Patents by Inventor Yu-Wen Chen

Yu-Wen Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12293940
    Abstract: Double patterning techniques described herein may reduce corner rounding, etch loading, and/or other defects that might otherwise arise during formation of a deep trench isolation (DTI) structure in a pixel array. The double patterning techniques include forming a first set of trenches in a first direction and forming a second set of trenches in a second direction in a plurality of patterning operations such that minimal to no etch loading and/or corner rounding is present at and/or near the intersections of the first set of trenches and the second set of trenches.
    Type: Grant
    Filed: August 10, 2023
    Date of Patent: May 6, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chao Chiu, Yu-Wen Chen, Yong-Jin Liou, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu
  • Patent number: 12209202
    Abstract: A resin composition and a filter element are provided. The resin composition includes a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), and a photoinitiator (E). The black coloring agent (A) includes a titanium black (A-1) and a carbon black (A-2). Based on a total usage amount of 100 parts by weight of the titanium black (A-1) and the carbon black (A-2), a usage amount of the titanium black (A-1) is 50 parts by weight to 75 parts by weight.
    Type: Grant
    Filed: April 16, 2024
    Date of Patent: January 28, 2025
    Assignee: Advanced Echem Materials Company Limited
    Inventors: Yu-Wen Chen, Yi-Lun Chiu, Chia-Hao Lou, Chen-Wen Chiu
  • Publication number: 20240423891
    Abstract: Provided herein are cosmetic compositions for increasing the integrity of the skin or hair a subject or for reducing irritation of the skin of a subject and methods of using the cosmetic compositions. The cosmetic compositions contain a combination of a occlusive compound and an osmolyte compound. The occlusives of the combinations are squalane, hemisqualane, isosqualane, squalene, or isosqualene. The preferred osmolyte is ectoine. The cosmetics or pharmaceuticals may be used to increase the barrier of the skin or hair, increase the integrity of skin or hair, reduce inflammation of the skin, or prevent aging of the skin of a subject.
    Type: Application
    Filed: June 16, 2023
    Publication date: December 26, 2024
    Inventors: Debora MILLARD, Daniel Thorn LEESON, Yu Wen CHEN, Kevin Lee DIETZEL, Morgan TARDY, Jessica KIZOVSKI, Carol Lin TRAN
  • Publication number: 20240411429
    Abstract: The present disclosure provides a method and electronic apparatus for modifying pages of an electronic document. The method is performed by the electronic apparatus and includes: displaying a plurality of first pages of a first electronic document on a first preview region and determining a first page change position located in the plurality of first pages according to a first operation event; displaying a plurality of second pages of a second electronic document on a second page preview region and determining at least one second page of the plurality of second pages according to a second operation event; and adding the at least one second page to the first page change position according to a third operation event.
    Type: Application
    Filed: August 20, 2024
    Publication date: December 12, 2024
    Inventors: YU-WEN CHEN, KAI-LIN SHIH
  • Publication number: 20240379357
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Application
    Filed: July 25, 2024
    Publication date: November 14, 2024
    Inventors: Wei-Chao CHIU, Yong-Jin LIOU, Yu-Wen CHEN, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU
  • Patent number: 12128082
    Abstract: A method for extracting flavone aglycones in Chrysanthemum morifolium is provided. The method includes: (a) immersing a Chrysanthemum morifolium raw material in water or an aqueous solution to perform an immersion procedure for 3.5 hours or more to obtain an immersion sample; and (b) adding an extraction solvent to the immersion sample to perform an extraction procedure 5-60 minutes to obtain an extract. The Chrysanthemum morifolium raw material includes at least one of the following parts of Chrysanthemum morifolium: whole plant, roots, stems, leaves and flowers.
    Type: Grant
    Filed: December 23, 2021
    Date of Patent: October 29, 2024
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsin Jan Yao, Yu-Wen Chen, Chu-Hsun Lu, I-Hong Pan, Wen-Yin Chen, Tsung-Lin Yang, Angela Goh
  • Patent number: 12100592
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Grant
    Filed: May 12, 2023
    Date of Patent: September 24, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chao Chiu, Yong-Jin Liou, Yu-Wen Chen, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu
  • Patent number: 12093510
    Abstract: The present disclosure provides a method and electronic apparatus for modifying pages of an electronic document, and the method is performed by the electronic apparatus and comprises the following steps: opening a first user operation interface; detecting whether a first input region is selected; when it is detected that the first input region is selected, displaying a plurality of first pages of a first electronic document on a page preview region and determining a first page change position located in the plurality of first pages according to a first operation event; detecting whether a second input region is selected; when it is detected that the second input region is selected, displaying a plurality of second pages of a second electronic document on the page preview region and determining at least one second page of the plurality of second pages according to a second operation event; and adding the at least one second page to the first page change position according to a third operation event.
