Patents by Inventor Yu-Hsiang Hung
Yu-Hsiang Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240143112Abstract: A touch sensing apparatus includes a panel with touch detection function and a touch detection circuitry. The touch detection circuitry is coupled to the panel, and is configured to detect a touch operation on the panel, record an error event of the touch sensing apparatus, and write the error event into an external storage medium via a data transmission interface thereof.Type: ApplicationFiled: October 28, 2022Publication date: May 2, 2024Inventors: Yu Nian OU, Chun Kai CHUANG, Pei-Yuan HUNG, Yung Hsiang LIN
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Patent number: 11972077Abstract: A resetting system includes a driver that controls a touchscreen, the driver including a driver communication interface that defines a bus for transferring a transfer signal; and an on-screen display (OSD) device that generates an OSD signal representing a predetermined reset image in response to a predetermined event, the OSD signal superimposing over pixels and graphics data to be rendered on the touchscreen; and a host that transfers the transfer signal to or from the driver, the host including a host communication interface that defines the bus for transferring the transfer signal to or from the driver.Type: GrantFiled: April 29, 2023Date of Patent: April 30, 2024Assignee: Himax Technologies LimitedInventors: Yu-Nian Ou, Chun-Kai Chuang, Pei-Yuan Hung, Yu-Hsiang Lin
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Patent number: 11972951Abstract: The present disclosure relates to a method for fabricating a semiconductor structure. The method includes providing a substrate with a gate structure, an insulating structure over the gate structure, and a S/D region; depositing a titanium silicide layer over the S/D region with a first chemical vapor deposition (CVD) process. The first CVD process includes a first hydrogen gas flow. The method also includes depositing a titanium nitride layer over the insulating structure with a second CVD process. The second CVD process includes a second hydrogen gas flow. The first and second CVD processes are performed in a single reaction chamber and a flow rate of the first hydrogen gas flow is higher than a flow rate of the second hydrogen gas flow.Type: GrantFiled: April 4, 2022Date of Patent: April 30, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Cheng-Wei Chang, Kao-Feng Lin, Min-Hsiu Hung, Yi-Hsiang Chao, Huang-Yi Huang, Yu-Ting Lin
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Patent number: 11948975Abstract: A method for fabricating semiconductor device includes the steps of: forming a gate structure on a substrate; forming a spacer around the gate structure; and forming a buffer layer adjacent to the gate structure. Preferably, the buffer layer includes a crescent moon shape and the buffer layer includes an inner curve, an outer curve, and a planar surface connecting the inner curve and an outer curve along a top surface of the substrate, in which the planar surface directly contacts the outer curve on an outer sidewall of the spacer.Type: GrantFiled: October 24, 2021Date of Patent: April 2, 2024Assignee: UNITED MICROELECTRONICS CORP.Inventors: Chih-Kai Hsu, Ssu-I Fu, Yu-Hsiang Hung, Wei-Chi Cheng, Jyh-Shyang Jenq
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Patent number: 11737257Abstract: The present invention provides a semiconductor device, the semiconductor device includes a substrate, at least one bit line is disposed on the substrate, a rounding hard mask is disposed on the bit line, and the rounding hard mask defines a top portion and a bottom portion, and at least one storage node contact plug, located adjacent to the bit line, the storage node contact structure plug includes at least one conductive layer, from a cross-sectional view, the storage node contact plug defines a width X1 and a width X2. The width X1 is aligned with the top portion of the rounding hard mask in a horizontal direction, and the width X2 is aligned with the bottom portion of the rounding hard mask in the horizontal direction, X1 is greater than or equal to X2.Type: GrantFiled: March 8, 2021Date of Patent: August 22, 2023Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Li-Wei Feng, Yu-Hsiang Hung, Ming-Te Wei
