Patents by Inventor Yu Jie Tsai
Yu Jie Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240097888Abstract: In a file sharing system, a key manager unit realizes a correspondence between the first user identifier and the first public key in response to a registration request of the first user, generates a first key material for encrypting the first file into a first encrypted file, and generates a first credential according to the first user identifier, the first file identifier, the first public key and the first key material after receiving an access-right claim request to the first file from the first user. A file storage unit stores the first encrypted file and the first credential. The first user uses the first user identifier, the first file identifier and the first private key to retrieve the first key material out of the first credential, and uses the first key material to decrypt the first encrypted file into the first file.Type: ApplicationFiled: September 18, 2023Publication date: March 21, 2024Inventors: CHIA-JUNG LIANG, CHIHHUNG LIN, CHIH-PING HSIAO, YU-JIE SU, CHIA-HSIN CHENG, TUN-HOU WANG, MENG-CHAO TSAI, YUEH-CHIN LIN
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Patent number: 10591816Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).Type: GrantFiled: October 15, 2015Date of Patent: March 17, 2020Assignee: Chi Mei CorporationInventors: Hao-Wei Liao, Yu-Jie Tsai, Hung-Chia Chou
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Publication number: 20170235224Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).Type: ApplicationFiled: October 15, 2015Publication date: August 17, 2017Applicant: Chi Mei CorporationInventors: Hao-Wei Liao, Yu-Jie Tsai, Hung-Chia Chou
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Patent number: 9606436Abstract: A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I): in the formula (I), A individually and independently represents a single bond, an alkylene group, or an arylene group, B individually and independently represents an organic group having diphenyl phosphine, hydrogen atom, an alkyl group, an aryl group, or —OR, in which R is a C1-C6 alkyl group or a phenyl group, at least one B is the organic group having diphenyl phosphine and at least one B is —OR. When B is —OR, A connected to B is the single bond. A film formed by the photosensitive resin composition has good refractivity and adhesivity to molybdenum.Type: GrantFiled: August 8, 2016Date of Patent: March 28, 2017Assignee: CHI MEI CORPORATIONInventors: Yu-Jie Tsai, I-Kuang Chen
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Publication number: 20170052446Abstract: A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I): in the formula (I), A individually and independently represents a single bond, an alkylene group, or an arylene group, B individually and independently represents an organic group having diphenyl phosphine, hydrogen atom, an alkyl group, an aryl group, or —OR, in which R is a C1-C6 alkyl group or a phenyl group, at least one B is the organic group having diphenyl phosphine and at least one B is —OR. When B is —OR, A connected to B is the single bond. A film formed by the photosensitive resin composition has good refractivity and adhesivity to molybdenum.Type: ApplicationFiled: August 8, 2016Publication date: February 23, 2017Inventors: Yu-Jie TSAI, I-Kuang CHEN
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Publication number: 20160178813Abstract: The invention relates to a photosensitive resin composition for a black matrix, a color filter and a liquid crystal display element formed by the black matrix. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a solvent (D) and a black pigment (E). The photosensitive resin composition for the black matrix has the advantage of improving resolution and taper angle.Type: ApplicationFiled: December 14, 2015Publication date: June 23, 2016Inventors: HAO-WEI LIAO, YU-JIE TSAI
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Patent number: 9366959Abstract: A negative photosensitive resin composition including an alkali-soluble resin (A), a photoacid generator (B), a basic compound (C), a cross-linking agent (D), and a solvent (E) is provided. The alkali-soluble resin (A) includes an acrylate resin (A-1) and a novolac resin (A-2). The acrylate resin (A-1) is synthesized by polymerizing a monomer for polymerization, wherein the monomer for polymerization includes an unsaturated carboxylic acid or unsaturated carboxylic acid anhydride monomer (a-1-1) and a monomer (a-1-2). The monomer (a-1-2) includes a compound (a-1-2-1) with a tricyclodecane or dicyclopentadiene structure, a compound (a-1-2-2) represented by formula (1), or a combination of both. The novolac resin (A-2) is synthesized by polymerizing an aldehyde compound with an aromatic hydroxy compound, wherein the aromatic hydroxy compound includes a xylenol compound.Type: GrantFiled: August 4, 2014Date of Patent: June 14, 2016Assignee: Chi Mei CorporationInventor: Yu-Jie Tsai
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Patent number: 9316907Abstract: The invention relates to a photosensitive resin composition that has good heat resistance and good humidity resistance. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.Type: GrantFiled: March 3, 2014Date of Patent: April 19, 2016Assignee: CHI MEI CORPORATIONInventor: Yu-Jie Tsai
