Abstract: An object of the present invention is to provide a new compound that is useful as a film forming material for lithography and the like. The above object can be achieved by a compound represented by the following formula (1).

Abstract: A battery monitoring device includes: a pair of terminals for measuring voltage or current of a battery, and to which a filter unit including a capacitive element is connected; an AD converter that measures a waveform of voltage between the terminals during charging or discharging of the capacitive element; and a time constant calculation unit that calculates a time constant of the filter unit based on the waveform measured. The AD converter is, for example, a first AD converter or a second AD converter. The filter unit is, for example, a first filter unit or a second filter unit.

Abstract: An object of the present invention is to provide a compound and the like that are applicable to a wet process and are useful for forming a photoresist and an underlayer film for photoresists excellent in heat resistance, solubility, and etching resistance. A compound represented by the following formula (1) can solve the problem described above.

Abstract: An automatic driving system includes: an information acquiring device configured to acquire driving environment information indicating a driving environment of the vehicle; a running control device configured to execute lane change control from a first lane to a second lane during automatic driving of the vehicle based on the driving environment information; and a display device configured to display an upper limit value of a running speed of the vehicle which is set by a driver of the vehicle during automatic driving. The display device is configured to display a deviation value which is calculated based on a target value of the running speed and the upper limit value along with the upper limit value during a speed-deviation running in which the running speed is higher than the upper limit value.

Abstract: The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.

Abstract: The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.

Abstract: A resist composition of the present invention is a resist composition containing a resist base material and a solvent. The resist base material contains a specific stereoisomer. A content of the specific stereoisomer in the resist base material is 50 to 100% by mass.

Abstract: The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.

Abstract: A resist composition of the present invention is a resist composition containing a resist base material and a solvent. The resist base material contains a specific stereoisomer. A content of the specific stereoisomer in the resist base material is 50 to 100% by mass.

Abstract: Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.

Abstract: An industrially advantageous purification method for a cyclic compound with a particular structure is provided. A purification method for a cyclic compound, including a step of contacting a solution containing a cyclic compound with a particular structure and an organic solvent with water or an acidic aqueous solution.

Abstract: Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.

Abstract: In an interlayer movement apparatus for moving the focal point of the laser light to an arbitrary layer, there are provided an objective lens which collects the laser light from an optical source, a focus actuator which makes the objective lens move in its optical axis direction, a focus error detection means for detecting the convergent state of the laser light on the information layer of the optical disc, and an interlayer movement control system for making the focal point of the laser light move to an information layer two or more layers apart by controlling the focus actuator according to a relative speed between the information layer of the optical disc and the focal point which was calculated using the time required for the focal point of the laser light passing through the respective layers which was measured on the basis of the output signal of the focus error detection means and the respective interlayer distances which are specified by the optical disc specifications.

Abstract: To provide an interlayer movement apparatus of an optical disc apparatus which can perform the interlayer movement stably even when the interlayer distances of the multi-layer optical disc which are specified by the disc specification are different between the respective layers.

Abstract: A tracking control apparatus comprises an signal processing section, a lens characteristic measuring section and an optimum lens position searching section. The lens characteristic measuring section acquires a first address and second address of an optical disk. The lens characteristic measuring section successively generates offset set values so that the position of a converging lens is moved by an actuator at predetermined spatial intervals and counts the number of times both the first address and the second address are acquired. The optimum lens position searching section searches for a maximum value of the acquisition count and moves the converging lens using the actuator based on the offset set value when the acquisition count reaches a maximum value.

Abstract: A tracking control apparatus comprises an signal processing section, a lens characteristic measuring section and an optimum lens position searching section. The lens characteristic measuring section acquires a first address and second address of an optical disk. The lens characteristic measuring section successively generates offset set values so that the position of a converging lens is moved by an actuator at predetermined spatial intervals and counts the number of times both the first address and the second address are acquired. The optimum lens position searching section searches for a maximum value of the acquisition count and moves the converging lens using the actuator based on the offset set value when the acquisition count reaches a maximum value.