Abstract: A keyboard apparatus, which can provide a keyboard apparatus that a size in depth direction is miniaturized, including a frame, a first member, a key, one or more hammer assemblies configured to rotate in accordance with movement of the key. The one or more hammer assemblies including a rotation member rotatably connected to the frame with respect to a rotation axis as a center of rotation and a weight member attached to the rotation member and having a first portion and a second portion. The second portion faces the first member in a first direction extending along the rotation axis, a thickness of the second portion is smaller than a thickness of the first portion in the first direction, and a length of the second portion is larger than a length of the first portion in a rotation direction of the weight member.

Abstract: A keyboard device includes: key units each including a coupler and white or block keys coupled to the coupler at their rear ends; and a key frame assembled to the key frame and supporting the couplers stacked on each other. The coupler of one of the key units is provided with a hook having an engaging portion. The coupler of each of at least one other key unit has a through hole at a position corresponding to the hook. The key frame has a through hole at a position corresponding to the hook. The couplers of the key units are secured on the key frame using the engaging portion in a state in which the hook extends through the through hole of the coupler of each of the at least one other key unit and the through hole of the key frame.

Abstract: A keyboard device includes key units each including keys arranged in a right and left direction, hinges, a common mounting portion which are molded in one piece. The common mounting portion is elongated in the right and left direction. Bach hinge is provided between the common mounting portion and the key. The key units include a particular key unit having an uppermost one of the common mounting portions. At least one of the hinges of the particular key unit includes a hinge thick portion connected to a rear surface of the key; and a hinge thin portion connected to a rear surface of the hinge thick portion and connected to a front surface of the uppermost common mounting portion. A protrusion protruding outward is provided on at least one of opposite outer ends of the hinge thick portion in the right and left direction.

Abstract: A keyboard device includes key units each including keys arranged in a right and left direction, hinges, a common mounting portion which are molded in one piece. The common mounting portion is elongated in the right and left direction. Each hinge is provided between the common mounting portion and the key. The key units include a particular key unit having an uppermost one of the common mounting portions. At least one of the hinges of the particular key unit includes a hinge thick portion connected to a rear surface of the key; and a hinge thin portion connected to a rear surface of the hinge thick portion and connected to a front surface of the uppermost common mounting portion. A protrusion protruding outward is provided on at least one of opposite outer ends of the hinge thick portion in the right and left direction.

Abstract: A keyboard device includes: key units each including a coupler and white or block keys coupled to the coupler at their rear ends; and a key frame assembled to the key frame and supporting the couplers stacked on each other. The coupler of one of the key units is provided with a hook having an engaging portion. The coupler of each of at least one other key unit has a through hole at a position corresponding to the hook. The key frame has a through hole at a position corresponding to the hook. The couplers of the key units are secured on the key frame using the engaging portion in a state in which the hook extends through the through hole of the coupler of each of the at least one other key unit and the through hole of the key frame.

Abstract: A plasma processing apparatus includes: a reaction chamber; two electrodes provided inside the reaction chamber for generating a plasma therebetween, wherein at least one of the electrodes has at least one gas inlet pore through which a gas is introduced into the reaction chamber; and a gas inlet pipe coupled to the gas inlet pore for introducing the gas into the reaction chamber. The gas inlet pipe is grounded and insulated from the gas inlet pore, wherein an insulation member is placed inside the gas inlet pipe and the gas inlet pore.

Abstract: A plasma processing apparatus includes: a reaction chamber; two electrodes provided inside the reaction chamber for generating a plasma therebetween, wherein at least one of the electrodes has at least one gas inlet pore through which a gas is introduced into the reaction chamber; and a gas inlet pipe coupled to the gas inlet pore for introducing the gas into the reaction chamber. The gas inlet pipe is grounded and insulated from the gas inlet pore, wherein an insulation member is placed inside the gas inlet pipe and the gas inlet pore.

Abstract: A thin film is formed on a substrate in a film-forming apparatus which has upper and lower electrodes between which radio-frequency power is applied in a processing chamber, and a heater is used to heat the lower electrode on which the substrate is loaded. In one lot, at least one substrate is processed. The electrode is heated at the end of a stand-by period between lots and before starting the film-forming process.