Patents by Inventor Yu-tsai Liu

Yu-tsai Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020119655
    Abstract: The present invention provides a process comprising the steps of:
    Type: Application
    Filed: March 19, 2001
    Publication date: August 29, 2002
    Inventor: Yu-Tsai Liu
  • Patent number: 6439207
    Abstract: An oxygen generator is designed to enrich a fuel supply or water supply and is provided in the hollow interior thereof with a positive magnetic body, a negative magnetic body, a number of far infrared granules and pebbles. The granules and the pebbles are caused by a magnetic force to collide with one another, thereby resulting in liberation of the oxygen molecules contained in the granules and the pebbles. The oxygen molecules so released are mixed with the fuel supply or water supply.
    Type: Grant
    Filed: November 28, 2001
    Date of Patent: August 27, 2002
    Inventor: Yu-Tsai Liu
  • Patent number: 6405739
    Abstract: A spin chuck using at least three clamping rollers for clamping a substrate during the rotation of the substrate. The clamping rollers are driven by a planetary gear transmission mechanism that is on a rotatable body. The final rotation speed of the substrate is determined by the cooperation of the rotation speeds of the clamping rollers and the body. The spin chuck is capable of providing simultaneous dual-sided processing, and the angular velocity and angular acceleration of the spin chuck have a wide range of adjustment.
    Type: Grant
    Filed: April 27, 2000
    Date of Patent: June 18, 2002
    Inventor: Yu-tsai Liu
  • Patent number: 6315832
    Abstract: A single chamber processing apparatus employing a plurality of kinds of processing material to process a spinning substrate in a chamber and selectively recycle the remaining processing material. The processing apparatus comprises a grouping recovery device for selectively recycling the remaining processing material. Thus, a single chamber processing apparatus having multi-chamber functions is provided.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: November 13, 2001
    Inventor: Yu-tsai Liu
  • Patent number: 6273344
    Abstract: A dispensing nozzle device for dispensing processing materials to an output region, includes a body and a plurality of first conduits. The body is formed with a first chamber, a second chamber, a plurality of through holes in communication with the first chamber and the second chamber, and a dispensing nozzle conduit for communicating the second chamber with the output region. The plurality of first conduits are respectively in communication with the plurality of through holes and have a plurality of openings received within the second chamber. A gap is formed between each of the first conduits and corresponding one of the plurality of through holes.
    Type: Grant
    Filed: April 27, 2000
    Date of Patent: August 14, 2001
    Inventor: Yu-Tsai Liu
  • Patent number: 6221204
    Abstract: A stackable processing chamber apparatus includes a processing chamber unit and a driving device for driving said transmitting shaft to rotate. The processing chamber unit includes a body defining a chamber. The processing chamber unit is provided with an evacuating pipeline passing through the processing chamber unit and communicating with the chamber, a draining pipeline passing through the processing chamber unit and communicating with the chamber, a chuck rotatably mounted within the processing chamber unit, a transmitting mechanism for driving the chuck to rotate, and a transmitting shaft passing through the body and driving the transmitting mechanism.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: April 24, 2001
    Inventor: Yu-tsai Liu
  • Patent number: 5883001
    Abstract: A method for forming a UV transmission passivation coating on an integrated circuit, such as EPROM, after completion of the active device and metal routing circuitry comprises depositing a first barrier dielectric layer over the integrated circuit; smoothing out underlying features by applying a layer of flowable dielectric over the first dielectric layer; and depositing a second dielectric layer over the flowable dielectric. Next a photoresist pattern is made over the second dielectric coating, having an opening layer over the at least one conductive pad. A wet etch process is used to remove portions of the second dielectric layer exposed by the opening. A dry etch process is used to remove portions of the remaining layers exposed through the opening, including the remaining portions of the second dielectric layer, the flowable dielectric layer and the first dielectric layer, down to the conductive pad. Finally, the photoresist is removed.
    Type: Grant
    Filed: July 13, 1995
    Date of Patent: March 16, 1999
    Assignee: Macronix International Co., Ltd.
    Inventors: Been Yih Jin, Daniel L. W. Yen, Wen Yen Hwang, Ming Hong Wang, Sheng Hsien Wong, Gino Hwang, Po Shen Chang, Yu Tsai Liu, Chung Chi Chang, Ta Hung Yang