Abstract: A trial production condition proposal system 1 is a system for proposing a trial production condition(s) for a material to a material developer and includes a regression model construction processing unit 112 and a trial production condition proposal processing unit 113. The regression model construction processing unit 112 executes regression model construction processing on measured characteristics data indicating an actual measurement result of characteristics of the material. The trial production condition proposal processing unit 113 performs optimization processing for searching for an optimum trial production condition for the material by using the constructed regression model and executes trial production condition proposal processing based on the result of the optimization processing.

Abstract: Disclosed herein include methods and compositions suitable for use in modulation of aversive taste tolerance. In some embodiments, ingestion of sodium and/or aversive substances is reduced. Also disclosed include methods for identifying modulators for aversive taste tolerance.

Abstract: A porous body design method using a computer causes the computer to execute, a plurality of times, a characteristic prediction/calculation process of predicting or calculating characteristics of a porous body having a predetermined three-dimensional structure, an evaluation process of evaluating the characteristics of the porous body predicted or calculated by the characteristic prediction/calculation process, and an optimization process of changing connectivity between pores in the three-dimensional structure to search for an optimal connectivity, in which the three-dimensional structure of the porous body is determined on the basis of evaluation results of the characteristics of the porous body by the evaluation process.

Abstract: Provided is a method for forming a deposition film, with which a deposition film having improved uniformity of a film thickness can be formed. The method for forming a deposition film is a method for forming a deposition film on a substrate (21) on which a pattern (22) is formed, and the method includes a deposition step of placing the substrate (21) on an electrode and applying bias power to the electrode to form a deposition film (40) on the substrate (21) using plasma obtained by plasma-processing a deposition gas. A material constituting the pattern (22) is at least one of a carbon-containing material, a silicon-containing material, and a metal-containing material. In addition, the deposition gas contains unsaturated halon. The unsaturated halon is an unsaturated compound which has a fluorine atom, a bromine atom, and a carbon atom in a molecule and has 2 or 3 carbon atoms. Further, a power density of the bias power applied to the electrode is more than 0 W/cm2 and 0.5 W/cm2 or less.

Abstract: A porous body design method using a computer causes the computer to execute, a plurality of times, a structure generation process of virtually generating a three-dimensional structure of a porous body on the computer on the basis of generation parameter values for generating the porous body, a characteristic prediction/calculation process of predicting or calculating the characteristics of the porous body having the three-dimensional structure generated by the structure generation process, an evaluation process of evaluating the characteristics of the porous body predicted or calculated by the characteristic prediction/calculation process, and an optimization process of changing the generation parameter values to search for optimal generation parameter values, in which the three-dimensional structure of the porous body is determined on the basis of evaluation results of the characteristics of the porous body obtained by the evaluation process.

Abstract: Disclosed herein include methods and compositions for incorporating an effector gene into the genome of a cell. The method can comprise introducing into a cell a donor nucleic acid comprising a recognition site, a splice acceptor site, a self-cleaving peptide sequence, an effector gene, and an optional transcript stabilization element. The donor nucleic acid can be incorporated into the intron of a target gene differentially expressed in a unique cell type and/or in a cell during a unique cell state via non-homologous end joining (NHEJ)-dependent DNA repair. There are also provided, in some embodiments, methods and compositions for treating a disease or disorder in a subject.

Abstract: Disclosed herein include methods and compositions for modulating sodium appetite and/or intake. In some embodiments, the sodium appetite of a subject is reduced. Also disclosed include methods for identifying modulators for sodium appetite and/or intake.

Abstract: Disclosed herein include methods and compositions for incorporating an effector gene into the genome of a cell. The method can comprise introducing into a cell a donor nucleic acid comprising a recognition site, a splice acceptor site, a self-cleaving peptide sequence, an effector gene, and an optional transcript stabilization element. The donor nucleic acid can be incorporated into the intron of a target gene differentially expressed in a unique cell type and/or in a cell during a unique cell state via non-homologous end joining (NHEJ)-dependent DNA repair. There are also provided, in some embodiments, methods and compositions for treating a disease or disorder in a subject.

Abstract: Disclosed herein include methods and compositions for incorporating an effector gene into the genome of a cell. The method can comprise introducing into a cell a donor nucleic acid comprising a recognition site, a splice acceptor site, a self-cleaving peptide sequence, an effector gene, and an optional transcript stabilization element. The donor nucleic acid can be incorporated into the intron of a target gene differentially expressed in a unique cell type and/or in a cell during a unique cell state via non-homologous end joining (NHEJ)-dependent DNA repair. There are also provided, in some embodiments, methods and compositions for treating a disease or disorder in a subject.

Abstract: Trial manufacturing condition proposing system includes a characteristic evaluation data preprocessing unit, a feature value selection processing unit, a regression model creation processing unit, and a trial manufacturing condition proposing processing unit. The characteristic evaluation data preprocessing unit applies preprocessing to the characteristic evaluation data indicating an evaluation result of characteristics of the material. The feature value selection processing unit executes feature value selection processing on the characteristic evaluation data to which the preprocessing has been applied. The regression model creation processing unit executes regression model creation processing on the characteristic evaluation data, to which the preprocessing has been applied, based on the result of the feature value selection processing.

