Patents by Inventor Yu-Hsuan Hsieh

Yu-Hsuan Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240120203
    Abstract: A method includes forming a dummy gate over a semiconductor fin; forming a source/drain epitaxial structure over the semiconductor fin and adjacent to the dummy gate; depositing an interlayer dielectric (ILD) layer to cover the source/drain epitaxial structure; replacing the dummy gate with a gate structure; forming a dielectric structure to cut the gate structure, wherein a portion of the dielectric structure is embedded in the ILD layer; recessing the portion of the dielectric structure embedded in the ILD layer; after recessing the portion of the dielectric structure, removing a portion of the ILD layer over the source/drain epitaxial structure; and forming a source/drain contact in the ILD layer and in contact with the portion of the dielectric structure.
    Type: Application
    Filed: March 8, 2023
    Publication date: April 11, 2024
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Te-Chih HSIUNG, Yun-Hua CHEN, Bing-Sian WU, Yi-Hsuan CHIU, Yu-Wei CHANG, Wen-Kuo HSIEH, Chih-Yuan TING, Huan-Just LIN
  • Publication number: 20240102860
    Abstract: An apparatus includes a six-axis correction stage, an auto-collimation measurement device, a light splitter, a telecentric image measurement device, and a controller. The six-axis correction stage carries a device under test; the auto-collimation measurement device is arranged above the six-axis correction stage along a measurement optical axis; the light splitter is arranged on the measurement optical axis and is interposed between the six-axis correction stage and the auto-collimation measurement device. A method controls the six-axis correction stage to correct rotation errors in at least two degrees of freedom of the device under test according to a measurement result of the auto-collimation measurement device, and controls the six-axis correction stage to correct translation and yaw errors in at least three degrees of freedom of the device under test according to a measurement result of the telecentric image measurement device by means of the controller.
    Type: Application
    Filed: September 5, 2023
    Publication date: March 28, 2024
    Inventors: Cheng Chih HSIEH, Tien Chi WU, Ming-Long LEE, Yu-Hsuan LIN, Tsung-I LIN, Chien-Hao MA
  • Patent number: 11926017
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Grant
    Filed: May 5, 2021
    Date of Patent: March 12, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Charlie Wang, Yu-Ping Tseng, Y. J. Chen, Wai-Ming Yeung, Chien-Shen Chen, Danny Kuo, Yu-Hsuan Hsieh, Hsuan Lo
  • Patent number: 11924964
    Abstract: Devices and methods are described for reducing etching due to Galvanic Effect within a printed circuit board (PCB) that may be used in an electronic device. Specifically, a contact trace is coupled to a contact finger that has a substantially larger surface area than the contact trace. The contact finger is configured to couple the electronic device to a host device. The contact trace is electrically isolated from the rest of the PCB circuitry during a fabrication process by a separation distance between an exposed portion of the contact trace and an impedance trace. The contact finger and the exposed portion of the contact trace are plated with a common material to reduce galvanic etching of the contact trace during fabrication. The contact trace is then connected to the impedance trace using a solder joint.
    Type: Grant
    Filed: April 7, 2022
    Date of Patent: March 5, 2024
    Assignee: Western Digital Technologies, Inc.
    Inventors: Lin Hui Chen, Songtao Lu, Chien Te Chen, Yu Ying Tan, Huang Pao Yi, Ching Chuan Hsieh, T. Sharanya Kaminda, Chia-Hsuan Huang
  • Patent number: 11921474
    Abstract: A virtual metrology method using a convolutional neural network (CNN) is provided. In this method, a dynamic time warping (DTW) algorithm is used to delete unsimilar sets of process data, and adjust the sets of process data to be of the same length, thereby enabling the CNN to be used for virtual metrology. A virtual metrology model of the embodiments of the present invention includes several CNN models and a conjecture model, in which plural inputs of the CNN model are sets of time sequence data of respective parameters, and plural outputs of the CNN models are inputs to the conjecture model.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: March 5, 2024
    Assignee: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Fan-Tien Cheng, Yu-Ming Hsieh, Tan-Ju Wang, Li-Hsuan Peng, Chin-Yi Lin
  • Publication number: 20240040095
    Abstract: A projection system includes a projection device, a light sensor, a control unit, and an arithmetic unit. The projection device is configured to project an image beam toward a projection surface. The light sensor is configured to sense at least one of a background beam and the image beam reflected by the projection surface and obtaining chromaticity information. The control unit is electrically connected to the projection device, and configured to control the image beam projected by the projection device. The arithmetic unit is electrically connected to the control unit and the light sensor. The arithmetic unit is configured to generate an adjustment signal according to the chromaticity information. The control unit is configured to adjust a color temperature, a brightness, and a color gamut of the image beam according to the adjustment signal. A calibration method of the projection system is also proposed.
