Patents by Inventor Yu-Hsun Wu

Yu-Hsun Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240139337
    Abstract: The present disclosure relates to a method for treating a cancer and/or cancer metastasis in a subject comprising administering to the subject irinotecan loaded in a mesoporous silica nanoparticle. The present disclosure also provides a conjugate comprising an agent loaded in a mesoporous silica nanoparticle (MSN) defining at least one pore and having at least one functional group on a sidewall of the at least one pore.
    Type: Application
    Filed: November 2, 2022
    Publication date: May 2, 2024
    Inventors: Cheng-Hsun WU, SI-HAN WU, YI-PING CHEN, RONG-LIN ZHANG, CHUNG-YUAN MOU, Yu-Tse LEE
  • Publication number: 20240133918
    Abstract: In a method for obtaining the equivalent oxide thickness of a dielectric layer, a first semiconductor capacitor including a first silicon dioxide layer and a second semiconductor capacitor including a second silicon dioxide layer are provided and a modulation voltage is applied to the semiconductor capacitors to measure a first scanning capacitance microscopic signal and a second scanning capacitance microscopic signal. According to the equivalent oxide thicknesses of the silicon dioxide layers and the scanning capacitance microscopic signals, an impedance ratio is calculated. The modulation voltage is applied to a third semiconductor capacitor including a dielectric layer to measure a third scanning capacitance microscopic signal. Finally, the equivalent oxide thickness of the dielectric layer is obtained according to the equivalent oxide thickness of the first silicon dioxide layer, the first scanning capacitance microscopic signal, third scanning capacitance microscopic signal, and the impedance ratio.
    Type: Application
    Filed: April 12, 2023
    Publication date: April 25, 2024
    Inventors: MAO-NAN CHANG, CHI-LUN LIU, HSUEH-LIANG CHOU, YI-SHAN WU, CHIAO-JUNG LIN, YU-HSUN HSUEH
  • Publication number: 20240071330
    Abstract: A display device includes a display panel. The display panel has a functional display area. The functional display area includes a plurality of display pixels and a plurality of light transmitting regions. The plurality of display pixels are around by the plurality of the light transmitting regions. A boundary between one of the plurality of display pixels and one of the plurality of light transmitting regions comprises an arc segment.
    Type: Application
    Filed: November 3, 2023
    Publication date: February 29, 2024
    Applicant: Innolux Corporation
    Inventors: Chia-Hao Tsai, Ming-Jou Tai, Yi-Shiuan Cherng, Yu-Shih Tsou, You-Cheng Lu, Yung-Hsun Wu
  • Publication number: 20230324804
    Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.
    Type: Application
    Filed: June 14, 2023
    Publication date: October 12, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Tsung SHIH, Yu-Hsun WU, Bo-Tsun LIU, Tsung-Chuan LEE
  • Patent number: 11720025
    Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.
    Type: Grant
    Filed: June 23, 2022
    Date of Patent: August 8, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Tsung Shih, Yu-Hsun Wu, Bo-Tsun Liu, Tsung-Chuan Lee
  • Patent number: 11480869
    Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: October 25, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chien-Hung Lai, Hao-Ming Chang, Chia-Shih Lin, Hsuan-Wen Wang, Yu-Hsin Hsu, Chih-Tsung Shih, Yu-Hsun Wu
  • Publication number: 20220326598
    Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.
    Type: Application
    Filed: June 23, 2022
    Publication date: October 13, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Tsung SHIH, Yu-Hsun WU, Bo-Tsun LIU, Tsung-Chuan LEE
  • Patent number: 11392022
    Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: July 19, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Tsung Shih, Yu-Hsun Wu, Bo-Tsun Liu, Tsung-Chuan Lee
  • Publication number: 20220114303
    Abstract: A hardware-in-the-loop (HIL) simulation device is provided, which includes a processing circuit and a pulse-width modulation (PWM) signal observation circuit. The PWM signal observation circuit includes an energy storage unit and the energy storage unit is coupled to the processing circuit. A signal source transmits a PWM signal to the processing circuit and the PWM signal observation circuit, and the energy storage unit is charged when the PWM signal is at high level. The processing circuit detects the voltage of the energy storage unit when detecting the falling edge of the PWM signal so as to calculate the duty cycle of the PWM signal.
