Patents by Inventor Yuan-Chih Chiang
Yuan-Chih Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11664235Abstract: Among other things, one or more systems and techniques for removing a photoresist from a semiconductor wafer are provided. The photoresist is formed over the semiconductor wafer for patterning or material deposition. Once completed, the photoresist is removed in a manner that mitigates damage to the semiconductor wafer or structures formed thereon. In an embodiment, trioxygen liquid is supplied to the photoresist. The trioxygen liquid is activated using an activator, such as an ultraviolet activator or a hydrogen peroxide activator, to create activated trioxygen liquid used to remove the photoresist. In an embodiment, the activation of the trioxygen liquid results in free radicals that aid in removing the photoresist. In an embodiment, an initial photoresist strip, such as using a sulfuric acid hydrogen peroxide mixture, is performed to remove a first portion of the photoresist, and the activated trioxygen liquid is used to remove a second portion of the photoresist.Type: GrantFiled: October 30, 2017Date of Patent: May 30, 2023Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Shang-Yuan Yu, Hsiao Chien-Wen, Jui-Chuan Chang, Shao-Fu Hsu, Shao-Yen Ku, Wen-Chang Tsai, Yuan-Chih Chiang
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Publication number: 20180047580Abstract: Among other things, one or more systems and techniques for removing a photoresist from a semiconductor wafer are provided. The photoresist is formed over the semiconductor wafer for patterning or material deposition. Once completed, the photoresist is removed in a manner that mitigates damage to the semiconductor wafer or structures formed thereon. In an embodiment, trioxygen liquid is supplied to the photoresist. The trioxygen liquid is activated using an activator, such as an ultraviolet activator or a hydrogen peroxide activator, to create activated trioxygen liquid used to remove the photoresist. In an embodiment, the activation of the trioxygen liquid results in free radicals that aid in removing the photoresist. In an embodiment, an initial photoresist strip, such as using a sulfuric acid hydrogen peroxide mixture, is performed to remove a first portion of the photoresist, and the activated trioxygen liquid is used to remove a second portion of the photoresist.Type: ApplicationFiled: October 30, 2017Publication date: February 15, 2018Inventors: Shang-Yuan YU, Hsiao CHIEN-WEN, Jui-Chuan CHANG, Shao-Fu HSU, Shao-Yen KU, Wen-Chang TSAI, Yuan-Chih CHIANG
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Patent number: 9805946Abstract: Among other things, one or more systems and techniques for removing a photoresist from a semiconductor wafer are provided. The photoresist is formed over the semiconductor wafer for patterning or material deposition. Once completed, the photoresist is removed in a manner that mitigates damage to the semiconductor wafer or structures formed thereon. In an embodiment, trioxygen liquid is supplied to the photoresist. The trioxygen liquid is activated using an activator, such as an ultraviolet activator or a hydrogen peroxide activator, to create activated trioxygen liquid used to remove the photoresist. In an embodiment, the activation of the trioxygen liquid results in free radicals that aid in removing the photoresist. In an embodiment, an initial photoresist strip, such as using a sulfuric acid hydrogen peroxide mixture, is performed to remove a first portion of the photoresist, and the activated trioxygen liquid is used to remove a second portion of the photoresist.Type: GrantFiled: August 30, 2013Date of Patent: October 31, 2017Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Shang-Yuan Yu, Shao-Yen Ku, Hsiao Chien-Wen, Shao-Fu Hsu, Yuan-Chih Chiang, Wen-Chang Tsai, Jui-Chuan Chang
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Patent number: 9583352Abstract: A method of operating a wafer processing system includes etching a batch of wafers. The method also includes transferring at least a portion of the batch of wafers to a first front opening universal pod (FOUP). The method further includes purging an interior of the first FOUP with an inert gas. The method additionally includes transporting the first FOUP from a first loading port to a second loading port. The method also includes monitoring an elapsed time from the purging. The method further includes performing a second purging of the interior of the first FOUP if the elapsed time exceeds a threshold time. The method additionally includes cleaning the batch of wafers.Type: GrantFiled: August 18, 2015Date of Patent: February 28, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wen-Chang Tsai, Shao-Yen Ku, Hsieh-Ching Wei, Yuan Chih Chiang, Jui-Chuan Chang, Yung-Li Tsai
