Abstract: A method of wireless signal transmission management includes transmitting a plurality of data packets to tethering equipment from user equipment to tethering equipment, determining a size of each of the plurality of data packets by the tethering equipment, designating data packets of the plurality of data packets having a specific range of sizes as control signal packets by the tethering equipment, and prioritizing in transmitting the control signal packets to a cellular network by the tethering equipment.

Abstract: A particle removal method includes loading a particle attracting member with a coating layer into a processing chamber of a processing apparatus. The processing chamber is configured to perform a lithography exposure process on a semiconductor wafer. The method also includes fixing the particle attracting member on a reticle holder in the processing chamber in a cleaning cycle, attracting particles in the processing chamber by the coating layer of the particle attracting member due to a potential difference between the particles and the coating layer, and loading the particle attracting member with the coating layer and the attracted particles out of the processing chamber, after the cleaning cycle. The method also includes loading the semiconductor wafer into the processing chamber, and performing the lithography exposure process on the semiconductor wafer in the processing chamber using a reticle fixed on the reticle holder after the cleaning cycle.

Abstract: A driving and resistance control system for a permanent-magnet synchronous motor is disclosed. A control device includes a processing unit, a motor driving circuit, a resistance controller, and an interlock switch. In a first operation mode, the interlock switch makes the motor driving circuit and the permanent-magnet synchronous motor open-circuiting, and connecting stator windings of the permanent-magnet synchronous motor to the resistance controller, and under this condition, the external rotor of the permanent-magnet synchronous motor is rotated by spinning of a flywheel, so that the permanent-magnet synchronous motor is operating in a generator mode to generate a resisting force to the flywheel by mesas of a resistance generation device.

Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.

Abstract: A method includes forming a photoresist layer over a wafer. The photoresist layer is exposed to a pattern of radiation using a photomask. The photoresist layer is developed after the photoresist layer is exposed to the pattern of radiation. The photomask includes a substrate and at least one opaque main feature. The substrate has a recessed region recessed from a first surface of the substrate and has a first width. The at least one opaque main feature protrudes from the first surface of the substrate and has a second width greater than the first width of the recessed region of the substrate. A height of the at least one opaque main feature is greater than a depth of the recess region of the substrate.

Abstract: A light sensing method having a sensing order adjusting mechanism is provided. The method includes steps of: in a previous sensing cycle, sensing a first light signal that is emitted by both of an ambient light source and a light-emitting component and then is reflected by a tested object; in the previous sensing cycle, sensing a second light signal that is emitted by both of the ambient light source and the light-emitting component and then is reflected by the tested object; in the previous sensing cycle, sensing an ambient light signal emitted by only the ambient light source; and in a next sensing cycle, sensing the first light signal, the second light signal and the ambient light signal in an order different from that in the previous sensing cycle.

Abstract: In one example aspect, the present disclosure is directed to a method. The method includes receiving a workpiece having a conductive feature over a semiconductor substrate, forming a sacrificial material layer over the conductive feature, removing first portions of the sacrificial material layer to form line trenches and to expose a top surface of the conductive feature in one of the line trenches; forming line features in the line trenches, removing second portions of the sacrificial material layer to form gaps between the line features, and forming dielectric features in the gaps, the dielectric features enclosing an air gap.

Abstract: A photomask includes a substrate, an opaque filling formed embedded in the substrate, and an opaque main feature over the substrate. The opaque filling has a first width. The opaque main has a second width greater than the first width of the opaque filling. The opaque filling and the opaque main feature comprise same material.

Abstract: A semiconductor manufacturing system includes a semiconductor processing apparatus. The semiconductor processing apparatus includes a processing chamber configured to perform a semiconductor process on a semiconductor wafer, and a transferring module configured to transfer the semiconductor wafer into and out of the processing chamber. The semiconductor manufacturing system also includes a particle attracting member. The semiconductor manufacturing system also includes a monitoring device configured to control the transferring module to load the particle attracting member into the processing chamber in a cleaning cycle while the semiconductor wafer is not in the processing chamber, and control the transferring module to load the particle attracting member out of the processing chamber after the cleaning cycle.

Abstract: A method for forming a semiconductor device includes followings. A metal layer is formed to embedded in a first dielectric layer. An etch stop layer is formed over the metal layer and the first dielectric layer. A second dielectric layer is formed over the etch stop layer. A portion of the second dielectric layer is removed to expose a portion of the etch stop layer and to form a via by a dry etching process. The portion of the etch stop layer exposed by the second dielectric layer is removed to expose the metal layer and to form a damascene cavity by a wet etching process. A damascene structure is formed in the damascene cavity.

Abstract: In some embodiments, the present disclosure relates to a method that includes depositing multiple hard mask layers over an interconnect dielectric layer. A first patterning layer is deposited over the multiple hard mask layers, and a first masking structure is formed over the first masking structure. The first masking structure has openings formed by a first extreme ultraviolet (EUV) lithography process. Portions of the first patterning layer are removed according to the first masking structure. A second masking structure is formed within the patterned first patterning layer. A third masking structure is formed over a topmost one of the hard mask layers and has openings formed by a second EUV lithography process. Removal processes are performed to pattern the multiple hard mask layers to form openings in the interconnect dielectric layer, and interconnect wires having rounded corners are formed within the openings of the interconnect dielectric layer.