    Type: Application
    Filed: July 24, 2023
    Publication date: February 1, 2024
    Applicant: Coretronic Corporation
    Inventors: Kun-Hong Chen, Yi-Jun Liao, Yu-Hsuan Hsieh, Yun-Shih Chen
  • Patent number: 11800072
    Abstract: A projection system and a projection method are provided. The projection system includes a digital micromirror device, a digital light processing chip, and a display processing chip. The display processing chip receives a first image signal with a variable frame rate from an external signal source, and outputs a second image signal with one of a plurality of fixed projection frame rates to the digital light processing chip according to the first image signal and one of the fixed projection frame rates supported by the projection system. The digital light processing chip drives the digital micromirror device according to the second image signal. The projection system and the projection method of the invention may realize a variable frame rate function and effectively improve smoothness of a projection image.
    Type: Grant
    Filed: July 26, 2022
    Date of Patent: October 24, 2023
    Assignee: Coretronic Corporation
    Inventors: Yun-Shih Chen, Yu-Hsuan Hsieh, Po-Yen Wu
  • Publication number: 20230273512
    Abstract: A projection system and a control method are provided. The control method includes the following. A projected image is projected on a projection area by a projection device. The projected image is captured in a detection area to generate a captured image by an image capturing device. The detection area includes the projection area. The captured image is received, a virtual frame is generated around the projection area in the captured image, and pixel values of the virtual frame are analyzed to determine whether an object enters the projection area by a processing device. The projection device is controlled to perform a protection operation by the processing device in response to determining that the object enters the projection area.
    Type: Application
    Filed: February 15, 2023
    Publication date: August 31, 2023
    Applicant: Coretronic Corporation
    Inventors: Kun-Hong Chen, Yu-Hsuan Hsieh
  • Publication number: 20230102421
    Abstract: A focus adjustment method, adapted for a projection system is provided. The projection system includes a projection target and a projection device having a range-finding array element and a processor. A plurality of range-finding elements in the range-finding array element define a plurality of measurement mesh points. The focus adjustment method includes the following. A plurality of ranging regions in the measurement mesh points are defined, and each ranging region includes more than one measurement mesh point. All the range-finding elements in the ranging regions perform a ranging measurement to generate a plurality of original ranging values. An averaging calculation is performed on the original ranging values corresponding to each ranging region to generate a plurality of average region ranging values. Whether the average region ranging values are within a preset range is determined to generate an optimal ranging value which is used to adjust a lens focus.
    Type: Application
    Filed: September 27, 2022
    Publication date: March 30, 2023
    Applicant: Coretronic Corporation
    Inventors: Kun-Hong Chen, Po-Yen Wu, Yu-Hsuan Hsieh
  • Publication number: 20230057458
    Abstract: A projection system and a projection method are provided. The projection system includes a digital micromirror device, a digital light processing chip, and a display processing chip. The display processing chip receives a first image signal with a variable frame rate from an external signal source, and outputs a second image signal with one of a plurality of fixed projection frame rates to the digital light processing chip according to the first image signal and one of the fixed projection frame rates supported by the projection system. The digital light processing chip drives the digital micromirror device according to the second image signal. The projection system and the projection method of the invention may realize a variable frame rate function and effectively improve smoothness of a projection image.
    Type: Application
    Filed: July 26, 2022
    Publication date: February 23, 2023
    Applicant: Coretronic Corporation
    Inventors: Yun-Shih Chen, Yu-Hsuan Hsieh, Po-Yen Wu
  • Publication number: 20210252668
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Application
    Filed: May 5, 2021
    Publication date: August 19, 2021
    Inventors: Charlie WANG, Yu-Ping TSENG, Y.J. CHEN, Wai-Ming YEUNG, Chien-Shen CHEN, Danny KUO, Yu-Hsuan HSIEH, Hsuan LO
  • Patent number: 11007620
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: May 18, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Charlie Wang, Yu-Ping Tseng, Y. J. Chen, Wai-Ming Yeung, Chien-Shen Chen, Danny Kuo, Yu-Hsuan Hsieh, Hsuan Lo
  • Publication number: 20190143481
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Application
    Filed: March 29, 2018
    Publication date: May 16, 2019
    Inventors: Charlie WANG, Yu-Ping TSENG, Y.J. CHEN, Wai-Ming YEUNG, Chien-Shen CHEN, Danny KUO, Yu-Hsuan HSIEH, Hsuan LO
  • Publication number: 20170365790
    Abstract: A carbazole derivative is provided.
    Type: Application
    Filed: September 6, 2017
    Publication date: December 21, 2017
    Applicant: Industrial Technology Research Institute
    Inventors: Po-Sheng Wang, Jiun-Haw Lee, Man-Kit Leung, Hsin-Jen Chen, Yu-Hsuan Hsieh, Chi-Feng Lin, Tien-Lung Chiu
  • Publication number: 20150243902
    Abstract: A carbazole derivative is provided.
    Type: Application
    Filed: June 20, 2014
    Publication date: August 27, 2015
    Inventors: Po-Sheng Wang, Jiun-Haw Lee, Man-Kit Leung, Hsin-Jen Chen, Yu-Hsuan Hsieh, Chi-Feng Lin, Tien-Lung Chiu