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Publication number: 20150357198Abstract: A method of operating a wafer processing system includes etching a batch of wafers. The method also includes transferring at least a portion of the batch of wafers to a first front opening universal pod (FOUP). The method further includes purging an interior of the first FOUP with an inert gas. The method additionally includes transporting the first FOUP from a first loading port to a second loading port. The method also includes monitoring an elapsed time from the purging. The method further includes performing a second purging of the interior of the first FOUP if the elapsed time exceeds a threshold time. The method additionally includes cleaning the batch of wafers.Type: ApplicationFiled: August 18, 2015Publication date: December 10, 2015Inventors: Wen-Chang TSAI, Shao-Yen KU, Hsieh-Ching WEI, Yuan Chih CHIANG, Jui-Chuan CHANG, Yung-Li TSAI
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Patent number: 9136149Abstract: A loading port includes a housing and a plurality of stations defined in the housing configured to receive a front opening universal pod (FOUP). The loading port further includes a connector configured to receive an inert gas. At least one of the plurality of stations is configured to deliver the inert gas to the FOUP to purge an interior of the FOUP of moisture. A system including the loading port and a method of using the system are also described.Type: GrantFiled: November 16, 2012Date of Patent: September 15, 2015Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wen-Chang Tsai, Shao-Yen Ku, Hsieh-Ching Wei, Yuan Chih Chiang, Jui-Chuan Chang, Yung-Li Tsai
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Publication number: 20150064928Abstract: Among other things, one or more systems and techniques for removing a photoresist from a semiconductor wafer are provided. The photoresist is formed over the semiconductor wafer for patterning or material deposition. Once completed, the photoresist is removed in a manner that mitigates damage to the semiconductor wafer or structures formed thereon. In an embodiment, trioxygen liquid is supplied to the photoresist. The trioxygen liquid is activated using an activator, such as an ultraviolet activator or a hydrogen peroxide activator, to create activated trioxygen liquid used to remove the photoresist. In an embodiment, the activation of the trioxygen liquid results in free radicals that aid in removing the photoresist. In an embodiment, an initial photoresist strip, such as using a sulfuric acid hydrogen peroxide mixture, is performed to remove a first portion of the photoresist, and the activated trioxygen liquid is used to remove a second portion of the photoresist.Type: ApplicationFiled: August 30, 2013Publication date: March 5, 2015Applicant: Taiwan Semiconductor Manufacturing Company LimitedInventors: Shang-Yuan Yu, Shao-Yen Ku, Hsiao Chien-Wen, Shao-Fu Hsu, Yuan-Chih Chiang, Wen-Chang Tsai, Jui-Chuan Chang
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Publication number: 20140141541Abstract: A loading port includes a housing and a plurality of stations defined in the housing configured to receive a front opening universal pod (FOUP). The loading port further includes a connector configured to receive an inert gas. At least one of the plurality of stations is configured to deliver the inert gas to the FOUP to purge an interior of the FOUP of moisture. A system including the loading port and a method of using the system are also described.Type: ApplicationFiled: November 16, 2012Publication date: May 22, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wen-Chang TSAI, Shao-Yen KU, Hsieh-Ching WEI, Yuan Chih CHIANG, Jui-Chuan CHANG, Yung-Li TSAI
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Patent number: 5784907Abstract: A locking device is intended for use in disabling the gear-shifting lever of a motor vehicle and is made up of a body and a shackle having two arms engageable and disengageable with the body. The body is composed of a horizontal tube, a vertical tube, a shackle piece, a slide piece, and a pivoting seat. The vertical tube is fastened pivotally at one end thereof with the horizontal tube which is in turn fastened adjustably at another end thereof with one end of the slide piece. The slide piece is fastened pivotally at another end thereof with the pivoting seat which is fastened securely with the body of the motor vehicle. The shackle piece is adjustably fastened with the vertical tube. The shackle piece has two arm holes for receiving two arms of the shackle to disable the gear-shifting lever of the motor vehicle. Both slide piece and shackle piece are adjustable and expandable.Type: GrantFiled: July 23, 1997Date of Patent: July 28, 1998Inventors: Hsi-Yen Hu, Yuan-Chih Chiang
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Patent number: 5778710Abstract: A device for locking the gear shift of a motor vehicle is made up of a lock seat, a shackle and a lock body. The lock seat is provided with ratchet teeth engagable with the ratchet teeth of the lock seat. The lock body is mounted on a gear shift mount of the motor vehicle and is provided with a stopping block and a lock core. The stopping block has a tapered free end capable of being moved downwards by the lock core so as to be caught by the toothed portion of the lock seat, thereby enabling the gear-shifting lever to be locked securely at the park gear position.Type: GrantFiled: July 2, 1997Date of Patent: July 14, 1998Inventors: Hsi-Yen Hu, Yuan-Chih Chiang