Patents by Inventor Yu-Hsun Wu
Yu-Hsun Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240139337Abstract: The present disclosure relates to a method for treating a cancer and/or cancer metastasis in a subject comprising administering to the subject irinotecan loaded in a mesoporous silica nanoparticle. The present disclosure also provides a conjugate comprising an agent loaded in a mesoporous silica nanoparticle (MSN) defining at least one pore and having at least one functional group on a sidewall of the at least one pore.Type: ApplicationFiled: November 2, 2022Publication date: May 2, 2024Inventors: Cheng-Hsun WU, SI-HAN WU, YI-PING CHEN, RONG-LIN ZHANG, CHUNG-YUAN MOU, Yu-Tse LEE
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Publication number: 20240133918Abstract: In a method for obtaining the equivalent oxide thickness of a dielectric layer, a first semiconductor capacitor including a first silicon dioxide layer and a second semiconductor capacitor including a second silicon dioxide layer are provided and a modulation voltage is applied to the semiconductor capacitors to measure a first scanning capacitance microscopic signal and a second scanning capacitance microscopic signal. According to the equivalent oxide thicknesses of the silicon dioxide layers and the scanning capacitance microscopic signals, an impedance ratio is calculated. The modulation voltage is applied to a third semiconductor capacitor including a dielectric layer to measure a third scanning capacitance microscopic signal. Finally, the equivalent oxide thickness of the dielectric layer is obtained according to the equivalent oxide thickness of the first silicon dioxide layer, the first scanning capacitance microscopic signal, third scanning capacitance microscopic signal, and the impedance ratio.Type: ApplicationFiled: April 12, 2023Publication date: April 25, 2024Inventors: MAO-NAN CHANG, CHI-LUN LIU, HSUEH-LIANG CHOU, YI-SHAN WU, CHIAO-JUNG LIN, YU-HSUN HSUEH
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Publication number: 20240071330Abstract: A display device includes a display panel. The display panel has a functional display area. The functional display area includes a plurality of display pixels and a plurality of light transmitting regions. The plurality of display pixels are around by the plurality of the light transmitting regions. A boundary between one of the plurality of display pixels and one of the plurality of light transmitting regions comprises an arc segment.Type: ApplicationFiled: November 3, 2023Publication date: February 29, 2024Applicant: Innolux CorporationInventors: Chia-Hao Tsai, Ming-Jou Tai, Yi-Shiuan Cherng, Yu-Shih Tsou, You-Cheng Lu, Yung-Hsun Wu
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Publication number: 20230324804Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.Type: ApplicationFiled: June 14, 2023Publication date: October 12, 2023Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chih-Tsung SHIH, Yu-Hsun WU, Bo-Tsun LIU, Tsung-Chuan LEE
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Patent number: 11720025Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.Type: GrantFiled: June 23, 2022Date of Patent: August 8, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chih-Tsung Shih, Yu-Hsun Wu, Bo-Tsun Liu, Tsung-Chuan Lee
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Patent number: 11480869Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.Type: GrantFiled: April 15, 2020Date of Patent: October 25, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Chien-Hung Lai, Hao-Ming Chang, Chia-Shih Lin, Hsuan-Wen Wang, Yu-Hsin Hsu, Chih-Tsung Shih, Yu-Hsun Wu
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Publication number: 20220326598Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.Type: ApplicationFiled: June 23, 2022Publication date: October 13, 2022Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chih-Tsung SHIH, Yu-Hsun WU, Bo-Tsun LIU, Tsung-Chuan LEE
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Patent number: 11392022Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.Type: GrantFiled: June 12, 2020Date of Patent: July 19, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chih-Tsung Shih, Yu-Hsun Wu, Bo-Tsun Liu, Tsung-Chuan Lee
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Publication number: 20220114303Abstract: A hardware-in-the-loop (HIL) simulation device is provided, which includes a processing circuit and a pulse-width modulation (PWM) signal observation circuit. The PWM signal observation circuit includes an energy storage unit and the energy storage unit is coupled to the processing circuit. A signal source transmits a PWM signal to the processing circuit and the PWM signal observation circuit, and the energy storage unit is charged when the PWM signal is at high level. The processing circuit detects the voltage of the energy storage unit when detecting the falling edge of the PWM signal so as to calculate the duty cycle of the PWM signal.Type: ApplicationFiled: December 24, 2020Publication date: April 14, 2022Inventors: CHUN-AN LIN, WEN-CHE SHEN, CHIH-WEI YEH, PO-HUAN CHOU, CHUN-CHIEH CHANG, YU-HSUN WU