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Publication number: 20150275042Abstract: The invention relates to a curing resin composition, a thin film and a liquid crystal display element formed by the composition. The curing resin composition has the advantage of good adhesion and coating property. The curing resin composition comprises a polysiloxane (A), a triazine-based compound (B), and a solvent (C).Type: ApplicationFiled: March 19, 2015Publication date: October 1, 2015Inventor: YU-JIE TSAI
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Publication number: 20150226892Abstract: An alkali-soluble resin, a photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), and an organic solvent (D). The photosensitive resin composition contains a specific alkali-soluble resin (A-1), and therefore the photosensitive resin composition has the advantages of high resolution and excellent development resistance.Type: ApplicationFiled: February 4, 2015Publication date: August 13, 2015Inventors: Hao-Wei Liao, Yu-Jie Tsai
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Publication number: 20150044790Abstract: A negative photosensitive resin composition including an alkali-soluble resin (A), a photoacid generator (B), a basic compound (C), a cross-linking agent (D), and a solvent (E) is provided. The alkali-soluble resin (A) includes an acrylate resin (A-1) and a novolac resin (A-2). The acrylate resin (A-1) is synthesized by polymerizing a monomer for polymerization, wherein the monomer for polymerization includes an unsaturated carboxylic acid or unsaturated carboxylic acid anhydride monomer (a-1-1) and a monomer (a-1-2). The monomer (a-1-2) includes a compound (a-1-2-1) with a tricyclodecane or dicyclopentadiene structure, a compound (a-1-2-2) represented by formula (1), or a combination of both. The novolac resin (A-2) is synthesized by polymerizing an aldehyde compound with an aromatic hydroxy compound, wherein the aromatic hydroxy compound includes a xylenol compound.Type: ApplicationFiled: August 4, 2014Publication date: February 12, 2015Inventor: Yu-Jie Tsai
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Publication number: 20140363915Abstract: A negative photosensitive resin composition including a novolac resin (A), a photoacid generator (B), a basic compound (C), a cross-linking agent (D), and a solvent (E) is provided. The novolac resin (A) includes a hydroxy-type novolac resin (A-1) and a xylenol-type novolac resin (A-2). The hydroxy-type novolac resin (A-1) is synthesized by polycondensing a hydroxybenzaldehyde compound and an aromatic hydroxy compound. The xylenol-type novolac resin (A-2) is synthesized by polycondensing an aldehyde compound and a xylenol compound.Type: ApplicationFiled: June 11, 2014Publication date: December 11, 2014Inventor: Yu-Jie Tsai
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Publication number: 20140255845Abstract: The invention relates to a photosensitive resin composition that has good heat resistance and good humidity resistance. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.Type: ApplicationFiled: March 3, 2014Publication date: September 11, 2014Applicant: CHI MEI CORPORATIONInventor: YU-JIE TSAI
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Patent number: 8722755Abstract: The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component formed thereby has good heat-resistant transmittance, good chemical resistance and good elastic recovery rate. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and a liquid crystal display component.Type: GrantFiled: February 28, 2013Date of Patent: May 13, 2014Assignee: Chi Mei CorporationInventors: Yu-Jie Tsai, Ming-Ju Wu
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Publication number: 20130245150Abstract: The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component formed thereby has good heat-resistant transmittance, good chemical resistance and good elastic recovery rate. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and a liquid crystal display component.Type: ApplicationFiled: February 28, 2013Publication date: September 19, 2013Applicant: CHI MEI CORPORATIONInventors: YU-JIE TSAI, MING-JU WU
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Publication number: 20130029297Abstract: A haptic panel computer of portable type includes a computer module, a digit and symbol decoding circuit, a graphic decoding circuit, and a haptic displaying device, the computer module is connected to other devices for controlling them. The haptic displaying device includes an array of guiding tubes and sliding or movable members arranged in a matrix, and the movable members are selectively extendible in or out of the guiding tubes with an electromagnetic device for forming various patterns, graphs, or digits and for Braille reading or listening by the blind people. A text file is imported to the computer through input/output device from the World Wide Web or a memory device, and the texts are transformed to Braille texts which are displayed in the lower portion of the screen by digit and symbol decoding circuit and some particular texts in the paragraph are displayed with haptic graphs in the upper portion of the screen through the graphic decoding circuit picking up pre-built graph database.Type: ApplicationFiled: July 25, 2011Publication date: January 31, 2013Inventor: Yu Jie Tsai