    Type: Grant
    Filed: June 27, 2023
    Date of Patent: September 17, 2024
    Assignee: KDAN MOBILE SOFTWARE LTD.
    Inventors: Yu-Wen Chen, Kai-Lin Shih
  • Publication number: 20240263015
    Abstract: A resin composition and a filter element are provided. The resin composition includes a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), and a photoinitiator (E). The black coloring agent (A) includes a titanium black (A-1) and a carbon black (A-2). Based on a total usage amount of 100 parts by weight of the titanium black (A-1) and the carbon black (A-2), a usage amount of the titanium black (A-1) is 50 parts by weight to 75 parts by weight.
    Type: Application
    Filed: April 16, 2024
    Publication date: August 8, 2024
    Applicant: Advanced Echem Materials Company Limited
    Inventors: Yu-Wen Chen, Yi-Lun Chiu, Chia-Hao Lou, Chen-Wen Chiu
  • Patent number: 11999868
    Abstract: A resin composition and a filter element are provided. The resin composition includes a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), and a photoinitiator (E). The black coloring agent (A) includes a titanium black (A-1) and a carbon black (A-2). Based on a total usage amount of 100 parts by weight of the titanium black (A-1) and the carbon black (A-2), a usage amount of the titanium black (A-1) is 50 parts by weight to 75 parts by weight.
    Type: Grant
    Filed: January 7, 2021
    Date of Patent: June 4, 2024
    Assignee: eChem Solutions Corp.
    Inventors: Yu-Wen Chen, Yi-Lun Chiu, Chia-Hao Lou, Chen-Wen Chiu
  • Publication number: 20240175854
    Abstract: An air pollution forecast management system including an air quality management device and an Internet of Things (IOT) cloud platform is disclosed. The air quality management device includes a dust particle sensing module being configured to sense gas exhausted from a smoke exhaust flue. The IoT cloud platform is configured to compute, at a second time after a first time, an exhaust gas set of the gas drifting from the first time to the second time by using current-observed meteorological data at the second time, receive a plurality of air-pollution sets at a plurality of geographic locations at the second time, compute a plurality of influencing results of the plurality of air-pollution sets respectively associated with the exhaust gas set, and generate a feedback instruction according to at least one of the plurality of influencing results to control gas emission of the smoke exhaust flue.
    Type: Application
    Filed: February 10, 2023
    Publication date: May 30, 2024
    Inventors: Chao-Kai CHENG, Szu-Wei HUANG, Yu-Wen CHEN, Chung-Hsiang MU
  • Patent number: 11993025
    Abstract: A fixing assembly for mounting UV lamps includes a base, a first gear and a plurality of mounting modules. The first gear is arranged on one side of the base; the mounting modules are arranged around the first gear. The mounting module includes a first driving assembly, a second driving assembly and a support frame. The first driving assembly is used to drive the second driving assembly and the support frame to move circumferentially around the first gear in a considerably horizontal plane, and the second driving component is used to drive the support to move back in a considerably vertical direction. The support frame is used for mounting UV lamp. The flexibility of the fixing assembly is improved. The UV lamp may comprehensively irradiate and cure the photosensitive adhesive.
    Type: Grant
    Filed: June 28, 2022
    Date of Patent: May 28, 2024
    Assignee: TRIPLE WIN TECHNOLOGY(SHENZHEN) CO.LTD.
    Inventors: Yen-Sheng Lin, Yu-Wen Chen
  • Publication number: 20240061917
    Abstract: A driving record authentication method is provided. The method includes acquiring historical driving records of a driver and associated records of the driver. Once a non-fungible token image of the driver is minted based on the historical driving records and the associated records, the non-fungible token image is transmitted to a user terminal in response to a query request associated with the driver that sent the user terminal.
