Abstract: With a charging control apparatus, a current SOC and target SOC of a battery and an electricity cost per unit power of charging equipment are acquired. Then, a charging schedule is set that lowers the deterioration acceleration of the battery by making a comparison between the current SOC and the target SOC, while considering the electricity cost.

Abstract: There is provided an apparatus for removing fine particles having membranes for removing fine particles in a liquid, wherein a microfiltration membrane or ultrafiltration membrane having a positive charge and a microfiltration membrane or ultrafiltration membrane having a negative charge are arranged in series. There is also provided a method for removing fine particles using the apparatus. Liquids may be passed through the membrane having a negative charge and the membrane having a positive charge in order; thereby, extrafine particles having a particle size of 50 nm or smaller, especially of 10 nm or smaller, in the liquids can be removed highly. The liquid passing may be carried out in the order reverse thereto.

Abstract: An organic solvent treatment method for removing particulates from an organic solvent used in a manufacturing step of electronic components is characterized by comprising a step of bringing the organic solvent into contact with a treatment material that has a positive or negative electric charge in water and has a moisture content of 3% by mass or more. An organic solvent treatment material, which is to be used in the manufacturing step of electronic components and which is for removing particulates from an organic solvent by coming into contact with the organic solvent used in the manufacturing step of electronic components, has a positive or negative electric charge in water.

Abstract: An apparatus has a platinum group metal carrying resin column provided in a supply line of ultrapure water, and has a pH adjuster injection device and a redox potential adjuster injection device provided in a later stage thereof. The apparatus has a membrane-type deaeration apparatus and a gas dissolving membrane apparatus sequentially provided in a later stage of the devices, and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are each provided at some midpoint in the discharge line, and the pH meter and the ORP meter are connected to a control device. Then, the control device controls the amount of adjusters to be injected from the pH adjuster injection device and the redox potential adjuster injection device, on the basis of the measurement results of the pH meter and the ORP meter.

Abstract: A diluted chemical liquid production apparatus has a structure that has a platinum group metal carrying resin column, a membrane-type deaeration apparatus and a gas dissolving membrane apparatus, which are sequentially provided in a supply line of ultrapure water; and has a pH adjuster injection device and an oxidation-reduction potential adjuster injection device, which are provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gaseous phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to the gaseous phase side of the gas dissolving membrane apparatus; and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are provided in the discharge line. Such a diluted chemical liquid production apparatus can control a pH and an oxidation-reduction potential.

Abstract: A permselective membrane is provided with a support membrane having selective permeability, and a coating layer formed on a surface of the support membrane and including a lipid bilayer membrane containing a channel substance. The support membrane includes a polyamide membrane providing permeation flux of 35 L/(m2·h) or more at a pressure of 0.1 MPa. A method for producing the permselective membrane includes a step of treating a polyamide membrane with chlorine to produce the support membrane and a step of forming the lipid bilayer membrane on the support membrane.

Abstract: A communication device includes a first substrate including antennas including a first antenna and a second antenna, and a battery including a principal surface and being used as a power source of a circuit connected to the antennas. The battery, when viewed in a direction perpendicular or substantially perpendicular to the principal surface of the battery, is disposed between the first antenna and the second antenna, and a portion or all of the first antenna and the second antenna overlap with the battery, when viewed in a direction in parallel or substantially parallel to the principal surface of the battery.

Abstract: A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.

Abstract: An apparatus has a platinum group metal carrying resin column provided in a supply line of ultrapure water, and has a pH adjuster injection device and a redox potential adjuster injection device provided in a later stage thereof. The apparatus has a membrane-type deaeration apparatus and a gas dissolving membrane apparatus sequentially provided in a later stage of the devices, and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are each provided at some midpoint in the discharge line, and the pH meter and the ORP meter are connected to a control device. Then, the control device controls the amount of adjusters to be injected from the pH adjuster injection device and the redox potential adjuster injection device, on the basis of the measurement results of the pH meter and the ORP meter.

Abstract: A diluted chemical liquid production apparatus has a structure that has a platinum group metal carrying resin column 2, a membrane-type deaeration apparatus 3 and a gas dissolving membrane apparatus 4, which are sequentially provided in a supply line 1 of ultrapure water W; and has a pH adjuster injection device 5A and an oxidation-reduction potential adjuster injection device 5B, which are provided between the platinum group metal carrying resin column 2 and the membrane-type deaeration apparatus 3. An inert gas source 6 is connected to a gaseous phase side of the membrane-type deaeration apparatus 3, and an inert gas source 7 is also connected to the gaseous phase side of the gas dissolving membrane apparatus 4; and a discharge line 8 communicates with the gas dissolving membrane apparatus 4. A pH meter 10A and an ORP meter 10B are provided in the discharge line 8. Such a diluted chemical liquid production apparatus can control a pH and an oxidation-reduction potential.

Abstract: A cleaning apparatus (10) for a semiconductor substrate that cleans a semiconductor substrate by using ozone water, including cooling means (3) for cooling ozone water (W2) of 20° C. or more to a predetermined temperature, and cleaning means (4) for cleaning a substrate by using ozone water (W3) cooled by the cooling means (3). The cleaning means (4) has a cleaning tank (41) for cleaning the substrate by immersing the substrate in the ozone water (W3) cooled by the cooling means (3). According to a cleaning method using the semiconductor substrate cleaning apparatus (10), by immersing a semiconductor substrate in ozone water, organic substances, such as resist, and metal foreign materials remaining on the substrate surface are cleaned and removed, and the loss of substrate material in a cleaning step can be reduced.

Abstract: A communication device includes a first substrate including antennas including a first antenna and a second antenna, and a battery including a principal surface and being used as a power source of a circuit connected to the antennas. The battery, when viewed in a direction perpendicular or substantially perpendicular to the principal surface of the battery, is disposed between the first antenna and the second antenna, and a portion or all of the first antenna and the second antenna overlap with the battery, when viewed in a direction in parallel or substantially parallel to the principal surface of the battery.

Abstract: A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.