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Publication number: 20230207647Abstract: A semiconductor device includes a semiconductor substrate, a first gate oxide layer, and a first source/drain doped region. The first gate oxide layer is disposed on the semiconductor substrate, and the first gate oxide layer includes a main portion and an edge portion having a sloping sidewall. The first source/drain doped region is disposed in the semiconductor substrate and located adjacent to the edge portion of the first gate oxide layer. The first source/drain doped region includes a first portion and a second portion. The first portion is disposed under the edge portion of the first gate oxide layer in a vertical direction, and the second portion is connected with the first portion.Type: ApplicationFiled: March 1, 2023Publication date: June 29, 2023Applicant: UNITED MICROELECTRONICS CORP.Inventors: Ming-Hua Tsai, Jung Han, Ming-Chi Li, Chih-Mou Lin, Yu-Hsiang Hung, Yu-Hsiang Lin, Tzu-Lang Shih
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Patent number: 11626500Abstract: A semiconductor device includes a semiconductor substrate, a first gate oxide layer, and a first source/drain doped region. The first gate oxide layer is disposed on the semiconductor substrate, and the first gate oxide layer includes a main portion and an edge portion having a sloping sidewall. The first source/drain doped region is disposed in the semiconductor substrate and located adjacent to the edge portion of the first gate oxide layer. The first source/drain doped region includes a first portion and a second portion. The first portion is disposed under the edge portion of the first gate oxide layer in a vertical direction, and the second portion is connected with the first portion.Type: GrantFiled: July 8, 2021Date of Patent: April 11, 2023Assignee: UNITED MICROELECTRONICS CORP.Inventors: Ming-Hua Tsai, Jung Han, Ming-Chi Li, Chih-Mou Lin, Yu-Hsiang Hung, Yu-Hsiang Lin, Tzu-Lang Shih
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Publication number: 20230105690Abstract: A semiconductor device includes a semiconductor substrate, a first gate oxide layer, and a first source/drain doped region. The first gate oxide layer is disposed on the semiconductor substrate, and the first gate oxide layer includes a main portion and an edge portion having a sloping sidewall. The first source/drain doped region is disposed in the semiconductor substrate and located adjacent to the edge portion of the first gate oxide layer. The first source/drain doped region includes a first portion and a second portion. The first portion is disposed under the edge portion of the first gate oxide layer in a vertical direction, and the second portion is connected with the first portion.Type: ApplicationFiled: December 8, 2022Publication date: April 6, 2023Applicant: UNITED MICROELECTRONICS CORP.Inventors: Ming-Hua Tsai, Jung Han, Ming-Chi Li, Chih-Mou Lin, Yu-Hsiang Hung, Yu-Hsiang Lin, Tzu-Lang Shih
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Publication number: 20220376071Abstract: A semiconductor device includes a semiconductor substrate, a first gate oxide layer, and a first source/drain doped region. The first gate oxide layer is disposed on the semiconductor substrate, and the first gate oxide layer includes a main portion and an edge portion having a sloping sidewall. The first source/drain doped region is disposed in the semiconductor substrate and located adjacent to the edge portion of the first gate oxide layer. The first source/drain doped region includes a first portion and a second portion. The first portion is disposed under the edge portion of the first gate oxide layer in a vertical direction, and the second portion is connected with the first portion.Type: ApplicationFiled: July 8, 2021Publication date: November 24, 2022Applicant: UNITED MICROELECTRONICS CORP.Inventors: Ming-Hua Tsai, Jung Han, Ming-Chi Li, Chih-Mou Lin, Yu-Hsiang Hung, Yu-Hsiang Lin, Tzu-Lang Shih
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Publication number: 20220045170Abstract: A method for fabricating semiconductor device includes the steps of: forming a gate structure on a substrate; forming a spacer around the gate structure; and forming a buffer layer adjacent to the gate structure. Preferably, the buffer layer includes a crescent moon shape and the buffer layer includes an inner curve, an outer curve, and a planar surface connecting the inner curve and an outer curve along a top surface of the substrate, in which the planar surface directly contacts the outer curve on an outer sidewall of the spacer.Type: ApplicationFiled: October 24, 2021Publication date: February 10, 2022Applicant: UNITED MICROELECTRONICS CORP.Inventors: Chih-Kai Hsu, Ssu-I Fu, Yu-Hsiang Hung, Wei-Chi Cheng, Jyh-Shyang Jenq