Abstract: A method includes patterning a mandrel layer over a target layer to form first mandrels and second mandrels, the first mandrels having a larger width than the second mandrels. A spacer layer is formed over the first mandrels and the second mandrels, and altered so that a thickness of the spacer layer over the first mandrels is greater than a thickness of the spacer layer over the second mandrels. Spacers are formed from the spacer layer which have a greater width adjacent the first mandrels than the spacers which are adjacent the second mandrels. The spacers are used to etch a target layer.

Abstract: A method includes patterning a mandrel layer over a target layer to form first mandrels and second mandrels, the first mandrels having a larger width than the second mandrels. A spacer layer is formed over the first mandrels and the second mandrels, and altered so that a thickness of the spacer layer over the first mandrels is greater than a thickness of the spacer layer over the second mandrels. Spacers are formed from the spacer layer which have a greater width adjacent the first mandrels than the spacers which are adjacent the second mandrels. The spacers are used to etch a target layer.

Abstract: In some embodiments, the present disclosure relates to a method that includes depositing multiple hard mask layers over an interconnect dielectric layer. A first patterning layer is deposited over the multiple hard mask layers, and a first masking structure is formed over the first masking structure. The first masking structure has openings formed by a first extreme ultraviolet (EUV) lithography process. Portions of the first patterning layer are removed according to the first masking structure. A second masking structure is formed within the patterned first patterning layer. A third masking structure is formed over a topmost one of the hard mask layers and has openings formed by a second EUV lithography process. Removal processes are performed to pattern the multiple hard mask layers to form openings in the interconnect dielectric layer, and interconnect wires having rounded corners are formed within the openings of the interconnect dielectric layer.

Abstract: A stationary exercise equipment resistance regulation device includes a stator holder, an axle, a circuit board, at least one magnetism detection element, a rotary knob, and at least one magnet. When the rotary knob is operated to rotate, a distance between a magnet and the magnetism detection element is changed so as to vary a magnetic force detected by the magnetism detection element to thereby change a magnitude of an induced voltage or generate a rotation turn signal. Based on the induced voltage or the rotation turn signal, a signal processing device identifies a resisting force level and calculates data of one of a resisting force magnitude and wattage that the resistance device applies to the stationary exercise equipment.

Abstract: A method includes patterning a mandrel layer over a target layer to form first mandrels and second mandrels, the first mandrels having a larger width than the second mandrels. A spacer layer is formed over the first mandrels and the second mandrels, and altered so that a thickness of the spacer layer over the first mandrels is greater than a thickness of the spacer layer over the second mandrels. Spacers are formed from the spacer layer which have a greater width adjacent the first mandrels than the spacers which are adjacent the second mandrels. The spacers are used to etch a target layer.

Abstract: An integrated flywheel control apparatus for applying resisting force or driving force to a flywheel includes a resistance applying device mounted to an outer frame of a stator holder frame and arranged in a receiving space of a flywheel. A power generation/drive device is positioned on an inner frame of the stator holder frame. When the flywheel is acted upon by an external force to rotate, the power generation/drive device is caused by the rotation of the flywheel to rotate and a plurality of power actuating windings of the power generation/drive device generate electrical energy. The electrical energy is supplied to resistance applying device to apply a resisting force to the flywheel. When the power actuating windings of the power generation/drive device is supplied with an external electrical power, the power actuating windings are electromagnetically coupled to a plurality of magnets circumferentially arranged on an axle portion of the wheel to drive the flywheel to rotate.

Abstract: A signal detection device includes a strain gauge disposed in a strain gauge disposition section defined on a rotation spindle; a control circuit board disposed in the strain gauge disposition section and electrically connected to the strain gauge; an electrical power supply unit received in a receiving space defined in a pedal body to supply electrical power; an electric brush device disposed in a brush disposition section defined on the rotation spindle and set between the pedal body and the rotation spindle. The electric brush device is electrically connected to the control circuit board to supply the electrical power to the control circuit board. The electric brush device keeps the electrical power supply unit in electrical connection with the control circuit board whether the pedal body is rotating relative to the rotation spindle or not.

Abstract: A non-interdependent displacement measuring device for converting a rotary motion to a linear motion is disclosed, which includes a driving unit, a detection unit, and a resistance device. The driving unit includes an adjustment section and a driving section. The detection unit is arranged in the adjustment section. The driving section is connected to the resistance device. The detection unit includes a sensing module and a transmission module, and the detection unit is arranged in the adjustment section, so that when the adjustment section rotates, the detection unit detects turns and an angle of rotation of the adjustment section to generate a detection signal, which, after being subjected to calculation, is transmitted through the transmission module to the electronic device to display the level of an resistance, so as to overcome the drawbacks of the prior art that accuracy is poor, calibration is difficult, and fabrication is difficult due to a magnet and a sensor being arranged as two separate parts.

Abstract: A pulley force detection device for a weight-training fitness equipment includes a measured element arranged on a stator portion of a pulley of the fitness equipment, and a detection module arranged on a rotor portion. The detection module includes at least one measuring element corresponding to the measured element to detect a motion stroke, a speed, and a power value during force application to a pulley body. Alternatively, the measured element is arrangeable on the rotor portion of the pulley, while the measuring element is arranged on the stator portion of the pulley. The pulley force detection device is further combinable with a weight measurement device for detecting a weight of the weight block.