Patents by Inventor Yu-Tai Chia

Yu-Tai Chia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7469376
    Abstract: A computer-based system and method for generating a primary document characterizing a device from multiple secondary documents is provided. In one example, the method includes defining a primary document template and multiple input files. Each input file defines the source and type of information for a section of the primary document template. A document generation engine parses the secondary documents and inserts information from them into the primary document template based on the input files. After the primary document is generated, related technologies or devices may be identified and notified of changes to the device in the primary document. The related technologies or devices may then be updated if desired.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: December 23, 2008
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Tai Chia, Tse-Lun Tsai, Chung-Lun Kuo, Shiun-Huan Lai
  • Patent number: 7028277
    Abstract: Each of a method for determining a parasitic capacitance and an apparatus for determining the parasitic capacitance provides for an experimental correlation within a parasitic capacitance model of a series of conductor layer nominal dimensions and spacings with a process related deviation to provide a series of conductor layer actual dimensions and spacings. The method and the apparatus further provide for determining the parasitic capacitance while employing the conductor layer actual dimensions and spacings. The parasitic capacitance is thus determined with enhanced accuracy.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: April 11, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Victor C. Y. Chang, Chung-Shi Chiang, Chien-Wen Chen, Harry Chuang, Hsin-Yi Lee, Yu-Tai Chia
  • Patent number: 6989578
    Abstract: An inductor in an integrated circuit comprises a conductive trace disposed over an insulating layer which overlies a semiconductor substrate of a first conductivity type and at least two deep wells of opposite conductivity type in the substrate underneath the track. In another embodiment, an inductor in an integrated circuit comprises a conductive trace disposed over an insulating layer which overlies a semiconductor substrate of a first conductivity type; a shallow trench isolation region formed in the substrate underneath the trace; and at least two deep wells of opposite conductivity type in the substrate underneath the shallow trench isolation region. The present invention also includes methods of manufacturing the aforementioned inductors.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: January 24, 2006
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Tzu-Jin Yeh, Hsien-Chang Wu, Ming-Ta Yang, Yu-Tai Chia
  • Publication number: 20050206957
    Abstract: A computer-based system and method for generating a primary document characterizing a device from multiple secondary documents is provided. In one example, the method includes defining a primary document template and multiple input files. Each input file defines the source and type of information for a section of the primary document template. A document generation engine parses the secondary documents and inserts information from them into the primary document template based on the input files. After the primary document is generated, related technologies or devices may be identified and notified of changes to the device in the primary document. The related technologies or devices may then be updated if desired.
    Type: Application
    Filed: March 19, 2004
    Publication date: September 22, 2005
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Tai Chia, Tse-Lun Tsai, Chung-Lun Kuo, Shiun-Huan Lai
  • Publication number: 20050023639
    Abstract: An inductor in an integrated circuit comprises a conductive trace disposed over an insulating layer which overlies a semiconductor substrate of a first conductivity type and at least two deep wells of opposite conductivity type in the substrate underneath the track. In another embodiment, an inductor in an integrated circuit comprises a conductive trace disposed over an insulating layer which overlies a semiconductor substrate of a first conductivity type; a shallow trench isolation region formed in the substrate underneath the trace; and at least two deep wells of opposite conductivity type in the substrate underneath the shallow trench isolation region. The present invention also includes methods of manufacturing the aforementioned inductors.
    Type: Application
    Filed: July 31, 2003
    Publication date: February 3, 2005
    Inventors: Tzu-Jin Yeh, Hsien-Chang Wu, Ming-Ta Yang, Yu-Tai Chia
  • Patent number: 6819542
    Abstract: A capacitor has at least two layers of substantially parallel interdigitated strips. The strips of each layer are alternately connected to a first and a second bus. The first and second buses of each layer are interconnected to first and second buses of an adjacent layer. The strips of each layer are approximately perpendicular to strips of an adjacent layer. The capacitor further includes dielectric material between strips of the same and different layers. A method of fabricating the capacitor includes forming at least two layers of substantially parallel interdigitated strips which are alternately connected to first and second buses of each layer. The buses of each layer are connected to the respective buses of an adjacent layer. The strips of one layer are approximately perpendicular to the strips of an adjacent layer. Dielectric material is formed between strips of the same and different layers.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: November 16, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tse-Lun Tsai, Yu-Tai Chia, JC Guo
  • Patent number: 6800496
    Abstract: A method of characterizing gate leakage current in the fabrication of integrated circuits is described. A MOSFET model is provided including a gate electrode deposed over a gate oxide layer on a substrate and source and drain regions associated with the gate electrode. Device current is measured at four terminals simultaneously wherein one of the terminals is a drain terminal. The other terminals are the source, gate, and substrate. The portion of the device current measured at the drain terminal that is contributed by gate current is evaluated. The evaluated gate current contribution is subtracted from the drain terminal current measurement to obtain pure drain current. Fitting procedures are performed to obtain curves for the device currents. The pure drain current is used to extract mobility model parameters.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: October 5, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chung-Shi Chiang, Ke-Wei Su, Chung-Kai Lin, Jaw-Kang Her, Yu-Tai Chia
  • Publication number: 20040174655
    Abstract: The present invention provides a capacitor structure for an integrated circuit comprising at least two layers of substantially parallel interdigitated strips wherein the strips of each layer are alternately connected to a first bus and a second bus. The first and the second bus of each layer are respectively interconnected to the first and second bus of an adjacent layer. The strips of each layer are oriented approximately perpendicular to the strips of an adjacent layer. The capacitor structure further comprises dielectric material between strips of the same and different layers.
    Type: Application
    Filed: March 4, 2003
    Publication date: September 9, 2004
    Inventors: Tse-Lun Tsai, Yu-Tai Chia, JC Guo
  • Publication number: 20040123257
    Abstract: Each of a method for determining a parasitic capacitance and an apparatus for determining the parasitic capacitance provides for an experimental correlation within a parasitic capacitance model of a series of conductor layer nominal dimensions and spacings with a process related deviation to provide a series of conductor layer actual dimensions and spacings. The method and the apparatus further provide for determining the parasitic capacitance while employing the conductor layer actual dimensions and spacings. The parasitic capacitance is thus determined with enhanced accuracy.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 24, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Victor C. Y. Chang, Chung-Shi Chiang, Chien-Wen Chen, Harry Chuang, Hsin-Yi Lee, Yu-Tai Chia