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Patent number: 11189695Abstract: A method for fabricating semiconductor device includes the steps of: forming a gate structure on a substrate; forming a spacer around the gate structure; and forming a buffer layer adjacent to the gate structure. Preferably, the buffer layer includes a crescent moon shape and the buffer layer includes an inner curve, an outer curve, and a planar surface connecting the inner curve and an outer curve along a top surface of the substrate, in which the planar surface directly contacts the outer curve on an outer sidewall of the spacer.Type: GrantFiled: December 4, 2019Date of Patent: November 30, 2021Assignee: UNITED MICROELECTRONICS CORP.Inventors: Chih-Kai Hsu, Ssu-I Fu, Yu-Hsiang Hung, Wei-Chi Cheng, Jyh-Shyang Jenq
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Publication number: 20210193668Abstract: The present invention provides a semiconductor device, the semiconductor device includes a substrate, at least one bit line is disposed on the substrate, a rounding hard mask is disposed on the bit line, and the rounding hard mask defines a top portion and a bottom portion, and at least one storage node contact plug, located adjacent to the bit line, the storage node contact structure plug includes at least one conductive layer, from a cross-sectional view, the storage node contact plug defines a width X1 and a width X2. The width X1 is aligned with the top portion of the rounding hard mask in a horizontal direction, and the width X2 is aligned with the bottom portion of the rounding hard mask in the horizontal direction, X1 is greater than or equal to X2.Type: ApplicationFiled: March 8, 2021Publication date: June 24, 2021Inventors: Li-Wei Feng, Yu-Hsiang Hung, Ming-Te Wei
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Patent number: 10978457Abstract: The present invention provides a semiconductor device, the semiconductor device includes a substrate, at least one bit line is disposed on the substrate, a rounding hard mask is disposed on the bit line, and the rounding hard mask defines a top portion and a bottom portion, and at least one storage node contact plug, located adjacent to the bit line, the storage node contact structure plug includes at least one conductive layer, from a cross-sectional view, the storage node contact plug defines a width X1 and a width X2. The width X1 is aligned with the top portion of the rounding hard mask in a horizontal direction, and the width X2 is aligned with the bottom portion of the rounding hard mask in the horizontal direction, X1 is greater than or equal to X2.Type: GrantFiled: October 31, 2018Date of Patent: April 13, 2021Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Li-Wei Feng, Yu-Hsiang Hung, Ming-Te Wei
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Patent number: 10978398Abstract: A method for fabricating semiconductor device is disclosed. The method includes the steps of: providing a substrate; forming a gate structure on the substrate; forming an epitaxial layer adjacent to the gate structure; forming an interlayer dielectric (ILD) layer on the gate structure; forming a first contact hole in the ILD layer adjacent to the gate structure; and forming a cap layer in the recess, in which a top surface of the cap layer is even with or lower than a top surface of the substrate.Type: GrantFiled: January 1, 2020Date of Patent: April 13, 2021Assignee: UNITED MICROELECTRONICS CORP.Inventors: Chih-Kai Hsu, Yu-Hsiang Hung, Wei-Chi Cheng, Ssu-I Fu, Jyh-Shyang Jenq
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Patent number: 10930517Abstract: A fin-shaped structure includes a substrate having a first fin-shaped structure located in a first area and a second fin-shaped structure located in a second area, wherein the second fin-shaped structure includes a ladder-shaped cross-sectional profile part. The present invention also provides two methods of forming this fin-shaped structure. In one case, a substrate having a first fin-shaped structure and a second fin-shaped structure is provided. A treatment process is performed to modify an external surface of the top of the second fin-shaped structure, thereby forming a modified part. A removing process is performed to remove the modified part through a high removing selectivity to the first fin-shaped structure and the second fin-shaped structure, and the modified part, thereby the second fin-shaped structure having a ladder-shaped cross-sectional profile part is formed.Type: GrantFiled: August 6, 2019Date of Patent: February 23, 2021Assignee: UNITED MICROELECTRONICS CORP.Inventors: Wen-Jiun Shen, Ssu-I Fu, Yen-Liang Wu, Chia-Jong Liu, Yu-Hsiang Hung, Chung-Fu Chang, Man-Ling Lu, Yi-Wei Chen
