Patents by Inventor Yu Wang Bibby

Yu Wang Bibby has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7117198
    Abstract: A method (100) of researching and analyzing information contained in documents that belong to a first database (200) and are organized according to a first set of fields (210) for an electronic search and retrieval by a computer (850). The method includes the steps of: a) conducting an electronic search (202) of the first database to retrieve at least one document; b) developing user-defined fields (300); c) reading (310) the at least one document to retrieve information pertaining to the user-defined fields; d) entering into a second database (510) the at least one document, values of the first set of fields for the at least one document, the user-defined fields and the retrieved information pertaining to the user-defined fields; and e) analyzing (506) the information contained in the second database.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: October 3, 2006
    Assignee: ip Capital Group, Inc.
    Inventors: John Edward Cronin, Yu Wang Bibby
  • Patent number: 6753498
    Abstract: A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152′) that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: June 22, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Murray D. Sirkis, Eric Strang, Yu Wang Bibby, John E. Cronin
  • Publication number: 20030127433
    Abstract: A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152′) that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
    Type: Application
    Filed: January 17, 2003
    Publication date: July 10, 2003
    Inventors: Murray D. Sirkis, Eric Strang, Yu Wang Bibby, John E. Cronin