Patents by Inventor Yu-Ju LIAO

Yu-Ju LIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11848280
    Abstract: An assembly structure and a method for manufacturing the same are provided. The method for manufacturing the assembly structure includes providing a substrate defining an active region and a side rail surrounding the active region; and forming a frame structure on the side rail.
    Type: Grant
    Filed: November 25, 2020
    Date of Patent: December 19, 2023
    Assignee: ADVANCED SEMlCONDUCTOR ENGINEERING, INC.
    Inventors: Wen Hung Huang, Yu-Ju Liao
  • Patent number: 11587881
    Abstract: A substrate structure is disclosed. The substrate structure includes a carrier, a dielectric layer on the carrier, a patterned organic core layer in the dielectric layer, and a conductive via. The patterned organic core layer defines a passage extending in the dielectric layer towards the carrier. The conductive via extends through the passage towards the carrier without contacting the patterned organic core layer.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: February 21, 2023
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Chien-Fan Chen, Yu-Ju Liao, Chu-Jie Yang, Sheng-Hung Shih
  • Publication number: 20220278052
    Abstract: The present disclosure provides a substrate structure. The substrate structure includes an interconnection structure, a dielectric layer on the interconnection structure, an electronic component embedded in the dielectric layer, and a first conductive via penetrating through the dielectric layer and disposed adjacent to the electronic component. The interconnection structure includes a carrier having a first surface and a second surface opposite to the first surface, a first conductive layer disposed on the first surface of the carrier, and a second conductive layer disposed on the second surface of the carrier. The first conductive via and at least one of the first conductive layer and the second conductive layer define a first shielding structure surrounding the electronic component. A method of manufacturing a substrate structure is also disclosed.
    Type: Application
    Filed: May 17, 2022
    Publication date: September 1, 2022
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chien-Fan CHEN, Yu-Ju LIAO
  • Publication number: 20220165683
    Abstract: An assembly structure and a method for manufacturing the same are provided. The method for manufacturing the assembly structure includes providing a substrate defining an active region and a side rail surrounding the active region; and forming a frame structure on the side rail.
    Type: Application
    Filed: November 25, 2020
    Publication date: May 26, 2022
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Wen Hung HUANG, Yu-Ju LIAO
  • Patent number: 11335646
    Abstract: The present disclosure provides a substrate structure. The substrate structure includes an interconnection structure, a dielectric layer on the interconnection structure, an electronic component embedded in the dielectric layer, and a first conductive via penetrating through the dielectric layer and disposed adjacent to the electronic component. The interconnection structure includes a carrier having a first surface and a second surface opposite to the first surface, a first conductive layer disposed on the first surface of the carrier, and a second conductive layer disposed on the second surface of the carrier. The first conductive via and at least one of the first conductive layer and the second conductive layer define a first shielding structure surrounding the electronic component. A method of manufacturing a substrate structure is also disclosed.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: May 17, 2022
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Chien-Fan Chen, Yu-Ju Liao
  • Patent number: 11296030
    Abstract: An embedded component package structure including a dielectric structure, a semiconductor chip, a first polymer layer, and a patterned conductive layer is provided. The semiconductor chip is embedded in the dielectric structure. The first polymer layer covers the semiconductor chip and has a first thickness, and the first thickness is greater than a second thickness of the dielectric structure above the first polymer layer. The patterned conductive layer covers an upper surface of the dielectric structure and extends over the first polymer layer, and the patterned conductive layer is electrically connected to the semiconductor chip.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: April 5, 2022
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Yu-Ju Liao, Chien-Fan Chen, Chien-Hao Wang
  • Patent number: 11277917
    Abstract: An embedded component package structure including a circuit substrate, an embedded component and a stress compensation layer is provided. The circuit substrate includes a core layer and an asymmetric circuit structure, and the core layer has a first thickness. The embedded component is disposed in the core layer. The stress compensation layer is disposed on one side of the core layer, and the stress compensation layer has a second thickness between 4 ?m and 351 ?m.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: March 15, 2022
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Yu-Ju Liao, Chien-Fan Chen, Chien-Hao Wang, I-Chia Lin
  • Patent number: 11139179
    Abstract: An embedded component package structure including a dielectric structure, a semiconductor chip and a patterned conductive layer is provided. The semiconductor chip is embedded in the dielectric structure, and the dielectric structure encapsulates the semiconductor chip and has a first thickness. The semiconductor chip having a second thickness, and the first thickness is greater than the second thickness, and a ratio of the first thickness to the second thickness is between 1.1 and 28.4. The patterned conductive layer covers an upper surface of the dielectric structure and extending into a first opening of the dielectric structure. The first opening exposes an electrical pad of the semiconductor chip, and the patterned conductive layer is electrically connected to the electrical pad of the semiconductor chip.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: October 5, 2021
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Chien-Fan Chen, Yu-Ju Liao
  • Publication number: 20210287997
    Abstract: The present disclosure provides a substrate structure. The substrate structure includes an interconnection structure, a dielectric layer on the interconnection structure, an electronic component embedded in the dielectric layer, and a first conductive via penetrating through the dielectric layer and disposed adjacent to the electronic component. The interconnection structure includes a carrier having a first surface and a second surface opposite to the first surface, a first conductive layer disposed on the first surface of the carrier, and a second conductive layer disposed on the second surface of the carrier. The first conductive via and at least one of the first conductive layer and the second conductive layer define a first shielding structure surrounding the electronic component. A method of manufacturing a substrate structure is also disclosed.