    Type: Application
    Filed: October 25, 2022
    Publication date: February 22, 2024
    Inventors: SHIH CHUN WANG, YU-WEN CHEN, SHIH-YIN TSENG, TING-YU DU
  • Publication number: 20240004526
    Abstract: The present disclosure provides a method and electronic apparatus for modifying pages of an electronic document, and the method is performed by the electronic apparatus and comprises the following steps: opening a first user operation interface; detecting whether a first input region is selected; when it is detected that the first input region is selected, displaying a plurality of first pages of a first electronic document on a page preview region and determining a first page change position located in the plurality of first pages according to a first operation event; detecting whether a second input region is selected; when it is detected that the second input region is selected, displaying a plurality of second pages of a second electronic document on the page preview region and determining at least one second page of the plurality of second pages according to a second operation event; and adding the at least one second page to the first page change position according to a third operation event.
    Type: Application
    Filed: June 27, 2023
    Publication date: January 4, 2024
    Inventors: YU-WEN CHEN, KAI-LIN SHIH
  • Publication number: 20240005103
    Abstract: This disclosure provides a method and a user apparatus for generating and applying a translation marker, and the method is performed by the user apparatus and comprises: opening an electronic document on a user operation interface; selecting at least one text string in the electronic document according to a first triggering event; and when a translation option is detected to be selected, performing the following steps: generating a code corresponding to the selected text string by using an operation function; and displaying a first translated text string of the first translation record on the user operation interface and generating a first translation marker associated with the first translated text string on the electronic document when it is determined that a first translation record associated with the code exists in the user apparatus.
    Type: Application
    Filed: June 28, 2023
    Publication date: January 4, 2024
    Inventors: YU-WEN CHEN, CHIA-TING LEE, WEN-WEI LIN, KAI-LIN SHIH, CHING-YI CHIANG
  • Publication number: 20230402315
    Abstract: Double patterning techniques described herein may reduce corner rounding, etch loading, and/or other defects that might otherwise arise during formation of a deep trench isolation (DTI) structure in a pixel array. The double patterning techniques include forming a first set of trenches in a first direction and forming a second set of trenches in a second direction in a plurality of patterning operations such that minimal to no etch loading and/or corner rounding is present at and/or near the intersections of the first set of trenches and the second set of trenches.
    Type: Application
    Filed: August 10, 2023
    Publication date: December 14, 2023
    Inventors: Wei-Chao CHIU, Yu-Wen CHEN, Yong-Jin LIOU, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU
  • Publication number: 20230290637
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Application
    Filed: May 12, 2023
    Publication date: September 14, 2023
    Inventors: Wei-Chao CHIU, Yong-Jin LIOU, Yu-Wen CHEN, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU
  • Publication number: 20230201291
    Abstract: A method for extracting flavone aglycones in Chrysanthemum morifolium is provided. The method includes: (a) immersing a Chrysanthemum morifolium raw material in water or an aqueous solution to perform an immersion procedure for 3.5 hours or more to obtain an immersion sample; and (b) adding an extraction solvent to the immersion sample to perform an extraction procedure 5-60 minutes to obtain an extract. The Chrysanthemum morifolium raw material includes at least one of the following parts of Chrysanthemum morifolium: whole plant, roots, stems, leaves and flowers.
    Type: Application
    Filed: December 23, 2021
    Publication date: June 29, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsin Jan YAO, Yu-Wen CHEN, Chu-Hsun LU, I-Hong PAN, Wen-Yin CHEN, Tsung-Lin YANG, Angela GOH
  • Patent number: 11658031
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Grant
    Filed: June 1, 2021
    Date of Patent: May 23, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chao Chiu, Yong-Jin Liou, Yu-Wen Chen, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu
  • Patent number: 11603458
    Abstract: A black resin composition, a cured film, and a black filter are provided. The black resin composition includes: a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), a photoinitiator (E), a UV absorber (F), and a surfactant (G). The resin (D) includes a first resin having a weight-average molecular weight of 2,000 to 20,000. The first resin includes a structural unit having a fluorene ring and two or more ethylenically-polymerizable groups. The UV absorber (F) includes a benzylidene-based derivative.
    Type: Grant
    Filed: August 26, 2021
    Date of Patent: March 14, 2023
    Assignee: eChem Solutions Corp.
    Inventors: Chin-Chen Huang, Yu-Wen Chen, Yu-Lun Li, Chen-Wen Chiu