Patents by Inventor Yu Dong Li

Yu Dong Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240045039
    Abstract: A data processing method includes performing a conditional logical process and an image difference calculation by a vector calculating unit in an intelligence processing unit (IPU) according to sensing data generated by a time-of-flight ranging device to generate depth data, and performing a filter process by a multiply-accumulate calculation unit in the IPU according to the depth data to generate output data.
    Type: Application
    Filed: April 27, 2023
    Publication date: February 8, 2024
    Inventor: Yu-Dong LI
  • Publication number: 20080080372
    Abstract: A system and method for policy management based routing and filtering of charging data records (CDRs) used to bill for services provided by an Internet Protocol Multimedia Subsystem (IMS). The system includes a Vortex Rule Engine (VRE), which includes handling instructions for routing CDRs, and a CDR routing unit. The CDR routing unit receives a CDR, sends a query to the VRE for handling instructions relating to the received CDR, and routes the CDR based on the handling instructions received from the VRE in response to the query. The method includes the steps of receiving a CDR from a charging data function (CDF), sending a query relating to the CDR to a vortex rule engine (VRE), and routing the CDR to a storage location based on instructions received from the VRE.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 3, 2008
    Inventors: Yigang Cai, Yu Dong Li, Chun Guang Xu
  • Publication number: 20030077849
    Abstract: A method for depositing ohmic contact material in a semiconductor, ridge type waveguide device is provided. Ohmic contact material is deposited on a semiconductor wafer and a ridge is fabricated with the deposited material and a first layer of photoresist material. A dielectric material layer is deposited on the ridge and a second photoresist material layer is deposited on the dielectric material layer. The second photoresist material layer is opened to expose the ohmic contact layer and any extra metal overhang is removed to expose the self-aligned ohmic contact layer on the ridge.
    Type: Application
    Filed: October 19, 2001
    Publication date: April 24, 2003
    Inventors: Yet-Zen Liu, Yu Dong Li