Patents by Inventor Yuan-Chi HSIEH

Yuan-Chi HSIEH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11298798
    Abstract: A polishing delivery apparatus, configured to provide slurry and rinse agent to a polishing pad, includes a delivery arm, at least one first nozzle, and at least one second nozzle. The delivery arm is rotatably connected to the polishing pad and has an arc-shaped top surface facing away from the polishing pad, a bottom surface facing away from the arc-shaped top surface, and a recess indenting from the bottom surface. The first nozzle is mounted on the bottom surface of the delivery arm and has a first nozzle head facing toward the polishing pad. The second nozzle is mounted in the recess of the delivery arm and has three second nozzle heads, in which one of the three second nozzle heads faces toward the polishing pad, and the other two of the three second nozzle heads face toward sidewalls of the recess.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: April 12, 2022
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Jiun-Bo Wang, Chia-Hung Su, Yuan-Chi Hsieh, Chih-Yuan Chen, Ming-Fa Tsai, Chih-Wang Hsu
  • Publication number: 20210252669
    Abstract: A polishing delivery apparatus, configured to provide slurry and rinse agent to a polishing pad, includes a delivery arm, at least one first nozzle, and at least one second nozzle. The delivery arm is rotatably connected to the polishing pad and has an arc-shaped top surface facing away from the polishing pad, a bottom surface facing away from the arc-shaped top surface, and a recess indenting from the bottom surface. The first nozzle is mounted on the bottom surface of the delivery arm and has a first nozzle head facing toward the polishing pad. The second nozzle is mounted in the recess of the delivery arm and has three second nozzle heads, in which one of the three second nozzle heads faces toward the polishing pad, and the other two of the three second nozzle heads face toward sidewalls of the recess.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 19, 2021
    Inventors: Jiun-Bo WANG, Chia-Hung SU, Yuan-Chi HSIEH, Chih-Yuan CHEN, Ming-Fa TSAI, Chih-Wang HSU