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Publication number: 20210389661Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.Type: ApplicationFiled: June 12, 2020Publication date: December 16, 2021Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chih-Tsung SHIH, Yu-Hsun WU, Bo-Tsun LIU, Tsung-Chuan LEE
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Publication number: 20210063869Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.Type: ApplicationFiled: April 15, 2020Publication date: March 4, 2021Inventors: CHIEN-HUNG LAI, HAO-MING CHANG, CHIA-SHIH LIN, HSUAN-WEN WANG, YU-HSIN HSU, CHIH-TSUNG SHIH, YU-HSUN WU
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Patent number: 10804761Abstract: The present disclosure provides a rotor mechanism includes a rotor core and a plurality of rotor bars. The rotor core has a plurality of insertion slots arranged along an edge of the rotor core. Each of the plurality of rotor bars has an insertion portion and two protruding portions. The insertion portions are respectively located in the plurality of insertion slots, wherein in each of the plurality of rotor bars, the two protruding portions are respectively connected to two opposite ends of the insertion portion and respectively protrude from two opposite sides of the rotor core, and the two protruding portions each has an extension direction, that has an angle with respect to an extension direction of the insertion portion, in order to clamp and fix the rotor core therebetween. In addition, the present disclosure also provides a method for manufacturing the rotor mechanism.Type: GrantFiled: December 4, 2017Date of Patent: October 13, 2020Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yu-Hsun Wu, Ming-Mao Hsu, Yu-Yuan Chen
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Publication number: 20190140506Abstract: The present disclosure provides a rotor mechanism includes a rotor core and a plurality of rotor bars. The rotor core has a plurality of insertion slots arranged along an edge of the rotor core. Each of the plurality of rotor bars has an insertion portion and two protruding portions. The insertion portions are respectively located in the plurality of insertion slots, wherein in each of the plurality of rotor bars, the two protruding portions are respectively connected to two opposite ends of the insertion portion and respectively protrude from two opposite sides of the rotor core, and the two protruding portions each has an extension direction, that has an angle with respect to an extension direction of the insertion portion, in order to clamp and fix the rotor core therebetween. In addition, the present disclosure also provides a method for manufacturing the rotor mechanism.Type: ApplicationFiled: December 4, 2017Publication date: May 9, 2019Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yu-Hsun Wu, Ming-Mao Hsu, Yu-Yuan Chen
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Patent number: 10199894Abstract: A rotor of an electric motor including a rotor core, two conductive end plates, a plurality of conductors and a casting metal is provided. The rotor core has a central hole and a plurality of slots surrounding the central hole at a predetermined interval. The two conductive end plates, disposed at two ends of the rotor core, have a plurality of fixing structures, respectively. A plurality of cavities is disposed between two neighboring fixing structures and the shape and the positions of the cavities correspond to that of the slots. The conductors are shaped as long bars and penetrate the slots. Two ends of the conductors are fixed by the fixing structures. The casting metal is injected into the cavities and the slots, and further covers the peripheral of the conductors and the fixing structures, two ends of the rotor core and outside of the two conductive end plates.Type: GrantFiled: December 22, 2015Date of Patent: February 5, 2019Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: I-Wei Lan, Yu-Hsun Wu, Yee-Pien Yang
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Publication number: 20170163111Abstract: A rotor of an electric motor including a rotor core, two conductive end plates, a plurality of conductors and a casting metal is provided. The rotor core has a central hole and a plurality of slots surrounding the central hole at a predetermined interval. The two conductive end plates, disposed at two ends of the rotor core, have a plurality of fixing structures, respectively. A plurality of cavities is disposed between two neighboring fixing structures and the shape and the positions of the cavities correspond to that of the slots. The conductors are shaped as long bars and penetrate the slots. Two ends of the conductors are fixed by the fixing structures. The casting metal is injected into the cavities and the slots, and further covers the peripheral of the conductors and the fixing structures, two ends of the rotor core and outside of the two conductive end plates.Type: ApplicationFiled: December 22, 2015Publication date: June 8, 2017Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: I-Wei LAN, Yu-Hsun WU, Yee-Pien YANG
