Patents by Inventor Yu Nishimura
Yu Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20260141554Abstract: There is provided an information processing apparatus including circuitry configured to acquire model data, acquire, based on a position and a posture of a user, data of a pose of the user, estimate skeleton data including position information regarding portions of the user based on the position data and output a result of pose similarity based on the model data and the skeleton data, a same result of pose similarity being output based on different skeleton data that is estimated based on respective different position data of the pose of the user, the respective different position data being acquired from a first position and a first posture of the user, and from a second position and a second posture of the user, and at least one of the first position being different than the second position or the first posture is different than the second posture.Type: ApplicationFiled: September 14, 2023Publication date: May 21, 2026Applicant: Sony Group CorporationInventors: Yu NISHIMURA, Rui KOUNO
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Publication number: 20260082022Abstract: An information processing device includes: a 360-degree image processing unit that generates a 360-degree image on the basis of a plurality of captured images captured by a plurality of cameras worn by a first user; and a 360-degree image viewpoint position identification unit that identifies viewpoint position coordinates of the first user in the 360-degree image.Type: ApplicationFiled: August 8, 2023Publication date: March 19, 2026Applicant: Sony Group CorporationInventors: Yu NISHIMURA, Asuka TEJIMA, Shingo UTSUKI, Ryo OGAWA
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Publication number: 20260057514Abstract: An image processing apparatus having a processor and a display that displays an observation image.Type: ApplicationFiled: August 26, 2025Publication date: February 26, 2026Applicants: NIHON UNIVERISTY, J. MORITA MFG. CORPInventors: Yoshinori ARAI, Yu NISHIMURA
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Publication number: 20260057527Abstract: An image processing apparatus that includes a storage storing image data obtained by CT imaging of dentition constituent tissue, a processor, and a display. The processor generates three-dimensional image data of the dentition constituent tissue, identifies a segmentable region in the dentition constituent tissue, identifies a three-dimensional position of the segmentable region, generates a dentition developed image, identifies a segmentable region corresponding position corresponding to the three-dimensional position in the dentition developed image, and displays, on the display, the dentition developed image in which the segmentable region is displayed at the segmentable region corresponding position.Type: ApplicationFiled: August 26, 2025Publication date: February 26, 2026Applicants: NIHON UNIVERSITY, J. MORITA MFG. CORP.Inventors: Yoshinori ARAI, Yu NISHIMURA
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Publication number: 20260057515Abstract: An image processing apparatus that displays, on a display, a biological feature region arrangement developed image in which at least one of a plurality of annotation images respectively indicating a plurality of biological feature regions is superimposed on a dentition developed image such that the annotation images are located at corresponding positions of the plurality of biological feature region corresponding positions.Type: ApplicationFiled: August 26, 2025Publication date: February 26, 2026Applicant: J. MORITA MFG. CORP.Inventor: Yu NISHIMURA
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Publication number: 20250159425Abstract: There is provided an information processing device, an information processing method, and a recording medium that enable sharing of attention of users existing in a wide area. The information processing device includes a control unit that performs control of spatial localization of an audio of another user except a target user on the basis of information regarding at least one of a view direction of a first user corresponding to a captured image captured by an imaging device provided for the first user or a view direction of a second user who views a surrounding captured image in which surroundings of a position where the first user exists are captured as the captured image. The present disclosure can be applied to, for example, devices constituting a system that shares view information.Type: ApplicationFiled: February 27, 2023Publication date: May 15, 2025Applicant: Sony Group CorporationInventors: Kentaro KIMURA, Osamu SHIGETA, Yu NISHIMURA, Tsutomu FUZAWA, Yuichi HASEGAWA
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Publication number: 20240412331Abstract: The present technology relates to an information processing device, an information processing method, and a program capable of reducing a load in a case where an operator monitors the surroundings of a plurality of systems. The information processing device includes: a recognition unit that extracts a caution-needed region, which is a region requiring caution around each of a plurality of systems, on the basis of a plurality of captured images captured at different positions by the plurality of systems; and an image processing unit that generates a first bird's-eye view image on the basis of the plurality of captured images including a plurality of the caution-needed regions. The present technology can be applied to, for example, a server that mediates monitoring of a system and intervention in the system by an operator.Type: ApplicationFiled: October 6, 2022Publication date: December 12, 2024Inventors: YUSUKE HIEIDA, YU ISHIHARA, AKIRA UEHARA, YU NISHIMURA