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Patent number: 10839516Abstract: A simulate segmentation method of cylinder and pie cake digital models utilizes a three-dimensional model and a reference point to cope with various shapes of the nuclear reactor structures. The segmentation simulation of the nuclear reactor structure is conducted with genetic algorithm. The segmentation simulation of the nuclear reactor structure is achieved by using the genetic algorithm to perform a double selection mechanism on the cross-sectional area of the nuclear reactor structure to select the optimal configuration of the segmentation, thus minimizing the cross-sectional areas of the nuclear reactor structure. The cutter segments the nuclear reactor structure based on the optimal configuration of the segmentation, thereby achieving the purpose of minimizing the attrition rate of a cutter and segmenting the nuclear reactor structure.Type: GrantFiled: March 15, 2019Date of Patent: November 17, 2020Assignee: INSTITUTE OF NUCLEAR ENERGY RESEARCH, ATOMIC ENERGY COUNCIL, EXECUTIVE YUANInventors: Yu-Hsiang Hung, Chung-Hao Huang, Shiang-Fong Chen, Po-Chou Tsai
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Patent number: 10795255Abstract: A method of forming a layout definition of a semiconductor device includes the following steps. Firstly, a plurality of first patterns is established to form a material layer over a substrate, with the first patterns being regularly arranged in a plurality of columns along a first direction to form an array arrangement. Next, a plurality of second patterns is established to surround the first patterns. Then, a third pattern is established to form a blocking layer on the material layer, with the third pattern being overlapped with a portion of the second patterns and with at least one of the second patterns being partially exposed from the third pattern. Finally, the first patterns are used to form a plurality of first openings in a stacked structure on the substrate to expose a portion of the substrate respectively.Type: GrantFiled: October 31, 2018Date of Patent: October 6, 2020Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Wei-Lun Hsu, Gang-Yi Lin, Yu-Hsiang Hung, Ying-Chih Lin, Feng-Yi Chang, Ming-Te Wei, Shih-Fang Tzou, Fu-Che Lee, Chia-Liang Liao
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Patent number: 10786903Abstract: The present disclosure illustrates a map creation system and a method for a movable robot. The map creation system includes a movable robot and a display device. The movable robot includes a robot body; a driving unit driving the robot body to move in a space; an image capturing unit capturing a image in the space; a sampling unit sampling in the space to obtain a sample; a control unit controlling the operation of the driving unit, the image capturing unit and the sampling unit; and a power supply unit supplying an electrical power to each unit. The display device displays the received image and marks a location in the space where the sample is obtained on the image, and synchronously displays a movement trace of the movable robot in the space according to the driving instructions of the driving unit.Type: GrantFiled: February 20, 2018Date of Patent: September 29, 2020Assignee: Institute of Nuclear Energy Research, Atomic Energy Council, Executive YuanInventors: Chung-Hao Huang, Yu-Hsiang Hung, Chiung-Wei Huang, Cheng-Yuan Chang
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Publication number: 20200135647Abstract: A method for fabricating semiconductor device is disclosed. The method includes the steps of: providing a substrate; forming a gate structure on the substrate; forming an epitaxial layer adjacent to the gate structure; forming an interlayer dielectric (ILD) layer on the gate structure; forming a first contact hole in the ILD layer adjacent to the gate structure; and forming a cap layer in the recess, in which a top surface of the cap layer is even with or lower than a top surface of the substrate.Type: ApplicationFiled: January 1, 2020Publication date: April 30, 2020Inventors: Chih-Kai Hsu, Yu-Hsiang Hung, Wei-Chi Cheng, Ssu-I Fu, Jyh-Shyang Jenq
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Publication number: 20200111795Abstract: The present invention provides a semiconductor device, the semiconductor device includes a substrate, at least one bit line is disposed on the substrate, a rounding hard mask is disposed on the bit line, and the rounding hard mask defines a top portion and a bottom portion, and at least one storage node contact plug, located adjacent to the bit line, the storage node contact structure plug includes at least one conductive layer, from a cross-sectional view, the storage node contact plug defines a width X1 and a width X2. The width X1 is aligned with the top portion of the rounding hard mask in a horizontal direction, and the width X2 is aligned with the bottom portion of the rounding hard mask in the horizontal direction, X1 is greater than or equal to X2.Type: ApplicationFiled: October 31, 2018Publication date: April 9, 2020Inventors: Li-Wei Feng, Yu-Hsiang Hung, Ming-Te Wei