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Publication number: 20170047805Abstract: The disclosure provides a stator module and a magnetic field generating structure which includes a magnetizer and an electrically conducting pipe. The electrically conducting pipe is wound around the magnetizer and has a passage inside. The passage has an outlet and an inlet opposite to each other. The electrically conducting pipe has a current input portion and a current output portion.Type: ApplicationFiled: October 24, 2016Publication date: February 16, 2017Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Se-Kang HO, Kuo-Lin CHIU, Chia-Min TING, Cheng-Min CHANG, Chen-Chih LIN, Hsien-Chang HUANG, Yu-Hsun WU
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Patent number: 9515530Abstract: The disclosure provides a stator module and a magnetic field generating structure which includes a magnetizer and an electrically conducting pipe. The electrically conducting pipe is wound around the magnetizer and has a passage inside. The passage has an outlet and an inlet opposite to each other. The electrically conducting pipe has a current input portion and a current output portion.Type: GrantFiled: March 18, 2013Date of Patent: December 6, 2016Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Se-Kang Ho, Kuo-Lin Chiu, Chia-Min Ting, Cheng-Min Chang, Chen-Chih Lin, Hsien-Chang Huang, Yu-Hsun Wu
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Publication number: 20140139057Abstract: The disclosure provides a stator module and a magnetic field generated structure which includes a magnetizer and an electrically conducting pipe. The electrically conducting pipe is wound around the magnetizer and has a passage inside. The passage has an outlet and an inlet opposite to each other. The electrically conducting pipe has a current input portion and a current output portion.Type: ApplicationFiled: March 18, 2013Publication date: May 22, 2014Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Se-Kang HO, Kuo-Lin CHIU, Chia-Min TING, Cheng-Min CHANG, Chen-Chih LIN, Hsine-Chang HUANG, Yu-Hsun WU
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Patent number: 8023080Abstract: A high transmittance brightness enhanced optical element for backlight modules and liquid crystal display device is disclosed. The brightness enhanced polarizing optical element comprises a reflective polarizer film, a phase retardation film, and a polarization enhancement film. The reflective polarizer film provides a function of selectively reflecting right-handness circularly polarized light or left-handness circularly polarized light and will transmit the other one of them. The one was selectively reflected will be recombined with the light source or the backlight and re-direct toward the reflective polarizer. The portions of the reflective light will be recombined with the fresh light from the light source as above and the processes repeatedly. As a result, almost all of the light transmit the reflective polarizer and in the same circular polarization. The light is then transmitted the phase retardation film and converted to a polarized light with another optical axis.Type: GrantFiled: July 6, 2009Date of Patent: September 20, 2011Assignee: Industrial Technology Research InstituteInventors: Hui-Lung Kuo, Ping-Chen Chen, Yi-Ping Hsieh, Pao-Ju Hsieh, Yu-Hsun Wu
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Patent number: 7626657Abstract: A multi-function integrated polarizer/optical film structure and manufacturing method thereof solves the disadvantages of O type or E type polarizers that cannot simultaneously have high polarizing efficiency and high transmittance. The present invention utilizes optical design for a polarizer/optical film having a plurality of material layers on substrates. The present invention is a multi-function integrated polarizer/optical film structure and manufacturing method thereof, that allows an LCD image to have high polarizing efficiency, high transmittance, wide-angle, high contrast and super-film characteristics simultaneously.Type: GrantFiled: May 18, 2005Date of Patent: December 1, 2009Assignees: Taiwan TFT LCD Association, Chunghwa Picture Tubes, Ltd., Au Optronics Corp., Quanta Display Inc., Hannstar Display Corp., Chi Mei Optoelectronics Corp., Industrial Technology Research Institute, Toppoly Optoelectronics Corp.Inventors: Yue-Shih Jeng, Yuh-Shyang Chen, Wei-Chih Liu, Tsung-Hsiung Wang, Yu-Hsun Wu