Patents by Inventor Yu-Hsia Fan

Yu-Hsia Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5707785
    Abstract: The invention provides a spacer structure and a method of forming the spacer structure for providing uniform spacing between two transparent substrates of a Liquid Crystal Display. The spacer structure uses positive photoresist pads formed on opaque pads. The opaque pads are formed on one surface of one of the transparent substrates. The positive photoresist pads are formed using the opaque pads as a mask when exposing a layer of positive photoresist. The positive photoresist pads are self aligned to the opaque pads. The self alignment of the positive photoresist pads with the opaque pads make it possible to form several layers of positive photoresist pads on each opaque pad to achieve the desired spacer height.
    Type: Grant
    Filed: January 22, 1996
    Date of Patent: January 13, 1998
    Assignee: Industrial Technology Research Institute
    Inventors: Ting-chiang Hsieh, Yu-Hsia Fan, Chin-Chen Lo