    Type: Application
    Filed: December 24, 2020
    Publication date: April 14, 2022
    Inventors: CHUN-AN LIN, WEN-CHE SHEN, CHIH-WEI YEH, PO-HUAN CHOU, CHUN-CHIEH CHANG, YU-HSUN WU
  • Publication number: 20210389661
    Abstract: A method of forming an extreme ultraviolet (EUV) mask includes forming a multilayer Mo/Si stack comprising alternating stacked Mo and Si layers over a mask substrate; forming a ruthenium capping layer over the multilayer Mo/Si stack; doping the ruthenium capping layer with a halogen element, a pentavalent element, a hexavalent element or combinations thereof; forming an absorber layer over the ruthenium capping layer; and etching the absorber layer to form a pattern in the absorber layer.
    Type: Application
    Filed: June 12, 2020
    Publication date: December 16, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Tsung SHIH, Yu-Hsun WU, Bo-Tsun LIU, Tsung-Chuan LEE
  • Publication number: 20210063869
    Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.
    Type: Application
    Filed: April 15, 2020
    Publication date: March 4, 2021
    Inventors: CHIEN-HUNG LAI, HAO-MING CHANG, CHIA-SHIH LIN, HSUAN-WEN WANG, YU-HSIN HSU, CHIH-TSUNG SHIH, YU-HSUN WU
  • Patent number: 10804761
    Abstract: The present disclosure provides a rotor mechanism includes a rotor core and a plurality of rotor bars. The rotor core has a plurality of insertion slots arranged along an edge of the rotor core. Each of the plurality of rotor bars has an insertion portion and two protruding portions. The insertion portions are respectively located in the plurality of insertion slots, wherein in each of the plurality of rotor bars, the two protruding portions are respectively connected to two opposite ends of the insertion portion and respectively protrude from two opposite sides of the rotor core, and the two protruding portions each has an extension direction, that has an angle with respect to an extension direction of the insertion portion, in order to clamp and fix the rotor core therebetween. In addition, the present disclosure also provides a method for manufacturing the rotor mechanism.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: October 13, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Hsun Wu, Ming-Mao Hsu, Yu-Yuan Chen
  • Publication number: 20190140506
    Abstract: The present disclosure provides a rotor mechanism includes a rotor core and a plurality of rotor bars. The rotor core has a plurality of insertion slots arranged along an edge of the rotor core. Each of the plurality of rotor bars has an insertion portion and two protruding portions. The insertion portions are respectively located in the plurality of insertion slots, wherein in each of the plurality of rotor bars, the two protruding portions are respectively connected to two opposite ends of the insertion portion and respectively protrude from two opposite sides of the rotor core, and the two protruding portions each has an extension direction, that has an angle with respect to an extension direction of the insertion portion, in order to clamp and fix the rotor core therebetween. In addition, the present disclosure also provides a method for manufacturing the rotor mechanism.
    Type: Application
    Filed: December 4, 2017
    Publication date: May 9, 2019
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Hsun Wu, Ming-Mao Hsu, Yu-Yuan Chen
  • Patent number: 10199894
    Abstract: A rotor of an electric motor including a rotor core, two conductive end plates, a plurality of conductors and a casting metal is provided. The rotor core has a central hole and a plurality of slots surrounding the central hole at a predetermined interval. The two conductive end plates, disposed at two ends of the rotor core, have a plurality of fixing structures, respectively. A plurality of cavities is disposed between two neighboring fixing structures and the shape and the positions of the cavities correspond to that of the slots. The conductors are shaped as long bars and penetrate the slots. Two ends of the conductors are fixed by the fixing structures. The casting metal is injected into the cavities and the slots, and further covers the peripheral of the conductors and the fixing structures, two ends of the rotor core and outside of the two conductive end plates.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: February 5, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: I-Wei Lan, Yu-Hsun Wu, Yee-Pien Yang
  • Publication number: 20170163111
    Abstract: A rotor of an electric motor including a rotor core, two conductive end plates, a plurality of conductors and a casting metal is provided. The rotor core has a central hole and a plurality of slots surrounding the central hole at a predetermined interval. The two conductive end plates, disposed at two ends of the rotor core, have a plurality of fixing structures, respectively. A plurality of cavities is disposed between two neighboring fixing structures and the shape and the positions of the cavities correspond to that of the slots. The conductors are shaped as long bars and penetrate the slots. Two ends of the conductors are fixed by the fixing structures. The casting metal is injected into the cavities and the slots, and further covers the peripheral of the conductors and the fixing structures, two ends of the rotor core and outside of the two conductive end plates.