    Type: Application
    Filed: March 10, 2020
    Publication date: September 16, 2021
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chien-Fan CHEN, Yu-Ju LIAO
  • Publication number: 20210280521
    Abstract: A substrate structure is disclosed. The substrate structure includes a carrier, a dielectric layer on the carrier, a patterned organic core layer in the dielectric layer, and a conductive via. The patterned organic core layer defines a passage extending in the dielectric layer towards the carrier. The conductive via extends through the passage towards the carrier without contacting the patterned organic core layer.
    Type: Application
    Filed: March 9, 2020
    Publication date: September 9, 2021
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chien-Fan CHEN, Yu-Ju LIAO, Chu-Jie YANG, Sheng-Hung SHIH
  • Patent number: 10950551
    Abstract: An embedded component package structure including a dielectric structure and a component is provided. The component is embedded in the dielectric structure and is provided with a plurality of conductive pillars. The conductive pillars are exposed from an upper surface of the dielectric structure and have a first thickness and a second thickness, respectively, and the first thickness is not equal to the second thickness.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: March 16, 2021
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Yu-Ju Liao, Chien-Fan Chen, Chien-Hao Wang
  • Publication number: 20210074554
    Abstract: An embedded component package structure including a dielectric structure, a semiconductor chip and a patterned conductive layer is provided. The semiconductor chip is embedded in the dielectric structure, and the dielectric structure encapsulates the semiconductor chip and has a first thickness. The semiconductor chip having a second thickness, and the first thickness is greater than the second thickness, and a ratio of the first thickness to the second thickness is between 1.1 and 28.4. The patterned conductive layer covers an upper surface of the dielectric structure and extending into a first opening of the dielectric structure. The first opening exposes an electrical pad of the semiconductor chip, and the patterned conductive layer is electrically connected to the electrical pad of the semiconductor chip.
    Type: Application
    Filed: September 9, 2019
    Publication date: March 11, 2021
    Inventors: Chien-Fan CHEN, Yu-Ju LIAO
  • Publication number: 20200343187
    Abstract: An embedded component package structure including a dielectric structure, a semiconductor chip, a first polymer layer, and a patterned conductive layer is provided. The semiconductor chip is embedded in the dielectric structure. The first polymer layer covers the semiconductor chip and has a first thickness, and the first thickness is greater than a second thickness of the dielectric structure above the first polymer layer. The patterned conductive layer covers an upper surface of the dielectric structure and extends over the first polymer layer, and the patterned conductive layer is electrically connected to the semiconductor chip.
    Type: Application
    Filed: April 29, 2019
    Publication date: October 29, 2020
    Inventors: Yu-Ju LIAO, Chien-Fan CHEN, Chien-Hao WANG
  • Publication number: 20200343188
    Abstract: An embedded component package structure including a dielectric structure and a component is provided. The component is embedded in the dielectric structure and is provided with a plurality of conductive pillars. The conductive pillars are exposed from an upper surface of the dielectric structure and have a first thickness and a second thickness, respectively, and the first thickness is not equal to the second thickness.
    Type: Application
    Filed: April 29, 2019
    Publication date: October 29, 2020
    Inventors: Yu-Ju LIAO, Chien-Fan CHEN, Chien-Hao WANG
  • Publication number: 20200296836
    Abstract: An embedded component package structure including a circuit substrate, an embedded component and a stress compensation layer is provided. The circuit substrate includes a core layer and an asymmetric circuit structure, and the core layer has a first thickness. The embedded component is disposed in the core layer. The stress compensation layer is disposed on one side of the core layer, and the stress compensation layer has a second thickness between 4 ?m and 351 ?m.
    Type: Application
    Filed: March 12, 2019
    Publication date: September 17, 2020
    Inventors: Yu-Ju LIAO, Chien-Fan CHEN, Chien-Hao WANG, I-Chia LIN