Patents by Inventor Yu-Jin JEOUNG

Yu-Jin JEOUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10712662
    Abstract: A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: July 14, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., DONGJIN SEMICHEM CO., LTD.
    Inventors: Jin-A Ryu, Jung-Youl Lee, Kyung-Lyul Moon, Yool Kang, Hyun-Jin Kim, Yu-Jin Jeoung, Man-Ho Han
  • Publication number: 20170199459
    Abstract: A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.
    Type: Application
    Filed: January 13, 2017
    Publication date: July 13, 2017
    Inventors: Jin-A RYU, Jung-Youl LEE, Kyung-Lyul MOON, Yool KANG, Hyun-Jin KIM, Yu-Jin JEOUNG, Man-Ho HAN