    Type: Application
    Filed: December 22, 2015
    Publication date: June 8, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: I-Wei LAN, Yu-Hsun WU, Yee-Pien YANG
  • Publication number: 20170047805
    Abstract: The disclosure provides a stator module and a magnetic field generating structure which includes a magnetizer and an electrically conducting pipe. The electrically conducting pipe is wound around the magnetizer and has a passage inside. The passage has an outlet and an inlet opposite to each other. The electrically conducting pipe has a current input portion and a current output portion.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 16, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Se-Kang HO, Kuo-Lin CHIU, Chia-Min TING, Cheng-Min CHANG, Chen-Chih LIN, Hsien-Chang HUANG, Yu-Hsun WU
  • Patent number: 9515530
    Abstract: The disclosure provides a stator module and a magnetic field generating structure which includes a magnetizer and an electrically conducting pipe. The electrically conducting pipe is wound around the magnetizer and has a passage inside. The passage has an outlet and an inlet opposite to each other. The electrically conducting pipe has a current input portion and a current output portion.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: December 6, 2016
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Se-Kang Ho, Kuo-Lin Chiu, Chia-Min Ting, Cheng-Min Chang, Chen-Chih Lin, Hsien-Chang Huang, Yu-Hsun Wu
  • Publication number: 20140139057
    Abstract: The disclosure provides a stator module and a magnetic field generated structure which includes a magnetizer and an electrically conducting pipe. The electrically conducting pipe is wound around the magnetizer and has a passage inside. The passage has an outlet and an inlet opposite to each other. The electrically conducting pipe has a current input portion and a current output portion.
    Type: Application
    Filed: March 18, 2013
    Publication date: May 22, 2014
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Se-Kang HO, Kuo-Lin CHIU, Chia-Min TING, Cheng-Min CHANG, Chen-Chih LIN, Hsine-Chang HUANG, Yu-Hsun WU
  • Patent number: 8023080
    Abstract: A high transmittance brightness enhanced optical element for backlight modules and liquid crystal display device is disclosed. The brightness enhanced polarizing optical element comprises a reflective polarizer film, a phase retardation film, and a polarization enhancement film. The reflective polarizer film provides a function of selectively reflecting right-handness circularly polarized light or left-handness circularly polarized light and will transmit the other one of them. The one was selectively reflected will be recombined with the light source or the backlight and re-direct toward the reflective polarizer. The portions of the reflective light will be recombined with the fresh light from the light source as above and the processes repeatedly. As a result, almost all of the light transmit the reflective polarizer and in the same circular polarization. The light is then transmitted the phase retardation film and converted to a polarized light with another optical axis.
    Type: Grant
    Filed: July 6, 2009
    Date of Patent: September 20, 2011
    Assignee: Industrial Technology Research Institute
    Inventors: Hui-Lung Kuo, Ping-Chen Chen, Yi-Ping Hsieh, Pao-Ju Hsieh, Yu-Hsun Wu
  • Patent number: 7626657
    Abstract: A multi-function integrated polarizer/optical film structure and manufacturing method thereof solves the disadvantages of O type or E type polarizers that cannot simultaneously have high polarizing efficiency and high transmittance. The present invention utilizes optical design for a polarizer/optical film having a plurality of material layers on substrates. The present invention is a multi-function integrated polarizer/optical film structure and manufacturing method thereof, that allows an LCD image to have high polarizing efficiency, high transmittance, wide-angle, high contrast and super-film characteristics simultaneously.
    Type: Grant
    Filed: May 18, 2005
    Date of Patent: December 1, 2009
    Assignees: Taiwan TFT LCD Association, Chunghwa Picture Tubes, Ltd., Au Optronics Corp., Quanta Display Inc., Hannstar Display Corp., Chi Mei Optoelectronics Corp., Industrial Technology Research Institute, Toppoly Optoelectronics Corp.
    Inventors: Yue-Shih Jeng, Yuh-Shyang Chen, Wei-Chih Liu, Tsung-Hsiung Wang, Yu-Hsun Wu