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Patent number: 12138928Abstract: Provided is a method for manufacturing a liquid ejection head substrate and a method for manufacturing a liquid ejection head capable of reducing degradation of the quality of a printed image. To this end, in formation of a liquid ejection head substrate, a part required to have more precise relative positional relation or not required to have high fabrication precision is set as a first part, and for the first part, a single-shot exposure method is employed. Also, a part required to have higher fabrication precision is set as a second part, and for the second part, a split exposure method is employed.Type: GrantFiled: August 12, 2022Date of Patent: November 12, 2024Assignee: CANON KABUSHIKI KAISHAInventors: Seiko Minami, Hidenori Yamato, Takaaki Yamaguchi, Nobuyuki Hirayama, Kyohei Kubota, Yu Nishimura
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Publication number: 20240355223Abstract: An information processing device (2) includes an acquisition unit (22) that acquires detection results of a plurality of sensors (1) that detects skill acquisition operation, and a processing unit (24) that processes the detection results of the plurality of sensors (1) which results are acquired by the acquisition unit (22).Type: ApplicationFiled: March 23, 2022Publication date: October 24, 2024Applicant: Sony Group CorporationInventors: Takanori OKU, Yu NISHIMURA, Hayato NISHIOKA, Shinichi FURUYA, Yukako UEMATSU, Junichiro SAKATA, Takaharu SUZUKI, Reigo BAN, Ryo NAKABAYASHI
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Publication number: 20240252105Abstract: A support apparatus includes an input interface that receives input of image data showing a three-dimensional geometry of a biological tissue and a computing device that derives support information including information on positions of at least the tooth and the gingiva relative to each other, by using the image data inputted from the input interface and an estimation model for support of diagnosis of the state of disease in the biological tissue based on the image data, the estimation model being trained by machine learning to derive the support information.Type: ApplicationFiled: February 1, 2024Publication date: August 1, 2024Applicant: J. MORITA MFG. CORP.Inventors: Hideki YOSHIKAWA, Yu NISHIMURA
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Publication number: 20230049764Abstract: Provided is a method for manufacturing a liquid ejection head substrate and a method for manufacturing a liquid ejection head capable of reducing degradation of the quality of a printed image. To this end, in formation of a liquid ejection head substrate, a part required to have more precise relative positional relation or not required to have high fabrication precision is set as a first part, and for the first part, a single-shot exposure method is employed. Also, a part required to have higher fabrication precision is set as a second part, and for the second part, a split exposure method is employed.Type: ApplicationFiled: August 12, 2022Publication date: February 16, 2023Inventors: Seiko Minami, Hidenori Yamato, Takaaki Yamaguchi, Nobuyuki Hirayama, Kyohei Kubota, Yu Nishimura
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Patent number: 11177314Abstract: A photoelectric conversion apparatus includes a plurality of units each including a charge generation region disposed in a semiconductor layer. Each of a first unit and a second unit of the plurality of units includes a charge storage region configured to store charges transferred thereto from the charge generation region, a dielectric region located above the charge generation region and surrounded by an insulator layer, and a first light-shielding layer covering the charge storage region that is located between the insulator layer and the semiconductor layer, and the first light-shielding layer having an opening located above the charge generation region. The charge generation region of the first unit is able to receive light through the opening of the first light-shielding layer. The charge generation region of the second unit is covered with a second light-shielding layer.Type: GrantFiled: July 6, 2020Date of Patent: November 16, 2021Assignee: CANON KABUSHIKI KAISHAInventors: Yu Nishimura, Sho Suzuki, Yasushi Matsuno, Yusuke Onuki, Masahiro Kobayashi, Takashi Okagawa, Yoshiyuki Nakagawa
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Publication number: 20200335547Abstract: A photoelectric conversion apparatus includes a plurality of units each including a charge generation region disposed in a semiconductor layer. Each of a first unit and a second unit of the plurality of units includes a charge storage region configured to store charges transferred thereto from the charge generation region, a dielectric region located above the charge generation region and surrounded by an insulator layer, and a first light-shielding layer covering the charge storage region that is located between the insulator layer and the semiconductor layer, and the first light-shielding layer having an opening located above the charge generation region. The charge generation region of the first unit is able to receive light through the opening of the first light-shielding layer. The charge generation region of the second unit is covered with a second light-shielding layer.Type: ApplicationFiled: July 6, 2020Publication date: October 22, 2020Inventors: Yu Nishimura, Sho Suzuki, Yasushi Matsuno, Yusuke Onuki, Masahiro Kobayashi, Takashi Okagawa, Yoshiyuki Nakagawa
