Patents by Inventor Yuan-Ting Hsieh

Yuan-Ting Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240162220
    Abstract: A capacitor on a fin structure includes a fin structure. A dielectric layer covers the fin structure. A first electrode extension is embedded within the fin structure. A first electrode penetrates the dielectric layer and contacts the first electrode extension. A second electrode and a capacitor dielectric layer are disposed within the dielectric layer. The capacitor dielectric layer surrounds the second electrode, and the capacitor dielectric layer is between the second electrode and the first electrode extension.
    Type: Application
    Filed: December 8, 2022
    Publication date: May 16, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Hsin-Yu Chen, Chun-Hao Lin, Yuan-Ting Chuang, Shou-Wei Hsieh
  • Patent number: 11947212
    Abstract: An electronic device which is capable of being bent in a first direction and includes a plurality of light-emitting units and a plurality of conductive patterns overlapping with at least a portion of the plurality of light-emitting units and extending in a second direction. The first direction and the second direction have an angle ? of not greater than 30 degrees.
    Type: Grant
    Filed: January 21, 2021
    Date of Patent: April 2, 2024
    Assignee: InnoLux Corporation
    Inventors: Yuan-Lin Wu, Yu-Chia Huang, Yu-Ting Huang, Kuan-Feng Lee, Chia-Hung Hsieh
  • Patent number: 11753400
    Abstract: The present invention relates to compounds of Formula (I): or a pharmaceutically acceptable salt thereof, wherein: each of A, B, C, D, and E, independently, is C, N, N—H, O, S, or absent; is a single bond or a double bond; each of X, Y, and Z, independently, is aryl, heteroaryl, aralkyl, H, or absent; each of L1 and L2, independently, is a moiety selected from O, CH2, C?O, C2-10 alkyl, C2-10 alkenyl, C2-10 alkynyl, —((CH2)n—W)—, wherein n=0, 1, 2, 3, 4, or 5, and W is O or S, or absent; and when L2 is absent, Z is aryl or heteroaryl fused with BC. Also provided in the present invention is a method for inhibiting, treating and/or reducing the risk of a neuropsychiatric disorder, comprising administering a subject in need a composition comprising a compound of Formula (I).
    Type: Grant
    Filed: October 18, 2018
    Date of Patent: September 12, 2023
    Assignee: SyneuRx International (Taiwan) Corp.
    Inventors: Guochuan Emil Tsai, Ching-Cheng Wang, Yuan-Ting Hsieh
  • Publication number: 20200331894
    Abstract: The present invention relates to compounds of Formula (I): or a pharmaceutically acceptable salt thereof, wherein: each of A, B, C, D, and E, independently, is C, N, N—H, O, S, or absent; is a single bond or a double bond; each of X, Y, and Z, independently, is aryl, heteroaryl, aralkyl, H, or absent; each of L1 and L2, independently, is a moiety selected from O, CH2, C?O, C2-10 alkyl, C2-10 alkenyl, C2-10 alkynyl, —((CH2)n—W)—, wherein n=0, 1, 2, 3, 4, or 5, and W is O or S, or absent; and when L2 is absent, Z is aryl or heteroaryl fused with BC. Also provided in the present invention is a method for inhibiting, treating and/or reducing the risk of a neuropsychiatric disorder, comprising administering a subject in need a composition comprising a compound of Formula (I).
    Type: Application
    Filed: October 18, 2018
    Publication date: October 22, 2020
    Applicant: SyneuRx International (Taiwan) Corp.
    Inventors: Guochuan Emil Tsai, Chlng-Cheng Wang, Yuan-Ting Hsieh
  • Patent number: 10336724
    Abstract: The present invention relates to compounds of Formula (I): or a pharmaceutically acceptable salt thereof, wherein: each of A, B, C, D, and E, independently, is C, N, N—H, O, S, or absent; is a single bond or a double bond; each of X, Y, and Z, independently, is aryl, heteroaryl, aralkyl, H, or absent; each of L1 and L2, independently, is a moiety selected from O, CH2, C?O, C2-10 alkyl, C2-10 alkenyl, C2-10 alkynyl, —((CH2)n—W)—, wherein n=0, 1, 2, 3, 4, or 5, and W is O or S, or absent; and when L2 is absent, Z is aryl or heteroaryl fused with BC. Also provided in the present invention is a method for inhibiting, treating and/or reducing the risk of a neuropsychiatric disorder, comprising administering a subject in need a composition comprising a compound of Formula (I).
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: July 2, 2019
    Assignee: SyneuRx International (Taiwan) Corp.
    Inventors: Guochuan Emil Tsai, Ching-Cheng Wang, Yuan-Ting Hsieh