Patents by Inventor YU-WEN KAO

YU-WEN KAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10844174
    Abstract: A low dielectric polyimide composition comprises an aliphatic anhydride, a long chain diamine, and an ester diamine. A polyimide made of such low dielectric polyimide composition has low polarizability group, thus the dielectric constant of the polyimide is lower. A polyimide made of the low dielectric polyimide composition, a polyimide film using the polyimide, and a copper clad laminate using the polyimide film are also provided.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: November 24, 2020
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Nan-Kun Huang, Shou-Jui Hsiang, Yu-Wen Kao, Szu-Hsiang Su
  • Patent number: 10822522
    Abstract: A resin composition comprises a modified polyimide compound, an epoxy resin, and a solvent. The modified polyimide compound has a chemical structural formula of the Ar? represents a group selected from a group consisting of phenyl having a chemical structural formula of diphenyl ether having a chemical structural formula of biphenyl having a chemical structural formula of hexafluoro-2,2-diphenylpropane having a chemical structural formula of benzophenone having a chemical structural formula of and diphenyl sulfone having a chemical structural formula of and any combination thereof, the modified polyimide compound has a degree of polymerization n of about 1 to about 50, the epoxy resin and the modified polyimide compound are in a molar ratio of about 0.1:1 to about 1:1. A modified polyimide compound and a polyimide film are also provided.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: November 3, 2020
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Ming-Jaan Ho, Mao-Feng Hsu, Shou-Jui Hsiang, Nan-Kun Huang, Yu-Wen Kao, Chia-Yin Teng, Ching-Hsuan Lin
  • Publication number: 20190359852
    Abstract: A resin composition comprises a modified polyimide compound, an epoxy resin, and a solvent. The modified polyimide compound has a chemical structural formula of the Ar? represents a group selected from a group consisting of phenyl having a chemical structural formula of diphenyl ether having a chemical structural formula of biphenyl having a chemical structural formula of hexafluoro-2,2-diphenylpropane having a chemical structural formula of benzophenone having a chemical structural formula of and diphenyl sulfone having a chemical structural formula of and any combination thereof, the modified polyimide compound has a degree of polymerization n of about 1 to about 50, the epoxy resin and the modified polyimide compound are in a molar ratio of about 0.1:1 to about 1:1. A modified polyimide compound and a polyimide film are also provided.
    Type: Application
    Filed: August 7, 2019
    Publication date: November 28, 2019
    Inventors: MING-JAAN HO, MAO-FENG HSU, SHOU-JUI HSIANG, NAN-KUN HUANG, YU-WEN KAO, CHIA-YIN TENG, CHING-HSUAN LIN
  • Patent number: 10428238
    Abstract: A resin composition comprises a modified polyimide compound, an epoxy resin, and a solvent. The modified polyimide compound has a chemical structural formula of the Ar? represents a group selected from a group consisting of phenyl having a chemical structural formula of diphenyl ether having a chemical structural formula of biphenyl having a chemical structural formula hexafluoro-2,2-diphenylpropane having a chemical structural formula of benzophenone having a chemical structural formula of and diphenyl sulfone having a chemical structural formula of and any combination thereof, the epoxy resin and the modified polyimide compound are in a molar ratio of about 0.1:1 to about 1:1. A polyimide film and a method for manufacturing the polyimide film using the resin composition are also provided.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: October 1, 2019
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Ming-Jaan Ho, Mao-Feng Hsu, Shou-Jui Hsiang, Nan-Kun Huang, Yu-Wen Kao, Chia-Yin Teng, Ching-Hsuan Lin
  • Publication number: 20190085131
    Abstract: A low dielectric polyimide composition comprises an aliphatic anhydride, a long chain diamine, and an ester diamine. A polyimide made of such low dielectric polyimide composition has low polarizability group, thus the dielectric constant of the polyimide is lower. A polyimide made of the low dielectric polyimide composition, a polyimide film using the polyimide, and a copper clad laminate using the polyimide film are also provided.
    Type: Application
    Filed: October 30, 2017
    Publication date: March 21, 2019
    Inventors: NAN-KUN HUANG, SHOU-JUI HSIANG, YU-WEN KAO, SZU-HSIANG SU
  • Publication number: 20180223048
    Abstract: A resin composition having lower dielectric constant Dk, lower dielectric loss Df, lower water absorption, higher surface impedance, and higher glass transition temperature includes resins. The resins have a chemical structure selected from a group consisting of or any combination thereof.
    Type: Application
    Filed: August 25, 2017
    Publication date: August 9, 2018
    Inventors: MAO-FENG HSU, SHOU-JUI HSIANG, SZU-HSIANG SU, YU-WEN KAO, CHIA-YIN TENG, MING-JAAN HO, YAO-YI CHENG, HSIN-MIN HSIAO
  • Publication number: 20180201805
    Abstract: A resin composition comprises a modified polyimide compound, an epoxy resin, and a solvent. The modified polyimide compound has a chemical structural formula of the Ar? represents a group selected from a group consisting of phenyl having a chemical structural formula of diphenyl ether having a chemical structural formula of biphenyl having a chemical structural formula hexafluoro-2,2-diphenylpropane having a chemical structural formula of benzophenone having a chemical structural formula of and diphenyl sulfone having a chemical structural formula of and any combination thereof, the epoxy resin and the modified polyimide compound are in a molar ratio of about 0.1:1 to about 1:1. A polyimide film and a method for manufacturing the polyimide film using the resin composition are also provided.
    Type: Application
    Filed: August 29, 2017
    Publication date: July 19, 2018
    Inventors: MING-JAAN HO, MAO-FENG HSU, SHOU-JUI HSIANG, NAN-KUN HUANG, YU-WEN KAO, CHIA-YIN TENG, CHING-HSUAN LIN
  • Publication number: 20170369653
    Abstract: A polyamic acid as a polymer of a dianhydride monomer and a diamine monomer is disclosed. The dianhydride monomer is an aromatic tetrabasic carboxylic acid dianhydride monomer. The diamine monomer comprises a diamine monomer containing pyrimidinyl and an aromatic diamine monomer. A polyimide, a polyimide film and a copper clad laminate using the polyamic acid are also provided.
    Type: Application
    Filed: April 26, 2017
    Publication date: December 28, 2017
    Inventors: YU-WEN KAO, MAO-FENG HSU, SHOU-JUI HSIANG, SZU-HSIANG SU, CHIA-YIN TENG