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Patent number: 10763298Abstract: A photoelectric conversion apparatus includes a plurality of units each including a charge generation region disposed in a semiconductor layer. Each of a first unit and a second unit of the plurality of units includes a charge storage region configured to store charges transferred thereto from the charge generation region, a dielectric region located above the charge generation region and surrounded by an insulator layer, and a first light-shielding layer covering the charge storage region that is located between the insulator layer and the semiconductor layer, and the first light-shielding layer having an opening located above the charge generation region. The charge generation region of the first unit is able to receive light through the opening of the first light-shielding layer. The charge generation region of the second unit is covered with a second light-shielding layer.Type: GrantFiled: October 24, 2017Date of Patent: September 1, 2020Assignee: CANON KABUSHIKI KAISHAInventors: Yu Nishimura, Sho Suzuki, Yasushi Matsuno, Yusuke Onuki, Masahiro Kobayashi, Takashi Okagawa, Yoshiyuki Nakagawa
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Publication number: 20180122852Abstract: A photoelectric conversion apparatus includes a plurality of units each including a charge generation region disposed in a semiconductor layer. Each of a first unit and a second unit of the plurality of units includes a charge storage region configured to store charges transferred thereto from the charge generation region, a dielectric region located above the charge generation region and surrounded by an insulator layer, and a first light-shielding layer covering the charge storage region that is located between the insulator layer and the semiconductor layer, and the first light-shielding layer having an opening located above the charge generation region. The charge generation region of the first unit is able to receive light through the opening of the first light-shielding layer. The charge generation region of the second unit is covered with a second light-shielding layer.Type: ApplicationFiled: October 24, 2017Publication date: May 3, 2018Inventors: Yu Nishimura, Sho Suzuki, Yasushi Matsuno, Yusuke Onuki, Masahiro Kobayashi, Takashi Okagawa, Yoshiyuki Nakagawa
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Publication number: 20180006584Abstract: There is provided a piezoelectric actuator apparatus capable of moving an object to be driven at high velocity by using a piezoelectric element to apply a force to a driving member coupled to the object to be driven by a predetermined frictional force. A piezoelectric actuator apparatus 100 is controlled and driven by inputting a driving voltage having a PWM waveform to a piezoelectric element 101 to which an inductor 27 and a resistor 28 are connected in series. The piezoelectric actuator apparatus 100 increases the velocity of the object to be driven 106 by adjusting respective values of the inductance L0 and the resistance R0 to control damping ratios, amplitudes, and resonance frequencies of the respective vibrations of the piezoelectric mechanical resonance and the piezoelectric electrical resonance, and inducing a response of the driving member 102 closer to sawtooth waves.Type: ApplicationFiled: November 30, 2015Publication date: January 4, 2018Inventors: Yu Nishimura, Toshiaki Edamitsu, Hitoshi Yamagata
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Patent number: 9559136Abstract: A semiconductor device manufacturing method includes a step of forming a hole reaching a first insulating layer over a first conductive member; a step of forming a trench reaching a second insulating layer and in communication with the hole; a step of forming an opening exposing the first conductive member in the hole; and a step of forming a second conductive member connected to the first conductive member by embedding a conductive material in the opening, the hole, and the trench. The trench is formed under an etching condition such that the etching rate with respect to the second insulating layer is lower than the etching rate with respect to the third insulating layer.Type: GrantFiled: February 10, 2015Date of Patent: January 31, 2017Assignee: Canon Kabushiki KaishaInventors: Aiko Kato, Yu Nishimura, Hiroaki Naruse, Keita Torii
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Publication number: 20150228683Abstract: A semiconductor device manufacturing method includes a step of forming a hole reaching a first insulating layer over a first conductive member; a step of forming a trench reaching a second insulating layer and in communication with the hole; a step of forming an opening exposing the first conductive member in the hole; and a step of forming a second conductive member connected to the first conductive member by embedding a conductive material in the opening, the hole, and the trench. The trench is formed under an etching condition such that the etching rate with respect to the second insulating layer is lower than the etching rate with respect to the third insulating layer.Type: ApplicationFiled: February 10, 2015Publication date: August 13, 2015Inventors: Aiko Kato, Yu Nishimura, Hiroaki Naruse, Keita Torii