Patents by Inventor Yu-Wei Hou

Yu-Wei Hou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240071939
    Abstract: A semiconductor structure includes a composite redistribution structure, a first interconnect device and an integrated circuit (IC) package component. The composite redistribution structure includes a first redistribution structure, a second redistribution structure and a third redistribution structure. The second redistribution structure is located between the first redistribution structure and the third redistribution structure. The first interconnect device is embedded in the second redistribution structure. The first interconnect device includes a plurality of metal connectors leveled with a surface of the second redistribution structure and electrically connected to the third redistribution structure. The IC package component is disposed over the third redistribution structure and electrically connected to the first interconnect device via the third redistribution structure.
    Type: Application
    Filed: August 28, 2022
    Publication date: February 29, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jung-Wei Cheng, Tsung-Ding Wang, Yu-Min Liang, Hao-Cheng Hou
  • Publication number: 20220037052
    Abstract: A transparent conductive film is disclosed. The transparent conductive film includes a substrate and a first silver nanowire layer. The transparent conductive film has a first absorption peak at 340 nm to 400 nm and a second absorption peak at 500 nm-650 nm, and a ratio of a maximum peak intensity of the first absorption peak to a maximum peak intensity of the second absorption peak is in a range of 2 to 5.5.
    Type: Application
    Filed: January 25, 2021
    Publication date: February 3, 2022
    Inventors: Yung-Cheng Chang, Min-Yu Chen, Yu-Wei Hou, Chung-Chin Hsiao
  • Patent number: 11227703
    Abstract: A transparent conductive film is disclosed. The transparent conductive film includes a substrate and a first silver nanowire layer. The transparent conductive film has a first absorption peak at 340 nm to 400 nm and a second absorption peak at 500 nm-650 nm, and a ratio of a maximum peak intensity of the first absorption peak to a maximum peak intensity of the second absorption peak is in a range of 2 to 5.5.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: January 18, 2022
    Assignee: Cambrios Film Solutions Corporation
    Inventors: Yung-Cheng Chang, Min-Yu Chen, Yu-Wei Hou, Chung-Chin Hsiao
  • Patent number: 10902974
    Abstract: A transparent conductive film is disclosed. The transparent conductive film includes a substrate and a first silver nanowire layer. The transparent conductive film has a first absorption peak at 340 nm to 400 nm and a second absorption peak at 500 nm-650 nm, and a ratio of a maximum peak intensity of the first absorption peak to a maximum peak intensity of the second absorption peak is in a range of 2 to 5.5.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: January 26, 2021
    Assignee: Cambrios Film Solutions Corporation
    Inventors: Yung-Cheng Chang, Min-Yu Chen, Yu-Wei Hou, Chung-Chin Hsiao
  • Patent number: 9000098
    Abstract: Polymer spheres are fabricated. Dispersing polymerization and a two-stage swelling procedure are processed. The polymer spheres fabricated have uniform granular sizes and are highly cross-linking. Thus, the polymer spheres are heat-resistant and solvent-resistant.
    Type: Grant
    Filed: May 14, 2012
    Date of Patent: April 7, 2015
    Assignee: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
    Inventors: Ming-Hsiung Wei, Yu-Wei Hou, Hui Chen, Chun-Lan Tseng
  • Publication number: 20130303703
    Abstract: Polymer spheres are fabricated. Dispersing polymerization and a two-stage swelling procedure are processed. The polymer spheres fabricated have uniform granular sizes and are highly cross-linking. Thus, the polymer spheres are heat-resistant and solvent-resistant.
    Type: Application
    Filed: May 14, 2012
    Publication date: November 14, 2013
    Applicant: Chung-Shan Institute of Science and Technology, Armaments,Bureau, Ministry of National Defense
    Inventors: Ming-Hsiung Wei, Yu-Wei Hou, Hui Chen, Chun-Lan Tseng