Patents by Inventor YU SHIN PARK

YU SHIN PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
    Patent number: 10345706
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: July 9, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun-Ji Song, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Yoo-Jeong Choi, Seung-Hee Hong
  • Monomer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 10332751
    Abstract: A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: June 25, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Yu-Shin Park, You-Jung Park, Hyun-Ji Song
  • Organic layer composition, organic layer, and method of forming patterns
    Patent number: 10066057
    Abstract: An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: September 4, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yu-Shin Park, Yun-Jun Kim, Tae-Ho Kim, You-Jung Park, Yoo-Jeong Choi, Hyo-Young Kwon, Seung-Hyun Kim, Ran Namgung, Dominea Rathwell, Soo-Hyoun Mun, Hyun-Ji Song, Hyeon-Il Jung, Yu-Mi Heo
  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9971243
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specification and * is a linking point.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 15, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yu-Shin Park, Tae-Ho Kim, Yoo-Jeong Choi, Sun-Hae Kang, Hyo-Young Kwon, Sang-Kyun Kim, Young-Min Kim, Youn-Hee Nam, Hyun-Ji Song, Byeri Yoon, Dong-Geun Lee, Seulgi Jeong
  • Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
    Patent number: 9665003
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 30, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Hyun-Ji Song, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Seung-Hee Hong
  • POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160363864
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specifiction and * is a linking point.
    Type: Application
    Filed: June 3, 2016
    Publication date: December 15, 2016
    Inventors: Yu-Shin PARK, Tae-Ho KIM, Yoo-Jeong CHOI, Sun-Hae KANG, Hyo-Young KWON, Sang-Kyun KIM, Young-Min KIM, Youn-Hee NAM, Hyun-Ji SONG, Byeri YOON, Dong-Geun LEE, Seulgi JEONG
  • ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160297932
    Abstract: An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,
    Type: Application
    Filed: November 30, 2015
    Publication date: October 13, 2016
    Inventors: Yu-Shin PARK, Yun-Jun KIM, Tae-Ho KIM, You-Jung PARK, Yoo-Jeong CHOI, Hyo-Young KWON, Seung-Hyun KIM, Ran NAMGUNG, Dominea RATHWELL, Soo-Hyoun MUN, Hyun-Ji SONG, Hyeon-Il JUNG, Yu-Mi HEO
  • MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160237306
    Abstract: A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
    Type: Application
    Filed: December 28, 2015
    Publication date: August 18, 2016
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Yu-Shin Park, You-Jung Park, Hyun-Ji Song
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9371444
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: June 21, 2016
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Young-Min Kim, Joon-Young Moon, Yu-Shin Park, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150329718
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Application
    Filed: January 22, 2015
    Publication date: November 19, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Young-Min KIM, Joon-Young MOON, Yu-Shin PARK, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS
    Publication number: 20150187566
    Abstract: A hardmask composition includes a polymer including a moiety represented by one of the following Chemical Formulae 1a to 1c, a monomer represented by the following Chemical Formula 2 and a solvent. In the above Chemical Formulae 1a, 1b, 1c, and 2, R1a, R1b, R4a, R4b, R2a, R2b, R5a, R5b and R3 are the same as defined in the specification.
    Type: Application
    Filed: November 5, 2014
    Publication date: July 2, 2015
    Inventors: Yu-Shin PARK, Yun-Jun KIM, Joon-Young MOON, You-Jung PARK, Hyun-Ji SONG, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Yoo-Jeong CHOI
  • HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS
    Publication number: 20150004531
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Application
    Filed: April 28, 2014
    Publication date: January 1, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Hyun-Ji SONG, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Seung-Hee HONG
  • MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150001178
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Application
    Filed: April 22, 2014
    Publication date: January 1, 2015
    Inventors: Hyun-Ji SONG, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Yoo-Jeong CHOI, Seung-Hee HONG
  • Method of Mapping of mRNA Distribution With Atomic Force Microscopy Comprising Dendron
    Publication number: 20120237927
    Abstract: The present invention relates to a method of mapping of mRNA distribution, comprising the steps of a preparing a probe DNA attached to a apical liner region of the dendron on AFM cantilever where the probe DNA can specifically hybridize a target mRNA and measuring specific adhesive force between the probe DNA and the target mRNA on sectioned tissue at nanometer resolution.
    Type: Application
    Filed: December 1, 2011
    Publication date: September 20, 2012
    Inventors: Joon Won Park, Yu Jin Jung, Yu Shin Park, Hong Gil Nam
  • METHOD OF MAPPING OF mRNA DISTRIBUTION WITH ATOMIC FORCE MICROSCOPY
    Publication number: 20090258367
    Abstract: The present invention relates to a method of mapping of mRNA distribution, comprising the steps of a preparing a probe DNA attached to a apical liner region of the dendron on AFM cantilever where the probe DNA can specifically hybridize a target mRNA and measuring specific adhesive force between the probe DNA and the target mRNA on sectioned tissue at nanometer resolution.
    Type: Application
    Filed: March 31, 2009
    Publication date: October 15, 2009
    Applicant: Postech Academy-Industry Foundation
    Inventors: JOON WON PARK, YU JIN JUNG, YU SHIN PARK, HONG GIL NAM
  • Novel polypetide having function of 7-keto-8-aminopelargonic acid synthase of plant and method for inducing growth inhibition and lethality by suppressing expression of the polypeptide
    Publication number: 20060168675
    Abstract: The invention relates to a novel polypeptide participating in biotin biosynthesis of plant, a polynucleotide encoding the said polypeptide, a method for inducing plant growth inhibition by suppressing the expression or function of the said polypeptide, resulting in inhibition of biotin biosynthesis, and a method for identifying herbicidal compounds that inhibit the expression or function of the said polypeptide. Biotin biosynthesis is an essential process for the growth of plants, however, the process is not present in both human and animals. Therefore, the compounds suppressing the expression or function of the novel polypeptide that relates to biotin biosynthesis can be effectively used as a new herbicide doing human and animals no harm.
    Type: Application
    Filed: July 2, 2003
    Publication date: July 27, 2006
    Applicant: GENOMINE, INC
    Inventors: Dong-Hee Lee, In-Taek Hwang, Jung-Sup Choi, Yong-Ki Min, Tae-Joon Kim, Jae-Heung Ko, Tae-Hoon Kim, Yu-Shin Park, Kwang-Yun Cho, Seon-Woo Lee