Abstract: A method for forming a pattern of metal oxide capable of selectively etching an etching object containing metal oxide relative to a non-etching object and forming a pattern of the metal oxide along a pattern of the non-etching object serving as a template. Metal oxide containing oxide of at least one of tin and indium is etched using an etching gas to form the pattern of the metal oxide. An etching gas containing halon is brought into contact with a member to be etched in the presence of plasma, and etching is performed while a bias power is applied to a lower electrode (2) supporting the member to be etched to selectively etch a metal oxide layer (22) relative to a silicon substrate (24), a template layer (21), and an underlying layer (23), and the predetermined pattern of the template layer (21) is transferred to the metal oxide layer (22).

Abstract: Disclosed herein include methods and compositions for modulating sodium appetite and/or intake. In some embodiments, the sodium appetite of a subject is reduced. Also disclosed include methods for identifying modulators for sodium appetite and/or intake.

Abstract: There is provided a plasma etching method capable of selectively etching an etching object containing oxide of at least one of tin and indium compared to a non-etching object. The plasma etching method includes: an etching step of bringing an etching gas containing an unsaturated compound having a fluorine atom and a bromine atom in the molecule thereof into contact with a member to be etched including an etching object to be etched by the etching gas and a non-etching object not to be etched by the etching gas in the presence of plasma, performing etching while applying a bias power exceeding 0 W to a lower electrode supporting the member to be etched, and selectively etching the etching object compared to the non-etching object. The etching object contains oxide of at least one of tin and indium and the non-etching object contains at least one of a silicon-containing compound and a photoresist.

Abstract: Disclosed herein include methods and compositions for incorporating an effector gene into the genome of a cell. The method can comprise introducing into a cell a donor nucleic acid comprising a recognition site, a splice acceptor site, a self-cleaving peptide sequence, an effector gene, and an optional transcript stabilization element. The donor nucleic acid can be incorporated into the intron of a target gene differentially expressed in a unique cell type and/or in a cell during a unique cell state via non-homologous end joining (NHEJ)-dependent DNA repair. There are also provided, in some embodiments, methods and compositions for treating a disease or disorder in a subject.

Abstract: Method of identifying a valid flow path includes: performing fluid analysis of a porous body, which is ought to have inflow surface and outflow surface, based on structure data representing a 3-dimentional structure of the porous body to generate data indicating at least a pressure distribution of a fluid in a flow path in the porous body; and identifying a valid flow path that allows the fluid to flow from the inflow surface to the outflow surface based on a gradient of pressure values along a flow direction of the fluid in the flow path.

Abstract: There is provided a plasma etching method having a high etching rate of a silicon nitride film. A plasma etching method includes an etching step of etching a silicon nitride film formed on a substrate (20) using plasma obtained by converting an etching gas containing iodine heptafluoride into plasma.

Abstract: In some embodiments, methods of stimulating fluid intake in a subject in need thereof are described. The methods can comprise stimulating a nitric oxide synthase (nNOS)-positive neuron of the median preoptic nucleus (MnPO). In some embodiments, methods of inhibiting fluid intake in a subject in need thereof are described. The methods can comprise inhibiting stimulation of an nNOS-positive neuron of the MnPO.

Abstract: Method of identifying a valid flow path includes: performing fluid analysis of a porous body, which is ought to have inflow surface and outflow surface, based on structure data representing a 3-dimentional structure of the porous body to generate data indicating at least a pressure distribution of a fluid in a flow path in the porous body; and identifying a valid flow path that allows the fluid to flow from the inflow surface to the outflow surface based on a gradient of pressure values along a flow direction of the fluid in the flow path.

Abstract: Disclosed herein include methods and compositions for incorporating an effector gene into the genome of a cell. The method can comprise introducing into a cell a donor nucleic acid comprising a recognition site, a splice acceptor site, a self-cleaving peptide sequence, an effector gene, and an optional transcript stabilization element. The donor nucleic acid can be incorporated into the intron of a target gene differentially expressed in a unique cell type and/or in a cell during a unique cell state via non-homologous end joining (NHEJ)-dependent DNA repair. There are also provided, in some embodiments, methods and compositions for treating a disease or disorder in a subject.

Abstract: An object is to provide, for example, a method for manufacturing a film-forming substrate that can sufficiently improve both bleeding of a resin composition and adhesion between the resin composition and a metal substrate surface. For example, provided is a method for manufacturing a film-forming substrate having a film of a resin composition formed on a metal substrate surface, the method including: an etching step of etching a metal substrate surface with a micro-etching agent; a surface treatment step of bringing the etched metal substrate surface into contact with a surface treatment agent to perform a surface treatment such that a contact angle of water on the surface is 50° or more and 150° or less; and a film forming step of forming a film of a resin composition on the surface-treated metal substrate surface by an inkjet method.