Patents by Inventor Yu-Zen Hsieh

Yu-Zen Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SEMICONDUCTOR PACKAGES AND MANUFACTURING METHODS THEREOF
    Publication number: 20240128635
    Abstract: Sensor packages and manufacturing methods thereof are disclosed. One of the sensor packages includes a semiconductor chip and a redistribution layer structure. The semiconductor chip has a sensing surface. The redistribution layer structure is arranged to form an antenna transmitter structure aside the semiconductor chip and an antenna receiver structure over the sensing surface of the semiconductor chip.
    Type: Application
    Filed: December 24, 2023
    Publication date: April 18, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Ping Chiang, Chao-Wen Shih, Shou-Zen Chang, Albert Wan, Yu-Sheng Hsieh
  • Germs resisting and self cleaning infiltration thin film and manufacturing method thereof
    Patent number: 8415408
    Abstract: The invention provides a germs resisting and self-cleaning infiltration thin film and manufacturing method thereof. At first, a Polyethyleneimine (PEI) and a Polyvinyl Alcohol (PVA) are used to make a polymer thin film. Then, a germ resistant and an inorganic metal oxide are added into the polymer thin film to form the selective infiltration thin film capable of resisting germs and self-cleaning.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: April 9, 2013
    Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau of National Defense
    Inventors: Cheng-Chien Yang, Kuo-Hui Wu, Wang-Tsai Gu, Yu-Zen Hsieh, Mang-Zhi Wu
  • GERMS RESISTING AND SELF CLEANING INFILTRATION THIN FILM AND MANUFACTURING METHOD THEREOF
    Publication number: 20110237706
    Abstract: The invention provides a germs resisting and self-cleaning infiltration thin film and manufacturing method thereof. At first, a Polyethyleneimine (PEI) and a Polyvinyl Alcohol (PVA) are used to make a polymer thin film. Then, a germ resistant and an inorganic metal oxide are added into the polymer thin film to form the selective infiltration thin film capable of resisting germs and self-cleaning.
    Type: Application
    Filed: March 25, 2010
    Publication date: September 29, 2011
    Inventors: CHENG-CHIEN YANG, Kuo-Hui Wu, Wang-Tsai Gu, Yu-Zen Hsieh, Mang-Zhi Wu