Patents by Inventor Yu-Jung Shih

Yu-Jung Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7626662
    Abstract: A method for fabricating liquid crystal (LC) alignment includes the steps of processing an alignment film having a plurality of liquid crystal molecules with a single or plurality of plasma generating devices, such that the liquid crystal molecules are aligned at a high pretilt angle. Compared with the prior art, the present invention is suitable for modifying the alignment film surface adjustablely in directions and angles, and can attain the effect of alignment stability with a high pretilt angle in a single process, thus overcoming the drawbacks of the prior art.
    Type: Grant
    Filed: August 3, 2007
    Date of Patent: December 1, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Chin-Yang Lee, Huang-Chin Tang, Kei-Hsiung Yang, Chih-Wei Chen, Chi-Hung Liu, Yu-Jung Shih
  • Publication number: 20080030673
    Abstract: A method for fabricating liquid crystal (LC) alignment includes the steps of processing an alignment film having a plurality of liquid crystal molecules with a single or plurality of plasma generating devices, such that the liquid crystal molecules are aligned at a high pretilt angle. Compared with the prior art, the present invention is suitable for modifying the alignment film surface adjustablely in directions and angles, and can attain the effect of alignment stability with a high pretilt angle in a single process, thus overcoming the drawbacks of the prior art.
    Type: Application
    Filed: August 3, 2007
    Publication date: February 7, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Yang Lee, Huang-Chin Tang, Kei-Hsiung Yang, Chih-Wei Chen, Chi-Hung Liu, Yu-Jung Shih
  • Publication number: 20070148988
    Abstract: A fabrication method for an alignment film is proposed. A film is deposited on a substrate by an atmosphere plasma in a predetermined direction at a predetermined angle, while moving the substrate and the atmosphere plasma relative to each other. Thereby, a uniform isotropic alignment film with strong anchoring energy is formed and the pre-tilt angle can be designed according to the need. Problems such as static charge and dust generated during a conventional rubbing process are prevented. In addition, since the above fabrication method eliminates the need of vacuum devices that are required in conventional ion beam alignment and plasma beam alignment processes, the fabrication method can be used to fabricate large sized alignment film. Moreover, fabrication cost is lowered through the use of the fabrication method.
    Type: Application
    Filed: August 18, 2006
    Publication date: June 28, 2007
    Inventors: Chih-Wei Chen, Chun-Hung Lin, Huang-Chin Tang, Yun-Chuan Tu, Ying-Fang Chang, Yu-Jung Shih
  • Patent number: D968568
    Type: Grant
    Filed: September 7, 2020
    Date of Patent: November 1, 2022
    Assignee: T & R ROXGEN INDUSTRIES CO., LTD.
    Inventor: Yu-Jung Shih