the first separation system, which directs the third mixture thereintio so as to separate a methanol therefrom. The methyl acetate feeding system is coupled to, one of the reactive distillation system and the reflux system, which feeds the methyl acetate solution thereinto.
    Type: Application
    Filed: January 30, 2007
    Publication date: June 5, 2008
    Applicant: National Taiwan University
    Inventors: Hsiao-Ping Huang, Cheng-Ching Yu, Ming-Jer Lee, Yu-De Lin, Jian-Kai Cheng