Patents by Inventor YU-WEI YEN

YU-WEI YEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11984323
    Abstract: A chemical mechanical planarization (CMP) system including a capacitive deionization module (CDM) for removing ions from a solution and a method for using the same are disclosed. In an embodiment, an apparatus includes a planarization unit for planarizing a wafer; a cleaning unit for cleaning the wafer; a wafer transportation unit for transporting the wafer between the planarization unit and the cleaning unit; and a capacitive deionization module for removing ions from a solution used in at least one of the planarization unit or the cleaning unit.
    Type: Grant
    Filed: July 12, 2021
    Date of Patent: May 14, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Te-Chien Hou, Yu-Ting Yen, Cheng-Yu Kuo, Chih Hung Chen, William Weilun Hong, Kei-Wei Chen
  • Patent number: 11978712
    Abstract: Methods and apparatus for forming a semiconductor device package with a transmission line using a micro-bump layer are disclosed. The micro-bump layer may comprise micro-bumps and micro-bump lines, formed between a top device and a bottom device. A signal transmission line may be formed using a micro-bump line above a bottom device. A ground plane may be formed using a redistribution layer (RDL) within the bottom device, or using additional micro-bump lines. The RDL formed ground plane may comprise open slots. There may be RDLs at the bottom device and the top device above and below the micro-bump lines to form parts of the ground planes.
    Type: Grant
    Filed: November 16, 2020
    Date of Patent: May 7, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chin-Wei Kuo, Hsiao-Tsung Yen, Min-Chie Jeng, Yu-Ling Lin
  • Publication number: 20190117574
    Abstract: A surface-modified microsphere composition comprises poly(lactic-co-glycolic acid) (PLGA), chitosan, hydrophobic drug, and hydrophilic drug. The PLGA forms a microsphere. The chitosan is formed on a surface of the microsphere. The hydrophobic drug is encapsulated by the microsphere. The hydrophilic drug is adsorbed on the surface of the microsphere. The surface-modified microsphere composition is for treating arthritis. A method of preparing a surface-modified microsphere composition involves producing by an oil-in-water emulsion method microspheres formed from PLGA, covered with chitosan, and adapted to encapsulate hydrophobic drug, and having hydrophilic drug adsorbed on their surfaces. The surface-modified microsphere composition enables drug to be released to achieve efficacy both instantly and persistently.
    Type: Application
    Filed: October 20, 2017
    Publication date: April 25, 2019
    Inventors: YU-WEI YEN, TSAI-YUEH LUO, CHENG-LIANG PENG, PING-FANG CHIANG